Patents by Inventor Catherine Odor

Catherine Odor has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and method for enhanced monitoring of an etch process
    Patent number: 6828249
    Abstract: A method for monitoring an etch process of a substrate that includes receiving a first signal having a first wavelength, deriving a second signal based on the first signal and combining the first signal with the second signal to produce a composite signal having a composite wavelength less than the first wavelength. The method further includes identifying one or more inflection points of the composite signal and determining an etch rate of an etch process by evaluating the inflection points and elapsed time between the inflection points.
    Type: Grant
    Filed: March 20, 2002
    Date of Patent: December 7, 2004
    Assignee: Infineon Technologies Richmond, LP.
    Inventors: Catherine Odor, Richard Chapman
  • System and method for enhanced monitoring of an etch process
    Publication number: 20030178390
    Abstract: A method for monitoring an etch process of a substrate that includes receiving a first signal having a first wavelength, deriving a second signal based on the first signal and combining the first signal with the second signal to produce a composite signal having a composite wavelength less than the first wavelength. The method further includes identifying one or more inflection points of the composite signal and determining an etch rate of an etch process by evaluating the inflection points and elapsed time between the inflection points.
    Type: Application
    Filed: March 20, 2002
    Publication date: September 25, 2003
    Inventors: Catherine Odor, Richard Chapman