Abstract: Methods for forming magneto-optical films for integrated photonic devices and integrated photonic devices incorporating same are described. An optical isolator or any nonreciprocal photonic component for an integrated photonic device can be fabricated by depositing a functional garnet layer directly onto a non-garnet substrate; depositing a seed garnet layer on the functional garnet layer; and after depositing both the functional garnet layer and the seed layer performing an annealing process. Since the seed garnet layer crystalizes faster than the functional garnet layer, crystallization of the functional garnet layer can be accomplished directly on the non-garnet substrate during a single annealing step for the seed layer and the functional garnet layer.

Abstract: Methods for forming magneto-optical films for integrated photonic devices and integrated photonic devices incorporating same are described. An optical isolator or any nonreciprocal photonic component for an integrated photonic device can be fabricated by depositing a functional garnet layer directly onto a non-garnet substrate; depositing a seed garnet layer on the functional garnet layer; and after depositing both the functional garnet layer and the seed layer performing an annealing process. Since the seed garnet layer crystalizes faster than the functional garnet layer, crystallization of the functional garnet layer can be accomplished directly on the non-garnet substrate during a single annealing step for the seed layer and the functional garnet layer.