Abstract: A method and system for temperature control of a microclimate device are disclosed. The temperature control can be integrated into a reservation system for the microclimate device. A user interface can receive a user input of a temperature control setting. The user interface can be integrated into the microclimate device. A processor can receive the user input and control a heating and/or cooling device to execute the temperature control setting.

Abstract: A method and system for temperature control of a microclimate device are disclosed. The temperature control can be integrated into a reservation system for the microclimate device. A user interface can receive a user input of a temperature control setting. The user interface can be integrated into the microclimate device. A processor can receive the user input and control a heating and/or cooling device to execute the temperature control setting.

Abstract: A method and system for temperature control of a microclimate device are disclosed. The temperature control can be integrated into a reservation system for the microclimate device. A user interface can receive a user input of a temperature control setting. The user interface can be integrated into the microclimate device. A processor can receive the user input and control a heating and/or cooling device to execute the temperature control setting.

Abstract: A method and system for temperature control of a microclimate device are disclosed. The temperature control can be integrated into a reservation system for the microclimate device. A user interface can receive a user input of a temperature control setting. The user interface can be integrated into the microclimate device. A processor can receive the user input and control a heating and/or cooling device to execute the temperature control setting.

Abstract: An industrial cleaning composition comprises (a) from 5 to 50% by volume of an anionic surfactant having a log10P value in the range 5 to 7, (b) from 5 to 50% by volume of a first non-ionic surfactant having a log10P value in the range 0.1 to 3 and having the general formula, R?-(A0)n-OH wherein R? is C9 to C20 alkyl, each AO unit is either —OCH2CH2— or—OCH2CH(CH3)—; the molar ratio [—OCH2CH(CH3)—]/[—OCH2CH2—] is in the range up to 8 and n is greater than 6 and (c) from 5 to 50% by weight of a second non-ionic surfactant having a log10P value in the range 0.1 to 3 having the general formula, R?—(OCH2CH2)n—OH wherein R? is C9 to C20 alkyl, and n is less than 6, each of said volume percentages being with respect to the total volume of (a), (b) and (c). Corresponding cleaners derived therefrom by water dilution are also disclosed.

Abstract: An industrial cleaning composition comprises (a) from 5 to 50% by volume of an anionic surfactant having a log10P value in the range 5 to 7, (b) from 5 to 50% by volume of a first non-ionic surfactant having a log10P value in the range 0.1 to 3 and having the general formula, R?-(A0)n-OH wherein R? is C9 to C20 alkyl, each AO unit is either —OCH2CH2— or —OCH2CH(CH3)—; the molar ratio [—OCH2CH(CH3)—]/[—OCH2CH2—] is in the range up to 8 and n is greater than 6 and (c) from 5 to 50% by weight of a second non-ionic surfactant having a log10P value in the range 0.1 to 3 having the general formula, R?—(OCH2CH2)n—OH wherein R? is C9 to C20 alkyl, and n is less than 6, each of said volume percentages being with respect to the total volume of (a), (b) and (c). Corresponding cleaners derived therefrom by water dilution are also disclosed.

Abstract: An industrial cleaning composition is provided that includes: (a) from 5 to 50% by volume of an anionic surfactant having a log10P value in the range 5 to 7; (b) from 5 to 50% by volume of a first non-ionic surfactant having a log10P value in the range 0.1 to 3 and having the general formula, R?—(A0)n—OH, wherein R? is C9 to C20 alkyl, each AO unit is either —OCH2CH2— or —OCH2CH(CH3)—, the molar ratio [—OCH2CH(CH3)—]/[—OCH2CH2—] is in the range up to 8 and n is greater than 6; and (c) from 5 to 50% by volume of a second non-ionic surfactant having a log10P value in the range 0.1 to 3 having the general formula, R?—(OCH2CH2)n—OH wherein R? is C9 to C20 alkyl, and n is less than 6, each of said volume percentages being with respect to the total volume of (a), (b) and (c). Corresponding cleaners derived therefrom by water dilution are also disclosed.

Abstract: An industrial cleaning composition is provided that includes: (a) from 5 to 50% by volume of an anionic surfactant having a log10P value in the range 5 to 7; (b) from 5 to 50% by volume of a first non-ionic surfactant having a log10P value in the range 0.1 to 3 and having the general formula, R?—(A0)n—OH, wherein R? is C9 to C20 alkyl, each AO unit is either —OCH2CH2— or —OCH2CH(CH3)—, the molar ratio [—OCH2CH(CH3)—]/[—OCH2CH2—] is in the range up to 8 and n is greater than 6; and (c) from 5 to 50% by volume of a second non-ionic surfactant having a log10P value in the range 0.1 to 3 having the general formula, R?—(OCH2CH2)n—OH wherein R? is C9 to C20 alkyl, and n is less than 6, each of said volume percentages being with respect to the total volume of (a), (b) and (c). Corresponding cleaners derived therefrom by water dilution are also disclosed.

Abstract: A surfactant composition contains at least one sorbitan ester and at least one sorbitol ester wherein the mean number of carbon atoms of the hydrophobe of the sorbitan ester is greater than that of the sorbitol ester. The surfactant composition is particularly suitable for use in stabilising emulsions, especially personal care or cosmetic products.