Patents by Inventor Catherine Maeder-Pachurka

Catherine Maeder-Pachurka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060138076
    Abstract: Production process of a flat suspended micro-structure using a sacrificial layer of polymer material and component obtained thereby The process successively comprises deposition of a sacrificial layer (2) of polymer material, deposition, on at least a part of the substrate (1) and of the front face of the sacrificial layer (2), of an embedding layer (6), the thickness whereof is larger than that of the sacrificial layer (2), and planarization so that the front faces of the sacrificial layer (2) and of the embedding layer (6) form a common flat surface. A formation layer (3) of a suspended structure (5) is deposited on the front face of the common flat surface. Planarization can comprise chemical mechanical polishing and etching of the embedding layer (6). Etching of the sacrificial layer (2) can be performed by means of a mask formed on the front face of a layer of polymer material eliminated during the planarization step.
    Type: Application
    Filed: December 18, 2003
    Publication date: June 29, 2006
    Inventors: Philippe Robert, France Michel, Catherine Maeder-Pachurka, Nicolas Sillon