Patents by Inventor Carsten Rosenblad

Carsten Rosenblad has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for producing coated workpieces, uses and installation for the method
    Patent number: 6918352
    Abstract: A system and a method produce workpieces coated by PECVD with a quality sufficient for epitaxy. Included are a vacuum recipient, a plasma discharge source operationally connected to the vacuum recipient and a workpiece holder within the vacuum recipient, said plasma discharge source generating on said workpiece holder ions with an energy of below 15 eV. The plasma discharge source can be a low-voltage plasma discharge source in which at least one cathode is arranged within a cathode chamber coupled to the vacuum recipient by a diaphragm.
    Type: Grant
    Filed: July 22, 2002
    Date of Patent: July 19, 2005
    Assignee: Unaxis Trading AG
    Inventors: Hans Von Känel, Carsten Rosenblad, Jurgen Ramm
  • Method for producing coated workpieces, uses and installation for the method
    Publication number: 20030005879
    Abstract: A system and a method produce workpieces coated by PECVD with a quality sufficient for epitaxy. Included are a vacuum recipient, a plasma discharge source operationally connected to the vacuum recipient and a workpiece holder within the vacuum recipient, said plasma discharge source generating on said workpiece holder ions with an energy of below 15 eV. The plasma discharge source can be a low-voltage plasma discharge source in which at least one cathode is arranged within a cathode chamber coupled to the vacuum recipient by a diaphragm.
    Type: Application
    Filed: July 22, 2002
    Publication date: January 9, 2003
    Applicant: Unaxis Trading AG
    Inventors: Hans Von Kanel, Carsten Rosenblad, Jurgen Ramm
  • Method for producing coated workpieces, uses and installation for the method
    Patent number: 6454855
    Abstract: The method is characterized in that layers of sufficient quality for epitaxy are placed on workpieces, at a considerably increased deposition rate. To this end, instead of a UHV-CVD or ECR-CVD method, for example, a PECVD method is used by means of a DC plasma discharge.
    Type: Grant
    Filed: December 13, 1999
    Date of Patent: September 24, 2002
    Assignee: Unaxis Trading AG
    Inventors: Hans Von Känel, Carsten Rosenblad, Jurgen Ramm