Abstract: A charged particle source utilizes a novel plasma processing chamber, RF coil and ion optics, to achieve high uniformity. The plasma processing chamber has a re-entrant vessel which is movable, and which includes extensions of adjustable shape or position, to make more uniform the plasma contained within the chamber. One or more magnets, which may be static or moving, may be included within the re-entrant vessel. The ion optics include a grid with a number of apertures, and tuning features each surrounding an aperture. These tuning features either reduce the diameter of the associated aperture, or increase the length of that aperture, to create more uniform beamlets emerging from the grid. The RF coil includes a flux concentrator positioned adjacent to the winding in at least one angular region thereof to tune the magnetic field produced thereby.

Abstract: A charged particle source utilizes a novel plasma processing chamber, RF coil and ion optics, to achieve high uniformity. The plasma processing chamber has a re-entrant vessel which is movable, and which includes extensions of adjustable shape or position, to make more uniform the plasma contained within the chamber. One or more magnets, which may be static or moving, may be included within the re-entrant vessel. The ion optics include a grid with a number of apertures, and tuning features each surrounding an aperture. These tuning features either reduce the diameter of the associated aperture, or increase the length of that aperture, to create more uniform beamlets emerging from the grid. The RF coil includes a flux concentrator positioned adjacent to the winding in at least one angular region thereof to tune the magnetic field produced thereby.

Abstract: A method for depositing a thin film of diamond on the surface of a Fe-based substrate comprises the step of pre-treating the surface of the Fe-based substrate prior to the deposition consisting of nucleating carbon atoms on the Fe-based substrate to grow the thin film of diamond. The pre-treatment consists of supersaturating the surface of the Fe-based substrate with carbon atoms and heating it to form a diffusion barrier layer. During the pre-treatment, at least a portion of the carbon atoms are diffused into the Fe-based substrate. During the deposition process, carbon atoms are prevented by the diffusion barrier layer previously formed to diffuse into the Fe-based substrate whereby these carbon atoms remain available for the nucleation and growth of the thin film of diamond.