Abstract: A test apparatus for analyzing performance of a multi-junction solar cell can include a plurality of light source groups, each light source group including three or more light sources distributed over a substrate. Each sub-cell of the solar cell is associated with at least one of the light source groups, and each light source group primarily photoexcites the sub-cell of the light source group with which it is associated. The intensities of the various light source groups can are adjusted such that an output current of each of a plurality of calibration standards is within 2% of a predetermined current value. The test apparatus can then be used to test performance of the multi-junction solar cell.

Abstract: A test apparatus for analyzing performance of a multi-junction solar cell can include a plurality of light source groups, each light source group including three or more light sources distributed over a substrate. Each sub-cell of the solar cell is associated with at least one of the light source groups, and each light source group primarily photoexcites the sub-cell of the light source group with which it is associated. The intensities of the various light source groups can are adjusted such that an output current of each of a plurality of calibration standards is within 2% of a predetermined current value. The test apparatus can then be used to test performance of the multi-junction solar cell.

Abstract: A method and apparatus for scanning multiple scanning probe microscopes in close proximity, to scan overlapping scan areas at the same time while avoiding collision employs a control system providing drive signals to a first Atomic Force Microscope (AFM) and calculated drive signals to additional AFMs based on the first drive signals and the relative position of the additional AFMs to the first AFM for consistent spaced motion. Scanning and Failure Analysis (FA) probing of multiple feature of interest using multiple APMs allows for reduced time for locating FA features to set up measurements.

Abstract: The present invention comprises an apparatus and a method for using multiple scanning probes to deconvolve tip artifacts in scanning probe microscopes and other scanning probe systems. The invention uses multiple scanning probe tips of different geometries or orientations to scan a feature, such as a semiconductor line or trench, and to display the scan data such that tip artifacts from each tip can be omitted from the measurement by data from the other tips.

Abstract: A method and apparatus for scanning multiple scanning probe microscopes in close proximity, to scan overlapping scan areas at the same time while avoiding collision employs a control system providing drive signals to a first Atomic Force Microscope (AFM) and calculated drive signals to additional AFMs based on the first drive signals and the relative position of the additional AFMs to the first AFM for consistent spaced motion. Scanning and Failure Analysis (FA) probing of multiple feature of interest using multiple APMs allows for reduced time for locating FA features to set up measurements.

Abstract: A method and apparatus for scanning multiple scanning probe microscopes in close proximity, to scan overlapping scan areas at the same time while avoiding collision employs a control system providing drive signals to a first Atomic Force Microscope (AFM) and calculated drive signals to additional AFMs based on the first drive signals and the relative position of the additional AFMs to the first AFM for consistent spaced motion. Scanning and Failure Analysis (FA) probing of multiple feature of interest using multiple APMs allows for reduced time for locating FA features to set up measurements.

Abstract: A method and apparatus for scanning multiple scanning probe microscopes in close proximity, to scan overlapping scan areas at the same time while avoiding collision employs a control system providing drive signals to a first Atomic Force Microscope (AFM) and calculated drive signals to additional AFMs based on the first drive signals and the relative position of the additional AFMs to the first AFM for consistent spaced motion. Scanning and Failure Analysis (FA) probing of multiple feature of interest using multiple APMs allows for reduced time for locating FA features to set up measurements.