Patents by Inventor Carlos G. Caminos

Carlos G. Caminos has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for fabricating a projection electron lithography mask and a removable, reusable cover for use therein
    Patent number: 6372393
    Abstract: A removable, reusable cover constructed such that its geometry matches the geometry of the active region of a projection electron lithography mask to be protected and does not etch in the plasma environment used to remove a photoresist. The cover protects the active region of the projection electron lithography mask, but does not contact the active region. A technique for fabricating a projection electron lithography mask utilizing the removable, reusable cover, where the geometry of the cover is matched to the geometry of an active region of the projection electron lithography mask to be protected. During fabrication of the projection electron lithography mask, the cover protects the active region of the projection electron lithography mask from the plasma environment, but does not contact the active region.
    Type: Grant
    Filed: May 15, 2001
    Date of Patent: April 16, 2002
    Assignee: Agere Systems Guardian Corp.
    Inventors: Carlos G. Caminos, Chester S. Knurek, Anthony E. Novembre
  • Process for fabricating a projection electron lithography mask and a removable, reusable cover for use therein
    Publication number: 20010031404
    Abstract: A removable, reusable cover constructed such that its geometry matches the geometry of the active region of a projection electron lithography mask to be protected and does not etch in the plasma environment used to remove a photoresist. The cover protects the active region of the projection electron lithography mask, but does not contact the active region. A technique for fabricating a projection electron lithography mask utilizing the removable, reusable cover, where the geometry of the cover is matched to the geometry of an active region of the projection electron lithography mask to be protected. During fabrication of the projection electron lithography mask, the cover protects the active region of the projection electron lithography mask from the plasma environment, but does not contact the active region.
    Type: Application
    Filed: May 15, 2001
    Publication date: October 18, 2001
    Applicant: Agere Systems Guardian Corp.
    Inventors: Carlos G. Caminos, Chester S. Knurek, Anthony E. Novembre
  • Process for fabricating a projection electron lithography mask and a removable reusable cover for use therein
    Patent number: 6251543
    Abstract: A removable, reusable cover constructed such that its geometry matches the geometry of the active region of a projection electron lithography mask to be protected and does not etch in the plasma environment used to remove a photoresist. The cover protects the active region of the projection electron lithography mask, but does not contact the active region. A technique for fabricating a projection electron lithography mask utilizing the removable, reusable cover, where the geometry of the cover is matched to the geometry of an active region of the projection electron lithography mask to be protected. During fabrication of the projection electron lithography mask, the cover protects the active region of the projection electron lithography mask from the plasma environment, but does not contact the active region.
    Type: Grant
    Filed: June 14, 1999
    Date of Patent: June 26, 2001
    Assignee: Agere Systems Guardian Corp.
    Inventors: Carlos G. Caminos, Chester S. Knurek, Anthony E. Novembre