Abstract: A system includes a first business object of a first type having a first set of attributes, and a second business object of a second type having a second set of attributes. A portion of the first set of attributes and a portion of the second set of attributes are common to both the first business object and the second business object. The system also includes a common key for both the first business object and the second business object. A user can access either the first business object or the second business object using the common key.

Abstract: To compensate for birefringence of a mask in a lithographic projection apparatus, the birefringence of a mask is measured and stored as birefringence data in a data storage device. A birefringent compensation element is disposed in the optical path of the lithographic projection apparatus. Appropriate adjustments of the compensation element are determined as those optimally reducing impact of the mask birefringence on the state of polarization at substrate level.

Abstract: To compensate for birefringence of a mask in a lithographic projection apparatus, the birefringence of a mask is measured and stored as birefringence data in a data storage device. A birefringent compensation element is disposed in the optical path of the lithographic projection apparatus. Appropriate adjustments of the compensation element are determined as those optimally reducing impact of the mask birefringence on the state of polarization at substrate level.

Abstract: Without changing the initial illumination setting and resist process condition, a method according to one embodiment includes manipulating the design shape by application of additional and non-printable assist features (“sub-resolution assist features” or “SRAF”), such that CD sensitivities of the pattern feature are minimized. The SRAF may comprise chrome dots, or any other design objects of different sizes, shapes, and/or types, which can modulate the intensity and/or phase of the original pattern. to minimize an aberration sensitivity of selected ones of the plurality of pattern features A pattern that was not designed to include SRAF may be modified to include SRAF. In such a method, one or more aspects of the assist features are selected to reduce the aberration-induced image variation for a pattern and its sensitivity to aberrations.

Abstract: A device manufacturing method is disclosed in which the aberration of the projection system of a lithographic projection apparatus is obtained in terms of the Zernike expansion. The field distribution of displacement error and focal plane distortion of the projected image are calculated on the basis of the Zernike aberration and sensitivity coefficients which quantify the relationship between Zernike aberration components and the error in the image. A calculation is then performed to determine the compensation to apply to the apparatus in order to minimize the error in the image. The compensation is then applied to the apparatus. The compensation may comprise increasing one component of aberration of the apparatus in order to decrease the effect of another aberration, such that, on balance, the image quality as a whole is improved.

Abstract: A device manufacturing method is disclosed in which the aberration of the projection system of a lithographic projection apparatus is obtained in terms of the Zernike expansion. The field distribution of displacement error and focal plane distortion of the projected image are calculated on the basis of the Zernike aberration and sensitivity coefficients which quantify the relationship between Zernike aberration components and the error in the image. A calculation is then performed to determine the compensation to apply to the apparatus in order to minimize the error in the image. The compensation is then applied to the apparatus. The compensation may comprise increasing one component of aberration of the apparatus in order to decrease the effect of another aberration, such that, on balance, the image quality as a whole is improved.