Abstract: The method for treating the internal surface of a gas bottle includes the following steps:

Abstract: The method for treating the internal surface of a gas bottle includes the following steps: a) an incident laser treatment beam is introduced into a bottle through its mouth, approximately along the axis of the bottle; b) the laser beam is deflected in the bottle onto the internal surface of the bottle; c) a relative rotation between the bottle and the deflected laser beam is made approximately about the axis of the bottle; and d) a relative displacement between the bottle and the deflected laser beam is made so as to scan most of the internal surface of the bottle with the deflected laser beam. The apparatus for treating a bottle is designed to implement the steps of the method.

Abstract: The method for treating the internal surface of a gas bottle includes the following steps:

Abstract: The invention relates to a process for analyzing traces of at least one impurity in a gas sample, by absorption by the impurity to be detected of a light beam emitted by a semiconductor diode laser, the beam emitted by the diode being split into at least two branched beams, one called the measurement beam which passes through the gas sample to be analyzed in a multipassage cell before being focused onto a measurement photodetector, another branched beam, called the reference beam, being along a reference path and directly focused onto a reference photodetector without encountering the gas sample, in which process the gas sample is at a pressure at least equal to atmospheric pressure, and a modulation of the supply current of the diode has been introduced, which comprises at least one function of the exponential type.

Abstract: A device for supplying gas to an analyzer for measuring traces of impurities in the gas comprising: (i) a source of pure gas; (ii) a set of at least first and second bypass gas lines, arranged in parallel and fed by the source of pure gas, the first and second bypass gas lines having a common gas entry and a common gas exit, the common gas exit being in communication with a feed line of the analyzer through a common gas exit line; (iii) a device for charging a gas in the first bypass gas line with a predetermined quantity of at least one impurity for forming a standardizing gas; (iv) a restriction disposed in each of the first and second bypass gas lines, each restriction being calibrated to divide the flow of pure gas feeding the set between the first and second bypass lines in a predetermined ratio; and (v) a flow regulator for regulating the flow of pure gas feeding the set of bypass gas lines, disposed between the source of pure gas and the common gas entry of the first and second bypass gas lines, wherei

Abstract: A novel process for supplying a gas to an analyzer for measuring traces of impurities in the gas is provided. The process includes the steps of supplying the analyzer with: (i) a gas to be analyzed; (ii) a pure gas; and (iii) a standardizing gas obtained by dilution of one or more impurities in the pure gas as follows: (A) dividing a flow of pure gas into a set of at least first and second bypass lines, arranged in parallel, each of the bypass lines having an entry including a calibrated restriction, the flow of pure gas into the set of bypass lines being regulated by a flow regulator placed upstream of the set, (B) charging the pure gas of the first bypass line with a predetermined quantity of at least one impurity to obtain, after dilution with the pure gas of the second bypass line, a flow of the standardizing gas, which is directed from an exit of the set of bypass lines towards the analyzer along a feed line.