Patents by Inventor Cecil B. Shephard, Jr.

Cecil B. Shephard, Jr. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for plasma deposition on apertured substrates
    Patent number: 5204144
    Abstract: The substrate in a plasma jet deposition system is provided with structural attributes, such as apertures and/or grooves, that facilitate efficient deposition. Groups of substrates are arranged with respect to the plasma beam in a manner which also facilitates efficient deposition. In addition to increasing the portion of the plasma beam volume which contacts the substrate surface or surfaces, it is advantageous to provide for the efficient evacuation of spent fluids away from the substrate so that fresh plasma containing the operative species can easily and continuously contact the substrate surface.
    Type: Grant
    Filed: May 10, 1991
    Date of Patent: April 20, 1993
    Assignee: Celestech, Inc.
    Inventors: Gordon L. Cann, Cecil B. Shephard, Jr., Frank X. McKevitt