Patents by Inventor Cassidy CONOVER

Cassidy CONOVER has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Organometallic compounds for the deposition of high purity tin oxide and dry etching of the tin oxide films and deposition reactors
    Patent number: 12655164
    Abstract: Specific organometallic compounds of Formula I: Qx-Sn-(A1R1?z)4-x or Formula II: Sn(NR2(CH2)nA2)2 useful for the deposition of high purity tin oxide, as well as methods of using such compounds are disclosed. Also disclosed are compositions of organometallic compounds useful for the deposition of high purity tin oxide that in combination improve stability. Also disclosed are processes for dry etching tin oxide with a particular etchant gas and/or a process for dry etching a substrate using a particular etchant gas with a specific additive.
    Type: Grant
    Filed: August 28, 2020
    Date of Patent: June 16, 2026
    Assignee: SEASTAR CHEMICALS ULC
    Inventors: Diana Fabulyak, Rajesh Odedra, Wesley Phillip Graff, Shaun Cembella, Cassidy Conover
  • ORGANOMETALLIC COMPOUNDS, METHODS OF SYNTHESIZING ORGANOMETALLIC COMPOUNDS, and METHODS OF DEPOSITING METAL OXIDE FILMS and METAL NITRIDE FILMS
    Publication number: 20260159947
    Abstract: Disclosed herein are organometallic compounds including monomeric alkoxyaminosilane complexes and dimeric alkoxyaminosilane complexes useful as precursors for metal oxide and metal nitride vapor phase deposition. Additionally, disclosed herein are methods for synthesizing these organometallic compounds and methods for forming metal oxide films and metal nitride films by vapor phase deposition using these organometallic compounds.
    Type: Application
    Filed: December 4, 2025
    Publication date: June 11, 2026
    Applicant: SEASTAR CHEMICALS ULC
    Inventors: Shaun CEMBELLA, Diana FABULYAK, Cassidy CONOVER, Collin CAMPBELL, Wesley GRAFF
  • Process for removing tin oxide deposits
    Patent number: 12552819
    Abstract: Specific organometallic compounds of Formula I: Qx-Sn-(A1R1?z)4-x or Formula II: Sn(NR2(CH2)nA2)2 useful for the deposition of high purity tin oxide, as well as methods of using such compounds are disclosed. Also disclosed are compositions of organometallic compounds useful for the deposition of high purity tin oxide that in combination improve stability. Also disclosed are processes for dry etching tin oxide with a particular etchant gas and/or a process for dry etching a substrate using a particular etchant gas with a specific additive.
    Type: Grant
    Filed: July 17, 2025
    Date of Patent: February 17, 2026
    Assignee: SEASTAR CHEMICALS ULC
    Inventors: Diana Fabulyak, Rajesh Odedra, Wesley Phillip Graff, Shaun Cembella, Cassidy Conover
  • PROCESS FOR REMOVING TIN OXIDE DEPOSITS
    Publication number: 20250346614
    Abstract: Specific organometallic compounds of Formula I: Qx-Sn-(A1R1?z)4-x or Formula II: Sn(NR2(CH2)nA2)2 useful for the deposition of high purity tin oxide, as well as methods of using such compounds are disclosed. Also disclosed are compositions of organometallic compounds useful for the deposition of high purity tin oxide that in combination improve stability. Also disclosed are processes for dry etching tin oxide with a particular etchant gas and/or a process for dry etching a substrate using a particular etchant gas with a specific additive.
    Type: Application
    Filed: July 17, 2025
    Publication date: November 13, 2025
    Applicant: SEASTAR CHEMICALS ULC
    Inventors: Diana FABULYAK, Rajesh ODEDRA, Wesley Phillip GRAFF, Shaun CEMBELLA, Cassidy CONOVER
  • TIN CONTAINING ORGANOMETALLIC COMPOUNDS
    Publication number: 20250197429
    Abstract: Specific organometallic compounds of Formula I: (R)xSn(A)4?x, wherein R is selected from unsaturated hydrocarbons and A is selected from amine groups, alkoxy groups, and halides, as well as highly purified forms of the organometallic compounds.
    Type: Application
    Filed: April 20, 2023
    Publication date: June 19, 2025
    Applicant: SEASTAR CHEMICALS ULC
    Inventors: Diana FABULYAK, Cassidy CONOVER, Shaun CEMBELLA, Collin CAMPBELL
  • ORGANOMETALLIC COMPOUNDS FOR THE DEPOSITION OF HIGH PURITY TIN OXIDE AND DRY ETCHING OF THE TIN OXIDE FILMS AND DEPOSITION REACTORS
    Publication number: 20220306657
    Abstract: Specific organometallic compounds of Formula I: Qx-Sn-(A1R1?z)4-x or Formula II: Sn(NR2(CH2)nA2)2 useful for the deposition of high purity tin oxide, as well as methods of using such compounds are disclosed. Also disclosed are compositions of organometallic compounds useful for the deposition of high purity tin oxide that in combination improve stability. Also disclosed are processes for dry etching tin oxide with a particular etchant gas and/or a process for dry etching a substrate using a particular etchant gas with a specific additive.
    Type: Application
    Filed: August 28, 2020
    Publication date: September 29, 2022
    Applicant: SEASTAR CHEMICALS ULC
    Inventors: Diana FABULYAK, Rajesh ODEDRA, Wesley Phillip GRAFF, Shaun CEMBELLA, Cassidy CONOVER