Patents by Inventor Carol Boye

Carol Boye has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11031346
    Abstract: An advanced security method for verifying that integrated circuit patterns being processed into one or more layers provided to a wafer are trusted patterns and that the wafer being used during processing is a trusted wafer is provided. The method includes separate steps of pattern verification and wafer verification. Notably, the method includes first verifying that a pattern printed on a wafer matches a pattern of a trusted reference. Next, a peak and valley profile present at a specific location on a backside surface of the wafer is measured. The method further includes second verify that the measured peak and valley profile matches an original peak and valley profile measured at the same location on the backside surface of the wafer.
    Type: Grant
    Filed: May 15, 2019
    Date of Patent: June 8, 2021
    Assignee: International Business Machines Corporation
    Inventors: Effendi Leobandung, Carol Boye, Fee Li Lie, Shravan Kumar Matham, Brad Austin
  • Publication number: 20200365518
    Abstract: An advanced security method for verifying that integrated circuit patterns being processed into one or more layers provided to a wafer are trusted patterns and that the wafer being used during processing is a trusted wafer is provided. The method includes separate steps of pattern verification and wafer verification. Notably, the method includes first verifying that a pattern printed on a wafer matches a pattern of a trusted reference. Next, a peak and valley profile present at a specific location on a backside surface of the wafer is measured. The method further includes second verify that the measured peak and valley profile matches an original peak and valley profile measured at the same location on the backside surface of the wafer.
    Type: Application
    Filed: May 15, 2019
    Publication date: November 19, 2020
    Inventors: Effendi Leobandung, Carol Boye, Fee Li Lie, Shravan Kumar Matham, Brad Austin
  • Patent number: 7368712
    Abstract: A Y-shaped carbon nanotube atomic force microscope probe tip and methods comprise a shaft portion; a pair of angled arms extending from a same end of the shaft portion, wherein the shaft portion and the pair of angled arms comprise a chemically modified carbon nanotube, and wherein the chemically modified carbon nanotube is modified with any of an amine, carboxyl, fluorine, and metallic component. Preferably, each of the pair of angled arms comprises a length of at least 200 nm and a diameter between 10 and 200 nm. Moreover, the chemically modified carbon nanotube is preferably adapted to allow differentiation between substrate materials to be probed. Additionally, the chemically modified carbon nanotube is preferably adapted to allow fluorine gas to flow through the chemically modified carbon nanotube onto a substrate to be characterized. Furthermore, the chemically modified carbon nanotube is preferably adapted to chemically react with a substrate surface to be characterized.
    Type: Grant
    Filed: December 6, 2005
    Date of Patent: May 6, 2008
    Assignee: International Business Machines Corporation
    Inventors: Carol A. Boye, Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, David V. Horak, Charles W. Koburger, III
  • Publication number: 20070125946
    Abstract: A Y-shaped carbon nanotube atomic force microscope probe tip and methods comprise a shaft portion; a pair of angled arms extending from a same end of the shaft portion, wherein the shaft portion and the pair of angled arms comprise a chemically modified carbon nanotube, and wherein the chemically modified carbon nanotube is modified with any of an amine, carboxyl, fluorine, and metallic component. Preferably, each of the pair of angled arms comprises a length of at least 200 nm and a diameter between 10 and 200 nm. Moreover, the chemically modified carbon nanotube is preferably adapted to allow differentiation between substrate materials to be probed. Additionally, the chemically modified carbon nanotube is preferably adapted to allow fluorine gas to flow through the chemically modified carbon nanotube onto a substrate to be characterized. Furthermore, the chemically modified carbon nanotube is preferably adapted to chemically react with a substrate surface to be characterized.
    Type: Application
    Filed: December 6, 2005
    Publication date: June 7, 2007
    Applicant: International Business Machines Corporation
    Inventors: Carol Boye, Toshiharu Furukawa, Mark Hakey, Steven Holmes, David Horak, Charles Koburger