Patents by Inventor Carmen Balderrama

Carmen Balderrama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatuses for reducing porogen accumulation from a UV-cure chamber
    Patent number: 11177131
    Abstract: Porogen accumulation in a UV-cure chamber is reduced by removing outgassed porogen through a heated outlet while purge gas is flowed across a window through which a wafer is exposed to UV light. A purge ring having specific major and minor exhaust to inlet area ratios may be partially made of flame polished quartz to improve flow dynamics. The reduction in porogen accumulation allows more wafers to be processed between chamber cleans, thus improving throughput and cost.
    Type: Grant
    Filed: July 6, 2018
    Date of Patent: November 16, 2021
    Assignee: Novellus Systems, Inc.
    Inventors: Lisa Marie Gytri, Jeff Gordon, James Forest Lee, Carmen Balderrama, Joseph Brett Harris, Eugene Smargiassi, Stephen Yu-Hong Lau, George D. Kamian, Ming Xi
  • METHOD AND APPARATUSES FOR REDUCING POROGEN ACCUMULATION FROM A UV-CURE CHAMBER
    Publication number: 20180315604
    Abstract: Porogen accumulation in a UV-cure chamber is reduced by removing outgassed porogen through a heated outlet while purge gas is flowed across a window through which a wafer is exposed to UV light. A purge ring having specific major and minor exhaust to inlet area ratios may be partially made of flame polished quartz to improve flow dynamics. The reduction in porogen accumulation allows more wafers to be processed between chamber cleans, thus improving throughput and cost.
    Type: Application
    Filed: July 6, 2018
    Publication date: November 1, 2018
    Inventors: Lisa Marie Gytri, Jeff Gordon, James Forest Lee, Carmen Balderrama, Joseph Brett Harris, Eugene Smargiassi, Stephen Yu-Hong Lau, George D. Kamian, Ming Xi
  • Method for reducing porogen accumulation from a UV-cure chamber
    Patent number: 10020197
    Abstract: Porogen accumulation in a UV-cure chamber is reduced by removing outgassed porogen through a heated outlet while purge gas is flowed across a window through which a wafer is exposed to UV light. A purge ring having specific major and minor exhaust to inlet area ratios may be partially made of flame polished quartz to improve flow dynamics. The reduction in porogen accumulation allows more wafers to be processed between chamber cleans, thus improving throughput and cost.
    Type: Grant
    Filed: May 20, 2015
    Date of Patent: July 10, 2018
    Assignee: Novellus Systems, Inc.
    Inventors: Lisa Gytri, Jeff Gordon, James Lee, Carmen Balderrama, Joseph Brett Harris, Eugene Smargiassi, Stephen Yu-Hong Lau, George D. Kamian, Ming Xi
  • METHOD AND APPARATUSES FOR REDUCING POROGEN ACCUMULATION FROM A UV-CURE CHAMBER
    Publication number: 20150255285
    Abstract: Porogen accumulation in a UV-cure chamber is reduced by removing outgassed porogen through a heated outlet while purge gas is flowed across a window through which a wafer is exposed to UV light. A purge ring having specific major and minor exhaust to inlet area ratios may be partially made of flame polished quartz to improve flow dynamics. The reduction in porogen accumulation allows more wafers to be processed between chamber cleans, thus improving throughput and cost.
    Type: Application
    Filed: May 20, 2015
    Publication date: September 10, 2015
    Inventors: Lisa Gytri, Jeff Gordon, James Lee, Carmen Balderrama, Joseph Brett Harris, Eugene Smargiassi, Stephen Yu-Hong Lau, George D. Kamian, Ming Xi
  • Method and apparatuses for reducing porogen accumulation from a UV-cure chamber
    Patent number: 9073100
    Abstract: Porogen accumulation in a UV-cure chamber is reduced by removing outgassed porogen through a heated outlet while purge gas is flowed across a window through which a wafer is exposed to UV light. A purge ring having specific major and minor exhaust to inlet area ratios may be partially made of flame polished quartz to improve flow dynamics. The reduction in porogen accumulation allows more wafers to be processed between chamber cleans, thus improving throughput and cost.
    Type: Grant
    Filed: February 25, 2013
    Date of Patent: July 7, 2015
    Assignee: Novellus Systems, Inc.
    Inventors: Lisa Gytri, Jeff Gordon, James Lee, Carmen Balderrama, Joseph Brett Harris, Eugene Smargiassi, Stephen Yu-Hong Lau, George D. Kamian, Ming Xi
  • METHOD AND APPARATUSES FOR REDUCING POROGEN ACCUMULATION FROM A UV-CURE CHAMBER
    Publication number: 20130284087
    Abstract: Porogen accumulation in a UV-cure chamber is reduced by removing outgassed porogen through a heated outlet while purge gas is flowed across a window through which a wafer is exposed to UV light. A purge ring having specific major and minor exhaust to inlet area ratios may be partially made of flame polished quartz to improve flow dynamics. The reduction in porogen accumulation allows more wafers to be processed between chamber cleans, thus improving throughput and cost.
    Type: Application
    Filed: February 25, 2013
    Publication date: October 31, 2013
    Inventors: Lisa Gytri, Jeff Gordon, James Lee, Carmen Balderrama, Joseph Brett Harris, Eugene Smargiassi, Stephen Yu-Hong Lau, George D. Kamian, Ming Xi
  • Method and apparatuses for reducing porogen accumulation from a UV-cure chamber
    Patent number: 8398816
    Abstract: Porogen accumulation in a UV-cure chamber is reduced by removing outgassed porogen through a heated outlet while purge gas is flowed across a window through which a wafer is exposed to UV light. A purge ring having specific major and minor exhaust to inlet area ratios may be partially made of flame polished quartz to improve flow dynamics. The reduction in porogen accumulation allows more wafers to be processed between chamber cleans, thus improving throughput and cost.
    Type: Grant
    Filed: June 3, 2008
    Date of Patent: March 19, 2013
    Assignee: Novellus Systems, Inc.
    Inventors: Lisa Gytri, Jeff Gordon, James Lee, Carmen Balderrama, Joseph Brett Harris