Patents by Inventor Carlo Cornelius Maria Luijten

Carlo Cornelius Maria Luijten has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Measurement method, inspection apparatus, patterning device, lithographic system and device manufacturing method
    Patent number: 10691030
    Abstract: A focus metrology target includes one or more periodic arrays of features. A measurement of focus performance of a lithographic apparatus is based at least in part on diffraction signals obtained from the focus metrology target. Each periodic array of features includes a repeating arrangement of first zones interleaved with second zones, a feature density being different in the first zones and the second zones. Each first zone includes a repeating arrangement of first features. A minimum dimension of each first feature is close to but not less than a resolution limit of the printing by the lithographic apparatus, so as to comply with a design rule in a given a process environment. A region of high feature density may further include a repeating arrangement of larger features.
    Type: Grant
    Filed: November 16, 2018
    Date of Patent: June 23, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Frank Staals, Eric Jos Anton Brouwer, Carlo Cornelius Maria Luijten, Jean-Pierre Agnes Henricus Marie Vaessen