Patents by Inventor Cecilia Wang

Cecilia Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240390300
    Abstract: The present invention relates to advanced methods of treating a wound comprising the steps of cleansing the wound with an antiseptic formulation, applying an antibiotic formulation to the wound, covering the wound with an adhesive bandage, and repeating these steps for at least two additional, consecutive days.
    Type: Application
    Filed: May 23, 2023
    Publication date: November 28, 2024
    Inventors: Fernanda M. B. Bruzadin, Jenny Du-Soriano, Gabriella John, Caihua Cecilia Wang
  • Patent number: 8343276
    Abstract: The present invention provides a high-temperature ionic state fluidized bed compound crystallization technology and an internal reactor structure thereof. The principle of the present invention is that reaction gas is effected by a group of high-frequency external magnetic fields and forms the high-temperature gaseous ion in the first quartz vacuum tube, then forms ion deposition diffusion in the second quartz vacuum tube preheated at constant temperature. As a result, other high-temperature gaseous ions except the silicon hydride are decomposed, rapidly deposited and crystallized in the ion diffusion chamber. And the un-decomposed silicon hydride gas is directly poured into the surface of the silicon heating body of the compound fluidized bed by the static negative high-voltage quartz spray hole to decompose and crystallize, or crystallize by a way of fluid state in the arched heating quartz tube communicating with the top of two quartz reaction furnaces.
    Type: Grant
    Filed: June 18, 2009
    Date of Patent: January 1, 2013
    Inventors: Haibiao Wang, Tetsunori Kunimune, Cecilia Wang
  • Publication number: 20100323121
    Abstract: A method of preparing a diaphragm of high purity polysilicon continuously, includes: impacting high purity silane gas molecules with a high temperature Argon ion beam source in a microwave resonator, so as to make an energy of the high purity silane gas molecules close to a particle binding energy of formation and form grains on a surface of the substrate when the high purity silane gas molecules reach a substrate of the microwave resonator, wherein the particle binding energy is more than 50 kev, the grains have diameters of about 50 nm.
    Type: Application
    Filed: June 18, 2009
    Publication date: December 23, 2010
    Inventors: Haibiao Wang, Zhongdao Yan, Fangtai Ma, Cecilia Wang
  • Publication number: 20100320075
    Abstract: The present invention provides a high-temperature ionic state fluidized bed compound crystallization technology and an internal reactor structure thereof. The principle of the present invention is that reaction gas is effected by a group of high-frequency external magnetic fields and forms the high-temperature gaseous ion in the first quartz vacuum tube, then forms ion deposition diffusion in the second quartz vacuum tube preheated at constant temperature. As a result, other high-temperature gaseous ions except the silicon hydride are decomposed, rapidly deposited and crystallized in the ion diffusion chamber. And the un-decomposed silicon hydride gas is directly poured into the surface of the silicon heating body of the compound fluidized bed by the static negative high-voltage quartz spray hole to decompose and crystallize, or crystallize by a way of fluid state in the arched heating quartz tube communicating with the top of two quartz reaction furnaces.
    Type: Application
    Filed: June 18, 2009
    Publication date: December 23, 2010
    Inventors: Haibiao Wang, Tetsunori Kunimune, Cecilia Wang