Patents by Inventor Cass X Shang

Cass X Shang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130053291
    Abstract: A semiconductor processing composition and method for cleaning semiconductor wafers post chemical mechanical polishing comprising a phosphorous base and optionally at least one surfactant.
    Type: Application
    Filed: August 22, 2011
    Publication date: February 28, 2013
    Inventors: Atsushi Otake, Paul R. Bernatis, Cass X. Shang
  • Patent number: 8003587
    Abstract: A composition that includes 2-(2-aminoethylamino)-ethanol, at least one of a chelating agent and a corrosion inhibitor, and water. The composition is capable of removing organic, organometallic and metal oxide residues from semiconductor substrates. The invention also relates to a method of removing etching residue from a semiconductor substrate.
    Type: Grant
    Filed: March 13, 2009
    Date of Patent: August 23, 2011
    Assignee: EKC Technology, Inc.
    Inventors: Wai Mun Lee, Cass X Shang, Atsushi Otake, Akira Kuroda, Takanori Matsumoto, Hisashi Takeda
  • Publication number: 20090203566
    Abstract: A composition that includes 2-(2-aminoethylamino)-ethanol, at least one of a chelating agent and a corrosion inhibitor, and water. The composition is capable of removing organic, organometallic and metal oxide residues from semiconductor substrates. The invention also relates to a method of removing etching residue from a semiconductor substrate.
    Type: Application
    Filed: March 13, 2009
    Publication date: August 13, 2009
    Inventors: Wai Mun Lee, Cass X. Shang, Atsushi Otake, Akira Kuroda, Takanori Matsumoto, Hisashi Takeda