Patents by Inventor Carmela Amato-Wierda

Carmela Amato-Wierda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Dielectric barrier discharge method for depositing film on substrates
    Publication number: 20050281951
    Abstract: A method of coating at least one wafer with film. The method includes first flowing at least one purge gas and at least one reactant gas at least partially through an activation space of at least one electrode set. Next, placing a wafer beneath the activation space of the at least one electrode set. Finally, supplying AC power to at least one electrode set whereby a dielectric barrier is discharged at least partially within the activation space, from which the film descends onto the wafer.
    Type: Application
    Filed: August 24, 2005
    Publication date: December 22, 2005
    Applicant: University of New Hampshire
    Inventor: Carmela Amato-Wierda