Patents by Inventor Carsten Andreas Kohler
Carsten Andreas Kohler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11474436Abstract: A method for tuning a target apparatus of a patterning process. The method includes obtaining a reference performance, and measurement data of a substrate subjected to the patterning process at the target apparatus, the measurement data indicative of a performance of the target apparatus; determining a cause of a performance mismatch based on a difference between the reference performance and the performance of the target apparatus, wherein the cause includes an optical characteristic; and responsive to the cause, adjusting an optical parameter associated with an adjustable optical characteristic to reduce the performance mismatch in the optical characteristic.Type: GrantFiled: June 11, 2019Date of Patent: October 18, 2022Assignee: ASML Netherlands B.V.Inventors: Bart Smeets, Anita Bouma, Johannes Jacobus Matheus Baselmans, Birgitt Noelle Cornelia Liduine Hepp, Paulus Hubertus Petrus Koller, Carsten Andreas Köhler
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Publication number: 20210247698Abstract: A method for tuning a target apparatus of a patterning process. The method includes obtaining a reference performance, and measurement data of a substrate subjected to the patterning process at the target apparatus, the measurement data indicative of a performance of the target apparatus; determining a cause of a performance mismatch based on a difference between the reference performance and the performance of the target apparatus, wherein the cause includes an optical characteristic; and responsive to the cause, adjusting an optical parameter associated with an adjustable optical characteristic to reduce the performance mismatch in the optical characteristic.Type: ApplicationFiled: June 11, 2019Publication date: August 12, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Bart SMEETS, Anita BOUMA, Johannes Jacobus Matheus BASELMANS, Birgitt Noelle Cornelia Liduine HEPP, Paulus Hubertus Petrus KOLLER, Carsten Andreas KÖHLER
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Patent number: 9280064Abstract: A method of projecting a pattern from a patterning device onto a substrate using a projection system, the method including using an optical phase adjustment apparatus in the projection system to apply a phase modification to radiation which has been diffracted from an assist feature of the pattern, the phase modification acting to reduce the size of an assist feature image exposed in resist on the substrate or prevent printing of the assist feature image in the resist on the substrate, while maintaining a contribution of the assist feature image to an image enhancement of a functional feature of the pattern.Type: GrantFiled: November 26, 2012Date of Patent: March 8, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Peter David Engblom, Carsten Andreas Köhler, Frank Staals, Laurentius Cornelius De Winter
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Patent number: 8717540Abstract: Embodiments of the invention related to lithographic apparatus and methods. A lithographic method comprises calculating a laser metric based on a spectrum of laser radiation emitted from a laser to a lithographic apparatus together with a representation of an aerial image of a pattern to be projected onto the substrate by the lithographic apparatus, and using the laser metric to modify operation of the laser or adjust the lithographic apparatus, and projecting the pattern onto the substrate.Type: GrantFiled: February 2, 2011Date of Patent: May 6, 2014Assignee: ASML Netherlands B.V.Inventors: Carsten Andreas Köhler, Hans Van Der Laan, Frank Staals, Laurentius Cornelius De Winter, Herman Philip Godfried
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Publication number: 20130141706Abstract: A method of projecting a pattern from a patterning device onto a substrate using a projection system, the method including using an optical phase adjustment apparatus in the projection system to apply a phase modification to radiation which has been diffracted from an assist feature of the pattern, the phase modification acting to reduce the size of an assist feature image exposed in resist on the substrate or prevent printing of the assist feature image in the resist on the substrate, while maintaining a contribution of the assist feature image to an image enhancement of a functional feature of the pattern.Type: ApplicationFiled: November 26, 2012Publication date: June 6, 2013Applicant: ASML NETHERLANDS B.V.Inventors: Peter David ENGBLOM, Carsten Andreas KÖHLER, Frank STAALS, Laurentius Cornelius DE WINTER
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Publication number: 20110200922Abstract: Embodiments of the invention related to lithographic apparatus and methods. A lithographic method comprises calculating a laser metric based on a spectrum of laser radiation emitted from a laser to a lithographic apparatus together with a representation of an aerial image of a pattern to be projected onto the substrate by the lithographic apparatus, and using the laser metric to modify operation of the laser or adjust the lithographic apparatus, and projecting the pattern onto the substrate.Type: ApplicationFiled: February 2, 2011Publication date: August 18, 2011Applicant: ASML Netherlands B.V.Inventors: Carsten Andreas Köhler, Hans Van Der Laan, Frank Staals, Laurentius Cornelius De Winter, Herman Philip Godfried
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Patent number: 7374869Abstract: A lithographic double exposure processing method for providing to a device layer a pattern comprises the steps of expanding each feature of a first mask pattern and second mask pattern with a preselected dilatation distance before the first and second exposure steps, resist-processing the exposed radiation sensitive layer of a substrate to provide resist-processed features corresponding to said pattern whereby each resist-processed feature is expanded with respect to its nominal size, and shrinking said resist-processed features over a preselected shrinking distance by applying supplementary resist-processing to said resist-processed features.Type: GrantFiled: April 23, 2004Date of Patent: May 20, 2008Assignee: ASML Netherlands B.V.Inventors: Carsten Andreas Kohler, Jan Bernard Plechelmus Van Schoot
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Patent number: 7245355Abstract: To compensate for birefringence of a mask in a lithographic projection apparatus, the birefringence of a mask is measured and stored as birefringence data in a data storage device. A birefringent compensation element is disposed in the optical path of the lithographic projection apparatus. Appropriate adjustments of the compensation element are determined as those optimally reducing impact of the mask birefringence on the state of polarization at substrate level.Type: GrantFiled: October 11, 2005Date of Patent: July 17, 2007Assignee: ASML Netherlands B.V.Inventors: Johannes Catharinus Hubertus Mulkens, Wilhelmus Petrus De Boeij, Carsten Andreas Kohler
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Patent number: 7245353Abstract: To compensate for birefringence of a mask in a lithographic projection apparatus, the birefringence of a mask is measured and stored as birefringence data in a data storage device. A birefringent compensation element is disposed in the optical path of the lithographic projection apparatus. Appropriate adjustments of the compensation element are determined as those optimally reducing impact of the mask birefringence on the state of polarization at substrate level.Type: GrantFiled: October 12, 2004Date of Patent: July 17, 2007Assignee: ASML Netherlands B.V.Inventors: Johannes Catharinus Hubertus Mulkens, Wil{acute over (h)}elmus Petrus De Boeij, Carsten Andreas Kohler
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Publication number: 20040265710Abstract: A lithographic double exposure processing method for providing to a device layer a pattern comprises the steps of expanding each feature of a first mask pattern and second mask pattern with a preselected dilatation distance before the first and second exposure steps, resist-processing the exposed radiation sensitive layer of a substrate to provide resist-processed features corresponding to said pattern whereby each resist-processed feature is expanded with respect to its nominal size, and shrinking said resist-processed features over a preselected shrinking distance by applying supplementary resist-processing to said resist-processed features.Type: ApplicationFiled: April 23, 2004Publication date: December 30, 2004Applicant: ASML NETHERLANDS B.V.Inventors: Carsten Andreas Kohler, Jan Bernard Plechelmus Van Schoot