Abstract: Systems and methods for controllable delivery of pressurized refrigerant to a medical device, such as a cryoablation catheter. In some examples, a delivery system includes a tank holding the pressurized refrigerant, an electrical heater arranged to heat the tank, and an electronic controller connected to regulate the heater based on input signals received from a plurality of sensors including a temperature sensor in thermal contact with the exterior surface of the tank and a pressure sensor for measuring pressure in the refrigerant-delivery line connecting the tank to the medical device. In operation, the electronic controller processes the input signals by comparing values of at least some of the input signals with respective threshold values and uses logic operations configured for combined processing of two or more of the input signals to decide when to switch the heater between an ON state and an OFF state.

Abstract: A processing chamber includes a base, a cover, and grippers. The base includes a body, a mating surface, an inner zone cavity extending into the body, a divider substantially surrounding the inner zone cavity, and an outer zone cavity extending into the body and substantially surrounding the divider. The cover includes a mating surface that contacts the body mating surface when the processing chamber is closed. The grippers hold the wafer in the inner zone cavity when the processing chamber is closed.

Abstract: A processing chamber includes a base, a cover, and grippers. The base includes a body, a mating surface, an inner zone cavity extending into the body, a divider substantially surrounding the inner zone cavity, and an outer zone cavity extending into the body and substantially surrounding the divider. The cover includes a mating surface that contacts the body mating surface when the processing chamber is closed. The grippers hold the wafer in the inner zone cavity when the processing chamber is closed.

Abstract: A liquid dispenser for a wafer processing system includes a supply tube with an inlet at one end and an outlet at the other end. Attached to the supply tube at the outlet end is a liquid reservoir. The liquid reservoir has a dispensing plate that has an outlet for dispensing liquid onto a wafer. There is also a dispensing valve for controlling the dispensing of the liquid.

Abstract: A wafer cleaning method includes dispensing liquid chemicals at two flow rates to start a chemical reaction, with the second flow rate being lower than the first. The method also includes dispensing liquid waters at two flow rates to stop a chemical reaction, with the second flow rate being lower than the first.