Abstract: An air treatment system (1) arranged for treating polluted air (Apol) at least by means of an air particle filter, and wherein said air treatment system comprises an air treatment unit placed upstream of the air particle filter and being arranged for directing a sub-flow (Asub) of the polluted air (Apol) through said air treatment unit (2) and for subjecting the sub-flow (Asub) to a photooxidation process. The photooxidation process in the air treatment unit (2) is so efficient that the overall concentration of gas-pollution of the combined air flow Acorn is significantly reduced whereby large volumes of polluted air can be treated in a fast, inexpensive and effective manner.

Abstract: The present invention relates to an air treatment method and a system (1a-1f) arranged for treating an air flow (3) to be entered into a semiconductor clean room. Said air flow (3) comprises at least one vapour phase compound, and wherein the air flow (3) is subjected to at least one first treatment process arranged for reducing the concentration of the at least one vapour phase compound in the treated air flow below a predefined threshold, and wherein said first treatment process comprises subjecting the air flow to at least one photooxidation step.

Abstract: An air treatment system (1) arranged for treating polluted air (Apol) at least by means of an air particle filter, and wherein said air treatment system comprises an air treatment unit placed upstream of the air particle filter and being arranged for directing a sub-flow (Asub) of the polluted air (Apol) through said air treatment unit (2) and for subjecting the sub-flow (Asub) to a photooxidation process. The photooxidation process in the air treatment unit (2) is so efficient that the overall concentration of gas-pollution of the combined air flow Acom is significantly reduced whereby large volumes of polluted air can be treated in a fast, inexpensive and effective manner.