Patents by Inventor Catherine Jakus

Catherine Jakus has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Negative image process utilizing photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester or phenolic resin with diazoquinone sulfonic acid or diazoquinone carboxylic acid, and associated imaged article
    Patent number: 5272026
    Abstract: A photosensitive composition having contrast and selectivity, useful in forming high resolution patterns.The composition comprises a phenolic resin, a diazoquinone compound and an aromatic fused polycyclic sulfonic or carboxylic acid, in the form of the free acid and/or an ammonium salt and/or an acid halide, the cation component of the ammonium salt having the formula ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4, each represent hydrogen, C.sub.1 -C.sub.4 -alkyl or C.sub.1 -C.sub.4 -hydroxyalkyl.In forming a negative pattern, the composition is coated on a substrate and exposed imagewise to ultraviolet radiation, thereafter treated with a silicon compound, whereby the silicon compound is selectively absorbed into the irradiated portions and the non-irradiated portions are then removed by dry etching.
    Type: Grant
    Filed: February 11, 1992
    Date of Patent: December 21, 1993
    Assignee: UCB S.A.
    Inventors: Bruno Roland, Jan Vandendriessche, Catherine Jakus
  • Photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester of phenolic resin with diazoquinonesulfonic acid or diazoquinonecarboxylic acid
    Patent number: 5116715
    Abstract: A photosensitive composition having increased contrast and selectivity, useful in forming high resolution patterns. The composition comprises a phenolic resin, a diazoquinone compound and an aromatic fused polycyclic sulfonic or carboxylic acid, in the form of the free acid and/or an ammonium salt and/or an acid halide, the cation component of the ammonium salt having the formula ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4, each represent hydrogen, C.sub.1 -C.sub.4 -alkyl or C.sub.1 -C.sub.4 -hydroxyalkyl.In forming a negative pattern, the composition is coated on a substrate and exposed imagewise to ultraviolet radiation, thereafter treated with a silicon compound, whereby the silicon compound is selectively absorbed into the irradiated portions and the nonirradiated portions are then removed by dry etching.
    Type: Grant
    Filed: March 8, 1991
    Date of Patent: May 26, 1992
    Assignee: U C B S.A.
    Inventors: Bruno Roland, Jan Vandendriessche, Catherine Jakus