Patents by Inventor Catherine Zhou

Catherine Zhou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • IMMERSIVE OXIDATION AND ETCHING PROCESS FOR CLEANING SILICON ELECTRODES
    Publication number: 20100139692
    Abstract: A process for cleaning a silicon electrode is provided where the silicon electrode is soaked in an agitated aqueous detergent solution and rinsed with water following removal from the aqueous detergent solution. The rinsed silicon electrode is then soaked in an agitated isopropyl alcohol (IPA) solution and rinsed. The silicon electrode is then subjected to an ultrasonic cleaning operation in water following removal from the IPA solution. Contaminants are then removed from the silicon electrode by soaking the silicon electrode in an agitated mixed acid solution comprising hydrofluoric acid, nitric acid, acetic acid, and water. The silicon electrode is subjected to an additional ultrasonic cleaning operation following removal from the mixed acid solution and is subsequently rinsed and dried. In other embodiments of the present disclosure, it is contemplated that the silicon electrode can be soaked in either the agitated aqueous detergent solution, the agitated isopropyl alcohol (IPA) solution, or both.
    Type: Application
    Filed: December 10, 2009
    Publication date: June 10, 2010
    Applicant: LAM RESEARCH CORPORATION
    Inventors: Armen Avoyan, Duane Outka, Catherine Zhou, Hong Shih
  • Methods for silicon electrode assembly etch rate and etch uniformity recovery
    Patent number: 7442114
    Abstract: Methods for cleaning an electrode assembly, which can be used for etching a dielectric material in a plasma etching chamber after the cleaning, comprise polishing a silicon surface of the electrode assembly, preferably to remove black silicon contamination therefrom.
    Type: Grant
    Filed: December 23, 2004
    Date of Patent: October 28, 2008
    Assignee: Lam Research Corporation
    Inventors: Tuochuan Huang, Daxing Ren, Hong Shih, Catherine Zhou, Chun Yan, Enrico Magni, Bi Ming Yen, Jerome Hubacek, Dae J. Lim, Dougyong Sung
  • Methods and apparatus for wet cleaning electrode assemblies for plasma processing apparatuses
    Publication number: 20080092920
    Abstract: Methods of cleaning backing plates of electrode assemblies, or electrode assemblies including a backing plate and an electrode plate are provided. The methods can be used to clean backing plates and electrode plates made of various materials, such as silicon electrode plates and graphite and aluminum backing plates. The backing plates and electrode assemblies can be new, used or refurbished. A flushing fixture that can be used in the cleaning methods is also provided.
    Type: Application
    Filed: December 19, 2006
    Publication date: April 24, 2008
    Applicant: Lam Research Corporation
    Inventors: Hong Shih, Yaobo Yin, Jason Augustino, Catherine Zhou, Armen Avoyan
  • Methods for silicon electrode assembly etch rate and etch uniformity recovery
    Publication number: 20060138081
    Abstract: Methods for cleaning an electrode assembly, which can be used for etching a dielectric material in a plasma etching chamber after the cleaning, comprise polishing a silicon surface of the electrode assembly, preferably to remove black silicon contamination therefrom.
    Type: Application
    Filed: December 23, 2004
    Publication date: June 29, 2006
    Inventors: Tuochuan Huang, Daxing Ren, Hong Shih, Catherine Zhou, Chun Yan, Enrico Magni, Bi Yen, Jerome Hubacek, Dae Lim, Dougyong Sung
  • WET CLEANING OF ELECTROSTATIC CHUCKS
    Publication number: 20060112969
    Abstract: A non-destructive and simple method for cleaning a new or used electrostatic chuck comprises a wet cleaning process, which removes contaminants deposited on a surface of the electrostatic chuck.
    Type: Application
    Filed: December 1, 2004
    Publication date: June 1, 2006
    Inventors: Hong Shih, Tuochuan Huang, Catherine Zhou, Bruno Morel, Brian McMillin, Paul Mulgrew, Armen Avoyan
  • Wet cleaning of electrostatic chucks
    Patent number: 7052553
    Abstract: A non-destructive and simple method for cleaning a new or used electrostatic chuck comprises a wet cleaning process, which removes contaminants deposited on a surface of the electrostatic chuck.
    Type: Grant
    Filed: December 1, 2004
    Date of Patent: May 30, 2006
    Assignee: Lam Research Corporation
    Inventors: Hong Shih, Tuochuan Huang, Catherine Zhou, Bruno Morel, Brian McMillin, Paul Mulgrew, Armen Avoyan