Abstract: A method is provided for setting a position of a carrier element, arranged in a particle beam device, that holds an object. The particle beam device has a beam generator for generating a particle beam and an objective for focusing the particle beam. The carrier element is movable using a first stepper motor. A movement of the carrier element is started by actuating the first stepper motor using a first motor current in the form of an alternating current. The first motor current is set to a first frequency and a first amplitude. The movement of the carrier element is decelerated by reducing the first frequency and by reducing the first amplitude of the first motor current. The first frequency is reduced to zero during a first period of time. The first amplitude is reduced to an amplitude of a first holding current during the first period of time.

Abstract: A method for automatic focusing of a microscope with a microscope objective on a selected area of a specimen, in which a digital hologram of the selected area of the specimen is generated in an off-axis mode and a microscope with which the method is implemented. The digital hologram is used to determine, on the optical axis of the microscope objective, a focus position to be set in which the selected area of the specimen is optimally in focus. Subsequently, a control system is used to set the microscope to the focus position determined and thus is focused on the area selected.

Abstract: A method for wavelength-selective and high spatial resolving fluorescence microscopy. In a specimen fluorescence emitters are repeatedly excited and specimen frames are produced with a microscope. The fluorescence emitters are excited to emit fluorescence radiation such that at least a sub-set is isolated in each frame and the positions of the isolated fluorescence emitters are localized with a localization precision exceeding the optical resolution and a high-resolution complete image is produced.

Abstract: A system for supplying a process gas to a processing location of a particle beam system is disclosed. The system for supplying the processing gas includes a gas reservoir, a gas conduit, a pipe located close to the processing location, a valve between the gas conduit and the pipe, and a controller configured to open and to close the valve to switch the system from a first mode of operation in which process gas is not supplied to the processing location to a second mode of operation in which process gas is supplied to the processing location. The controller can alternately open and close the valve in cycles. Each cycle can include a first duration in which the valve is open and a second duration in which the valve is closed. The ratio of the first duration to the second duration can be changed.

Abstract: A processing system includes a particle beam column for generating a particle beam directed to a first processing location; a laser system for generating a laser beam directed to a second processing location located at a distance from the first processing location; and a protector including an actuator and a plate connected to the actuator. The actuator is configured to move the plate between a first position in which it protects a component of the particle beam column from particles released from the object by the laser beam and a second position in which the component of the particle beam column is not protected from particles released from the object by the laser beam.

Abstract: A filter holder for correlative particle analysis during imaging microscopy methods or methods of the elemental analysis including a receiving element with a filter support and a fastening unit. The plane filter support is designed as pressure piece and is movably arranged in the receiving element to be movable at a right angle to the surface of the filter for the purpose of tensioning the filter. The fastening unit includes a clamping element which encloses the filter at the circumference of the filter and is held by a tensioning element which is supported in the receiving element.

Abstract: The invention relates to a planapochromatically-corrected immersion microscope objective for high-resolution microscopy applications with changing dispersive immersion conditions, having a plurality of lenses and/or subsystems (T1, T2, T3) comprising lens groups and a corrective function (LA2) for eliminating spherical aberrations. According to the invention, the microscope objective has an additional corrective function (LA1) for eliminating longitudinal chromatic aberrations caused by dispersive changes in the immersion by changing the air gaps between the lenses or gap combinations, wherein the influence on the longitudinal chromatic aberration corresponds to a rotation of the curve s(?), which describes the color point (s) as a function of the wavelength (?).

Abstract: A method for the microscopy of samples using optical microscopy and particle beam microscopy provides that the samples are divided into a partial quantity and a residual quantity and the samples of the partial quantity are prepared to contain registration marks. The samples of the partial quantity are imaged using optical microscopy and particle beam microscopy, with the result that a pair of optical microscopy images and particle beam microscopy images is obtained for each sample of the partial quantity. The pairs are position-registered relative to each other using the registration marks. The images of the position-registered pairs are modified by removing the registration marks. A registration algorithm is trained which evaluates the image contents and issues a quality measure for a position registration of each pair. The objects of the residual quantity are imaged. These pairs are position-registered by the trained registration algorithm to maximize the quality measure.

Abstract: A charged particle source comprises at least one gas inlet configured to supply gas particles, at least one tip having a tip apex being biased to provide an electrical field for generating charged particles, and at least one ionization area to which gas particles are supplied. The gas particles are ionized in the ionization area due to the electrical field. Additionally, the charged particle source comprises at least one first electrode configured to accelerate charged particles and at least one light emitting device providing a light beam. The light beam is focused to a focus point in the ionization area, specifically, to a focus volume such that the ionization area is at least partly positioned in the focus volume. The ionization area is arranged between the tip apex and the first electrode. The distance between the ionization area and the tip apex may be from 0.1 nm to 1 nm.

Abstract: A method of operating a particle beam system includes determining a deflection amount and a deflection time of a beam deflection module connected to a data network. The method also includes determining an un-blank time of a beam blanking module connected to the data network, and determining a blank time of the beam blanking module connected to the data network. The method further includes generating a data structure which includes plural data records, wherein each data record includes a command representing an instruction for at least one of the modules, and a command time representing a time at which the instruction is to be sent to the data network. In addition, the method includes sorting the records of the data structure by command time, and generating a set of digital commands based on the data structure. Moreover, the method includes sending the digital commands of the set to the network in an order corresponding to an order of the sorted records.