Abstract: An EUV collector mirror shell of an EUV collector for EUV lithography includes a body which has a light incidence-side front part having a reflective optically active area, a rear part, and a cavity between the front and rear parts. The cavity extends essentially along the entire optically active area, and the cavity serves to receive a cooling medium. The body also has at least one inlet and at least one outlet for the cooling medium. A plurality of flow-influencing elements are in the cavity, extending from the front part to the rear part, and connecting the front part to the rear part and monolithically formed with the front and rear parts.

Abstract: A mirror with a dielectric coating (2) on a substrate (3), wherein the dielectric coating (2) has exactly two layer stacks (4, 5), a first layer stack (4), on the substrate, of layers (41, 42) of high refractive index and low refractive index oxides in alternating arrangement and a second layer stack (5), arranged thereon, of layers of fluorides (52) and oxides (51) in alternating arrangement, and wherein the number of fluoride layers (52) as a proportion of the total number of layers of the dielectric coating (2) is less than 0.45.