Abstract: Method of depositing a buffer layer of epitaxial metal oxide on a functionalised surface of a textured metal substrate, said method comprising the following steps: (1) a layer is deposited of a precursor of an oxide of the type A2?xB2+xO7 where A represents a metal of valency 3 or a mixture of several of these metals, and B a metal of valency 4, and x is a number between ?0.1 and +0.1, from a solution of carboxylates of said metals A and B, (2) said layer of oxide precursor is left to dry, (3) heat treatment is carried out in order to pyrolyse said oxide precursor and to form the oxide, at least part of said heat treatment being carried out under a flow of reducing gas.

Abstract: A device for evaporation of a solution based on solvent and compounds or solutes inside an enclosure comprises different evaporation zones separated by separating partitions into several distinct elementary chambers enabling fractionated evaporation via outlets generating a plurality of separate vapor flows specific to each constituent. The solution is injected into the first chamber subjected to the lowest temperature so as to impregnate a porous mobile element that passes through the different partitions, being successively in contact with said chambers heated to increasing temperatures. A neutral carrier gas is injected in the vicinity of the partitions for control of the pressure losses of the gas flows between the different chamber.

Abstract: A device for evaporation of a solution based on solvent and compounds or solutes inside an enclosure comprises different evaporation zones separated by separating partitions into several distinct elementary chambers enabling fractionated evaporation via outlets generating a plurality of separate vapor flows specific to each constituent. The solution is injected into the first chamber subjected to the lowest temperature so as to impregnate a porous mobile element that passes through the different partitions, being successively in contact with said chambers heated to increasing temperatures. A neutral carrier gas is injected in the vicinity of the partitions for control of the pressure losses of the gas flows between the different chamber.