Patents by Inventor Carlos Alberto Duran

Carlos Alberto Duran has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11028006
    Abstract: Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier.
    Type: Grant
    Filed: April 22, 2019
    Date of Patent: June 8, 2021
    Assignee: Corning Incorporated
    Inventors: Sezhian Annamalai, Carlos Alberto Duran, Kenneth Edward Hrdina, William Rogers Rosch
  • Patent number: 10464840
    Abstract: Near-infrared shielding includes a glass material. The shielding provides transmittance at wavelengths between 390 to 700 nm, but near infrared absorbing species are distributed throughout the glass material and the shielding blocks light in the near infrared range. Further, the glass material has a near zero or negative coefficient of thermal expansion, allowing the glass material to heat up when the shielding is blocking a near infrared laser, without expanding much.
    Type: Grant
    Filed: October 4, 2017
    Date of Patent: November 5, 2019
    Assignee: Corning Incorporated
    Inventors: Sezhian Annamalai, Steven Bruce Dawes, Carlos Alberto Duran, Jesse Kohl
  • Patent number: 10458936
    Abstract: An improved method and apparatus for determination of the absolute coefficient of thermal expansion of materials, including ultralow expansion materials, utilizes a metrology frame that is regulated within a first narrow temperature range that varies by only a small fraction of a degree Celsius from a set point temperature (e.g., less than about 0.01° C. from the set point temperature), while the temperature of the sample is varied to determine the coefficient of thermal expansion over a larger temperature range (e.g., 30, 40 or 50° C.). The method and apparatus permit determination of the coefficient of thermal expansion of a material to levels approaching 10?9/° C.
    Type: Grant
    Filed: April 21, 2017
    Date of Patent: October 29, 2019
    Assignee: Corning Incorporated
    Inventor: Carlos Alberto Duran
  • Publication number: 20190248696
    Abstract: Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier.
    Type: Application
    Filed: April 22, 2019
    Publication date: August 15, 2019
    Inventors: Sezhian Annamalai, Carlos Alberto Duran, Kenneth Edward Hrdina, William Rogers Rosch
  • Patent number: 10329184
    Abstract: Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier.
    Type: Grant
    Filed: August 25, 2017
    Date of Patent: June 25, 2019
    Assignee: Corning Incorporated
    Inventors: Sezhian Annamalai, Carlos Alberto Duran, Kenneth Edward Hrdina, William Rogers Rosch
  • Publication number: 20180273419
    Abstract: Near-infrared shielding includes a glass material. The shielding provides transmittance at wavelengths between 390 to 700 nm, but near infrared absorbing species are distributed throughout the glass material and the shielding blocks light in the near infrared range. Further, the glass material has a near zero or negative coefficient of thermal expansion, allowing the glass material to heat up when the shielding is blocking a near infrared laser, without expanding much.
    Type: Application
    Filed: October 4, 2017
    Publication date: September 27, 2018
    Inventors: Sezhian Annamalai, Steven Bruce Dawes, Carlos Alberto Duran, Jesse Kohl
  • Patent number: 10017413
    Abstract: A method of forming a doped silica-titania glass is provided. The method includes blending batch materials comprising silica, titania, and at least one dopant. The method also includes heating the batch materials to form a glass melt. The method further includes consolidating the glass melt to form a glass article, and annealing the glass article.
    Type: Grant
    Filed: November 24, 2015
    Date of Patent: July 10, 2018
    Assignee: Corning Incorporated
    Inventors: Sezhian Annamalai, Carlos Alberto Duran, Kenneth Edward Hrdina, Lisa Anne Moore
  • Patent number: 9932261
    Abstract: A doped silica-titania (“DST”) glass article that includes a glass article having a glass composition comprising a silica-titania base glass containing titania at 7 to 14 wt. % and a balance of silica, and a dopant selected from the group consisting of (a) F at 0.7 to 1.5 wt. %, (b) B2O3 at 1.5 to 5 wt. %, (c) OH at 1000 to 3000 ppm, and (d) B2O3 at 0.5 to 2.5 wt. % and OH at 100 to 1400 ppm. The glass article has an expansivity slope of less than about 1.3 ppb/K2 at 20° C. For DST glass articles doped with F or B2O3, the OH level can be held to less than 10 ppm, or less than 100 ppm, respectively. In many aspects, the DST glass articles are substantially free of titania in crystalline form.
    Type: Grant
    Filed: October 19, 2016
    Date of Patent: April 3, 2018
    Assignee: Corning Incorporated
    Inventors: Sezhian Annamalai, Steven Bruce Dawes, Carlos Alberto Duran, Kenneth Edward Hrdina, William Rogers Rosch, Bryan Ray Wheaton
  • Patent number: 9890071
    Abstract: Silica-titania glasses with small temperature variations in coefficient of thermal expansion over a wide range of zero-crossover temperatures and methods for making the glasses. The method includes a cooling protocol with controlled anneals over two different temperature regimes. A higher temperature controlled anneal may occur over a temperature interval from 750° C.-950° C. or a sub-interval thereof. A lower temperature controlled anneal may occur over a temperature interval from 650° C.-875° C. or a sub-interval thereof. The controlled anneals permit independent control over CTE slope and Tzc of silica-titania glasses. The independent control provides CTE slope and Tzc values for silica-titania glasses of fixed composition over ranges heretofore possible only through variations in composition.
    Type: Grant
    Filed: October 12, 2016
    Date of Patent: February 13, 2018
    Assignee: Corning Incorporated
    Inventor: Carlos Alberto Duran
  • Publication number: 20170349478
    Abstract: Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier.
    Type: Application
    Filed: August 25, 2017
    Publication date: December 7, 2017
    Inventors: Sezhian Annamalai, Carlos Alberto Duran, Kenneth Edward Hrdina, William Rogers Rosch
  • Publication number: 20170349475
    Abstract: Silica-titania glasses with small temperature variations in coefficient of thermal expansion over a wide range of zero-crossover temperatures and methods for making the glasses. The method includes a cooling protocol with controlled anneals over two different temperature regimes. A higher temperature controlled anneal may occur over a temperature interval from 750-950° C. or a sub-interval thereof. A lower temperature controlled anneal may occur over a temperature interval from 650-875° C. or a sub-interval thereof. The controlled anneals permit independent control over CTE slope and Tzc of silica-titania glasses. The independent control provides CTE slope and Tzc values for silica-titania glasses of fixed composition over ranges heretofore possible only through variations in composition.
    Type: Application
    Filed: July 27, 2017
    Publication date: December 7, 2017
    Inventor: Carlos Alberto Duran
  • Patent number: 9822030
    Abstract: Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier.
    Type: Grant
    Filed: January 21, 2016
    Date of Patent: November 21, 2017
    Assignee: Corning Incorporated
    Inventors: Sezhian Annamalai, Carlos Alberto Duran, Kenneth Edward Hrdina, William Rogers Rosch
  • Publication number: 20170328848
    Abstract: An improved method and apparatus for determination of the absolute coefficient of thermal expansion of materials, including ultralow expansion materials, utilizes a metrology frame that is regulated within a first narrow temperature range that varies by only a small fraction of a degree Celsius from a set point temperature (e.g., less than about 0.01° C. from the set point temperature), while the temperature of the sample is varied to determine the coefficient of thermal expansion over a larger temperature range (e.g., 30, 40 or 50° C.). The method and apparatus permit determination of the coefficient of thermal expansion of a material to levels approaching 10?9/° C.
    Type: Application
    Filed: April 21, 2017
    Publication date: November 16, 2017
    Inventor: Carlos Alberto Duran
  • Publication number: 20170144917
    Abstract: A doped silica-titania (“DST”) glass article that includes a glass article having a glass composition comprising a silica-titania base glass containing titania at 7 to 14 wt. % and a balance of silica, and a dopant selected from the group consisting of (a) F at 0.7 to 1.5 wt. %, (b) B2O3 at 1.5 to 5 wt. %, (c) OH at 1000 to 3000 ppm, and (d) B2O3 at 0.5 to 2.5 wt. % and OH at 100 to 1400 ppm. The glass article has an expansivity slope of less than about 1.3 ppb/K2 at 20° C. For DST glass articles doped with F or B2O3, the OH level can be held to less than 10 ppm, or less than 100 ppm, respectively. In many aspects, the DST glass articles are substantially free of titania in crystalline form.
    Type: Application
    Filed: October 19, 2016
    Publication date: May 25, 2017
    Inventors: Sezhian Annamalai, Steven Bruce Dawes, Carlos Alberto Duran, Kenneth Edward Hrdina, William Rogers Rosch, Bryan Ray Wheaton
  • Patent number: 9611169
    Abstract: A doped silica-titania glass article is provided that includes a glass article having a glass composition comprising (i) a silica-titania base glass, (ii) a fluorine dopant, and (iii) a second dopant. The fluorine dopant has a concentration of fluorine of up to 5 wt. % and the second dopant comprises one or more oxides selected from the group consisting of Al, Nb, Ta, B, Na, K, Mg, Ca and Li oxides at a total oxide concentration from 50 ppm to 6 wt. %. Further, the glass article has an expansivity slope of less than 0.5 ppb/K2 at 20° C. The second dopant can be optional. The composition of the glass article may also contain an OH concentration of less than 100 ppm.
    Type: Grant
    Filed: December 3, 2015
    Date of Patent: April 4, 2017
    Assignee: Corning Incorporated
    Inventors: Sezhian Annamalai, Carlos Alberto Duran, Kenneth Edward Hrdina
  • Patent number: 9580350
    Abstract: Ultralow expansion titania-silica glass. The glass has high hydroxyl content and optionally include one or more dopants. Representative optional dopants include boron, alkali elements, alkaline earth elements or metals such as Nb, Ta, Al, Mn, Sn Cu and Sn. The glass is prepared by a process that includes steam consolidation to increase the hydroxyl content. The high hydroxyl content or combination of dopant(s) and high hydroxyl content lowers the fictive temperature of the glass to provide a glass having a very low coefficient of thermal expansion (CTE), low fictive temperature (Tf), and low expansivity slope.
    Type: Grant
    Filed: October 23, 2015
    Date of Patent: February 28, 2017
    Assignee: Corning Incorporated
    Inventors: Sezhian Annamalai, Carlos Alberto Duran, Kenneth Edward Hrdina
  • Publication number: 20170029313
    Abstract: Silica-titania glasses with small temperature variations in coefficient of thermal expansion over a wide range of zero-crossover temperatures and methods for making the glasses. The method includes a cooling protocol with controlled anneals over two different temperature regimes. A higher temperature controlled anneal may occur over a temperature interval from 750° C.-950° C. or a sub-interval thereof. A lower temperature controlled anneal may occur over a temperature interval from 650°C.-875° C. or a sub-interval thereof. The controlled anneals permit independent control over CTE slope and Tzc of silica-titania glasses. The independent control provides CTE slope and Tzc values for silica-titania glasses of fixed composition over ranges heretofore possible only through variations in composition.
    Type: Application
    Filed: October 12, 2016
    Publication date: February 2, 2017
    Inventor: Carlos Alberto Duran
  • Patent number: 9505649
    Abstract: Silica-titania glasses with small temperature variations in coefficient of thermal expansion over a wide range of zero-crossover temperatures and methods for making the glasses. The method includes a cooling protocol with controlled anneals over two different temperature regimes. A higher temperature controlled anneal may occur over a temperature interval from 750° C.-950° C. or a sub-interval thereof. A lower temperature controlled anneal may occur over a temperature interval from 650° C.-875° C. or a sub-interval thereof. The controlled anneals permit independent control over CTE slope and Tzc of silica-titania glasses. The independent control provides CTE slope and Tzc values for silica-titania glasses of fixed composition over ranges heretofore possible only through variations in composition.
    Type: Grant
    Filed: September 2, 2014
    Date of Patent: November 29, 2016
    Assignee: Corning Incorporated
    Inventor: Carlos Alberto Duran
  • Publication number: 20160236965
    Abstract: Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier.
    Type: Application
    Filed: January 21, 2016
    Publication date: August 18, 2016
    Inventors: Sezhian Annamalai, Carlos Alberto Duran, Kenneth Edward Hrdina, William Rogers Rosch
  • Patent number: 9382151
    Abstract: A glass article for use in Extreme Ultra-Violet Lithography (EUVL) is provided. The glass article includes a silica-titania glass having a compositional gradient through the glass article, the compositional gradient being defined by the functions: [TiO2]=(c+f(x,y,z)), and [SiO2]=(100?{c+f(x,y,z)}??(x,y,z)) wherein [TiO2] is the concentration of titania in wt. %, [SiO2] is the concentration of silica in wt. %, c is the titania concentration in wt. % for a predetermined zero crossover temperature (Tzc), f(x, y, z) is a function in three-dimensional space that defines the difference in average composition of a volume element centered at the coordinates (x, y, z) with respect to c, and ?(x, y, z) is a function in three-dimensional space that defines the sum of all other components of a volume element centered at the coordinates (x, y, z).
    Type: Grant
    Filed: January 26, 2015
    Date of Patent: July 5, 2016
    Assignee: Corning Incorporated
    Inventors: William R. Angell, IV, Sezhian Annamalai, Carlos Alberto Duran, John Edward Maxon