Abstract: Improved masks for double patterning lithography are described. In one example, conflict spaces between features of a target design are identified. The conflict spaces are represented as nodes of a graph. Connections are inserted between nodes based on a local search. The connections are cut to determine double patterning mask assignment. The connections are extended to form a checkerboard that is then overlayed on the target mask design to split the features of the target mask design for double patterning.

Abstract: Improved masks for double patterning lithography are described. In one example, conflict spaces between features of a target design are identified. The conflict spaces are represented as nodes of a graph. Connections are inserted between nodes based on a local search. The connections are cut to determine double patterning mask assignment. The connections are extended to form a checkerboard that is then overlayed on the target mask design to split the features of the target mask design for double patterning.

Abstract: A system architecture is disclosed that facilitates rapid execution of 3D registration or alignment algorithms. A first image module (e.g., RAM) is included to store data corresponding to images to be registered. A processor coupled to the first storage module accesses the data and determined mutual histogram (MH) values which are then used to compute mutual information (MI) between the images. The processor accumulates the MH values in a second image module. The second storage module is accessible so that registered images can be displayed. The architecture is scalable facilitating distributed calculations to speed-up the registration process.