Patents by Inventor Cary Chia-Chiung Lo
Cary Chia-Chiung Lo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10279311Abstract: A chemical mechanical polishing (CMP) chamber is disclosed. The CMP chamber includes a chamber body, a door mounted on the chamber body and a chamber substructure being one selected from a group consisting of a moisture separator separating a moisture generated in the CMP chamber, a supplementary exhaust port, a transparent window mounted on the door, a sampling port mounted on the door, a sealing material including a metal frame, an o-ring for sealing the door and a combination thereof.Type: GrantFiled: August 21, 2012Date of Patent: May 7, 2019Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Chih-I Peng, Hsiang-Pi Chang, Cary Chia-Chiung Lo, Teng-Chun Tsai, Kuo-Yin Lin, Chih-Yuan Yang
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Patent number: 9937536Abstract: Among other things, one or more techniques and/or systems are provided for cleaning a polishing module of a semiconductor polishing apparatus. Purge air flow can be supplied into the polishing module (e.g., directed towards a polishing unit, a shield, and/or other polishing components) to create turbulence air flow within the polishing module. An auxiliary exhaust can be invoked to exhaust one or more particulates removed from the polishing module by the turbulence air flow. A purge air flow cycle can be performed by cycling the purge air flow and the auxiliary exhaust between on and off states. One or more purge air flow cycles can be performed during a main air flow cycle where laminar air flow is supplied into the polishing module and exhausted using a main exhaust. In this way, one or more particulates can be cleaned from the polishing module.Type: GrantFiled: July 12, 2012Date of Patent: April 10, 2018Assignee: Taiwan Semiconductor Manufacturing Company LimitedInventors: Kuo-Yin Lin, Chih-I Peng, Kun-Tai Wu, Teng-Chun Tsai, Hsiang-Pi Chang, Cary Chia-Chiung Lo
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Patent number: 9048087Abstract: Methods for an oxide layer over an epitaxial layer. In an embodiment, a method includes forming an epitaxial layer of semiconductor material over a semiconductor substrate; forming an oxide layer over the epitaxial layer; applying a solution including an oxidizer to the oxide layer; and cleaning the oxide layer with a cleaning solution. In another embodiment, a densification process is applied to an oxide layer including treating with thermal energy, UV energy, or both. In an embodiment for a gate-all-around device, the cleaning process is applied to an oxide layer over an epitaxial portion of a fin. Additional methods are disclosed.Type: GrantFiled: June 21, 2013Date of Patent: June 2, 2015Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Li-Lan Wu, Chi-Yuan Chen, Ming-Chyi Liu, Cary Chia-Chiung Lo, Teng-Chun Tsai, Cheng-Tung Lin, Kuo-Yin Lin, Li-Ting Wang, Wan-Chun Pan, Ming-Liang Yen, Huicheng Chang
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Patent number: 8927362Abstract: A semiconductor device and method for fabricating a semiconductor device is disclosed. An exemplary semiconductor device includes a substrate including a first region and a second region. The semiconductor device further includes a first buffer layer formed over the substrate and between first and second isolation regions in the first region and a second buffer layer formed over the substrate and between first and second isolation regions in the second region. The semiconductor device further includes a first fin structure formed over the first buffer layer and between the first and second isolation regions in the first region and a second fin structure formed over the second buffer layer and between the first and second isolation regions in the second region. The first buffer layer includes a top surface different from a top surface of the second buffer layer.Type: GrantFiled: January 31, 2014Date of Patent: January 6, 2015Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Kuo-Cheng Ching, Shi Ning Ju, Cary Chia-Chiung Lo, Huicheng Chang, Chun Chung Su
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Publication number: 20140273412Abstract: Methods for an oxide layer over an epitaxial layer. In an embodiment, a method includes forming an epitaxial layer of semiconductor material over a semiconductor substrate; forming an oxide layer over the epitaxial layer; applying a solution including an oxidizer to the oxide layer; and cleaning the oxide layer with a cleaning solution. In another embodiment, a densification process is applied to an oxide layer including treating with thermal energy, UV energy, or both. In an embodiment for a gate-all-around device, the cleaning process is applied to an oxide layer over an epitaxial portion of a fin. Additional methods are disclosed.Type: ApplicationFiled: June 21, 2013Publication date: September 18, 2014Inventors: Li-Lan Wu, Chi-Yuan Chen, Ming-Chyi Liu, Cary Chia-Chiung Lo, Teng-Chun Tsai, Cheng-Tung Lin, Kuo-Yin Lin, Li-Ting Wang, Wan-Chun Pan, Ming-Liang Yen, Huicheng Chang
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Publication number: 20140141582Abstract: A semiconductor device and method for fabricating a semiconductor device is disclosed. An exemplary semiconductor device includes a substrate including a first region and a second region. The semiconductor device further includes a first buffer layer formed over the substrate and between first and second isolation regions in the first region and a second buffer layer formed over the substrate and between first and second isolation regions in the second region. The semiconductor device further includes a first fin structure formed over the first buffer layer and between the first and second isolation regions in the first region and a second fin structure formed over the second buffer layer and between the first and second isolation regions in the second region. The first buffer layer includes a top surface different from a top surface of the second buffer layer.Type: ApplicationFiled: January 31, 2014Publication date: May 22, 2014Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Kuo-Cheng Ching, Shi Ning Ju, Cary Chia-Chiung Lo, Huicheng Chang, Chun Chung Su
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Patent number: 8680576Abstract: A semiconductor device and method for fabricating a semiconductor device is disclosed. An exemplary semiconductor device includes a substrate including a first region and a second region. The semiconductor device further includes a first buffer layer formed over the substrate and between first and second isolation regions in the first region and a second buffer layer formed over the substrate and between first and second isolation regions in the second region. The semiconductor device further includes a first fin structure formed over the first buffer layer and between the first and second isolation regions in the first region and a second fin structure formed over the second buffer layer and between the first and second isolation regions in the second region. The first buffer layer includes a top surface different from a top surface of the second buffer layer.Type: GrantFiled: May 16, 2012Date of Patent: March 25, 2014Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Kuo-Cheng Ching, Shi Ning Ju, Cary Chia-Chiung Lo, Huicheng Chang, Chun Chung Su
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Publication number: 20140053980Abstract: A chemical mechanical polishing (CMP) chamber is disclosed. The CMP chamber includes a chamber body, a door mounted on the chamber body and a chamber substructure being one selected from a group consisting of a moisture separator separating a moisture generated in the CMP chamber, a supplementary exhaust port, a transparent window mounted on the door, a sampling port mounted on the door, a sealing material including a metal frame, an o-ring for sealing the door and a combination thereof.Type: ApplicationFiled: August 21, 2012Publication date: February 27, 2014Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chih-I Peng, Hsiang-Pi Chang, Cary Chia-Chiung Lo, Teng-Chun Tsai, Kuo-Yin Lin, Chih-Yuan Yang
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Publication number: 20140014136Abstract: Among other things, one or more techniques and/or systems are provided for cleaning a polishing module of a semiconductor polishing apparatus. Purge air flow can be supplied into the polishing module (e.g., directed towards a polishing unit, a shield, and/or other polishing components) to create turbulence air flow within the polishing module. An auxiliary exhaust can be invoked to exhaust one or more particulates removed from the polishing module by the turbulence air flow. A purge air flow cycle can be performed by cycling the purge air flow and the auxiliary exhaust between on and off states. One or more purge air flow cycles can be performed during a main air flow cycle where laminar air flow is supplied into the polishing module and exhausted using a main exhaust. In this way, one or more particulates can be cleaned from the polishing module.Type: ApplicationFiled: July 12, 2012Publication date: January 16, 2014Applicant: Taiwan Semiconductor Manufacturing Company LimitedInventors: Kuo-Yin Lin, Chih-I Peng, Kun-Tai Wu, Teng-Chun Tsai, Hsiang-Pi Chang, Cary Chia-Chiung Lo
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Publication number: 20130307021Abstract: A semiconductor device and method for fabricating a semiconductor device is disclosed. An exemplary semiconductor device includes a substrate including a first region and a second region. The semiconductor device further includes a first buffer layer formed over the substrate and between first and second isolation regions in the first region and a second buffer layer formed over the substrate and between first and second isolation regions in the second region. The semiconductor device further includes a first fin structure formed over the first buffer layer and between the first and second isolation regions in the first region and a second fin structure formed over the second buffer layer and between the first and second isolation regions in the second region. The first buffer layer includes a top surface different from a top surface of the second buffer layer.Type: ApplicationFiled: May 16, 2012Publication date: November 21, 2013Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Kuo-Cheng Ching, Shi Ning Ju, Cary Chia-Chiung Lo, Huicheng Chang, Chun Chung Su