Patents by Inventor Carolus Ida Spee

Carolus Ida Spee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus
    Publication number: 20070040999
    Abstract: A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H2 containing gas and one or more additional compounds selected from the group of hydrocarbon compounds and silane compounds in at least part of the apparatus includes producing hydrogen radicals from H2 from the H2 containing gas; and bringing the optical element with deposition into contact with at least part of the hydrogen radicals and removing at least part of the deposition. Further, a method for the protection of an optical element of an apparatus including the optical element includes providing a cap layer to the optical element by a deposition process; and during or after use of the apparatus, removing at least part of the cap layer from the optical element in a removal process as described above. The methods can be applied in a lithographic apparatus.
    Type: Application
    Filed: August 22, 2005
    Publication date: February 22, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Maarten Marinus Wilhelmus Van Herpen, Carolus Ida Spee, Derk Klunder, Antonius De Mol
  • Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus
    Publication number: 20060072084
    Abstract: A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H2 containing gas in at least part of the apparatus includes producing hydrogen radicals from H2 from the H2 containing gas; and bringing the optical element with deposition into contact with at least part of the hydrogen radicals and removing at least part of the deposition. Further, a method for the protection of an optical element of an apparatus including the optical element includes providing a cap layer to the optical element by a deposition process; and during or after use of the apparatus, removing at least part of the cap layer from the optical element in a removal process as described above. The methods can be applied in a lithographic apparatus.
    Type: Application
    Filed: October 4, 2004
    Publication date: April 6, 2006
    Applicant: ASML Netherlands B.V.
    Inventors: Maarten Marinus Johannes Van Herpen, Vadim Banine, Johannes Hubertus Moors, Carolus Ida Spee, Derk Jan Klunder
  • Device manufacturing method and a lithographic apparatus
    Publication number: 20050148211
    Abstract: A device manufacturing method is disclosed. The method includes patterning a beam of radiation with a patterning device, projecting the patterned beam of radiation onto a target portion of a substrate, supplying a chemical reagent to a chamber that holds the patterning device and/or the substrate, and removing water from the chamber with use of the chemical reagent.
    Type: Application
    Filed: October 29, 2004
    Publication date: July 7, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Aleksey Kolesnychenko, Ralph Kurt, Carolus Ida Spee