Patents by Inventor Cedric Lee

Cedric Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240084805
    Abstract: A mass spectrometer comprising: a vacuum housing comprising a first vacuum chamber having a first gas exhaust port; a gas pump (1700) having a first gas inlet port connected to the first gas exhaust port (H1) by a first gas conduit for evacuating the first vacuum chamber, and a first apertured cover (2010) arranged over the first gas exhaust port (H1) or first gas inlet port, or in the first gas conduit therebetween.
    Type: Application
    Filed: November 21, 2023
    Publication date: March 14, 2024
    Applicant: Micromass UK Limited
    Inventors: Cedric Marsh, Peter Carney, Jason Lee Wildgoose, David Wallis, Paul McIver, Soji Chummar, George Andreas Antoniades, Dipesh Mistry
  • Patent number: 10943405
    Abstract: A system may include a memory device to store instructions and data, and at least one processing device to execute the instructions stored in the memory device to: receive a background image and a digital object to be composited onto the background image in a mixed reality view, generate a 2D bounding region for the digital object, select a version of the background image at a pre-defined resolution, overlay the 2D bounding region on the selected version of the background image and obtain a set of samples of the colors of pixels of the selected version along a perimeter of the 2D bounding region, and determine a value for one or more digital lighting sources to illuminate the digital object in the mixed reality view, based, at least in part, on the set of samples.
    Type: Grant
    Filed: September 13, 2019
    Date of Patent: March 9, 2021
    Assignee: Microsoft Technology Licensing, LLC
    Inventors: Andrew Klein, Cedric Caillaud, Jeremy Kersey, Cedric Lee, William Ben Hanke
  • Publication number: 20200035032
    Abstract: A system may include a memory device to store instructions and data, and at least one processing device to execute the instructions stored in the memory device to: receive a background image and a digital object to be composited onto the background image in a mixed reality view, generate a 2D bounding region for the digital object, select a version of the background image at a pre-defined resolution, overlay the 2D bounding region on the selected version of the background image and obtain a set of samples of the colors of pixels of the selected version along a perimeter of the 2D bounding region, and determine a value for one or more digital lighting sources to illuminate the digital object in the mixed reality view, based, at least in part, on the set of samples.
    Type: Application
    Filed: September 13, 2019
    Publication date: January 30, 2020
    Inventors: Andrew KLEIN, Cedric CAILLAUD, Jeremy KERSEY, Cedric LEE, William Ben HANKE
  • Patent number: 10475248
    Abstract: A system may include a memory device to store instructions and data, and at least one processing device to execute the instructions stored in the memory device to: receive a background image and a digital object to be composited onto the background image in a mixed reality view, generate a 2D bounding region for the digital object, select a version of the background image at a pre-defined resolution, overlay the 2D bounding region on the selected version of the background image and obtain a set of samples of the colors of pixels of the selected version along a perimeter of the 2D bounding region, and determine a value for one or more digital lighting sources to illuminate the digital object in the mixed reality view, based, at least in part, on the set of samples.
    Type: Grant
    Filed: June 8, 2018
    Date of Patent: November 12, 2019
    Assignee: Microsoft Technology Licensing, LLC
    Inventors: Andrew Klein, Cedric Caillaud, Jeremy Kersey, Cedric Lee, William Ben Hanke
  • Patent number: 7833817
    Abstract: A method for fabricating an image sensor includes following steps. First, a substrate having semiconductor devices formed thereon is provided. Interlayer insulating films and Interlayer conductive films are formed on the substrate alternately, wherein the interlayer conductive films are electrically connected to the semiconductor devices. Next, isolated photo-diodes are formed on a topmost layer of the interlayer conductive films, wherein one electrode of the isolated photo-diodes is electrically connected to a topmost layer of the interlayer conductive films. A top insulating layer is formed on the topmost layer of the interlayer conductive films, wherein the isolated photo-diodes are covered by the top insulating layer. A top conductive layer is formed in the top insulating layer, wherein the top conductive layer is electrically connected to another electrode of the isolated photo-diodes.
    Type: Grant
    Filed: November 10, 2008
    Date of Patent: November 16, 2010
    Assignee: Hejian Technology (Suzhou) Co., Ltd.
    Inventors: Wenyu Gao, Cedric Lee
  • Publication number: 20090068786
    Abstract: A method for fabricating an image sensor includes following steps. First, a substrate having semiconductor devices formed thereon is provided. Interlayer insulating films and Interlayer conductive films are formed on the substrate alternately, wherein the interlayer conductive films are electrically connected to the semiconductor devices. Next, isolated photo-diodes are formed on a topmost layer of the interlayer conductive films, wherein one electrode of the isolated photo-diodes is electrically connected to a topmost layer of the interlayer conductive films. A top insulating layer is formed on the topmost layer of the interlayer conductive films, wherein the isolated photo-diodes are covered by the top insulating layer. A top conductive layer is formed in the top insulating layer, wherein the top conductive layer is electrically connected to another electrode of the isolated photo-diodes.
    Type: Application
    Filed: November 10, 2008
    Publication date: March 12, 2009
    Applicant: HEJIAN TECHNOLOGY (SUZHOU) CO., LTD.
    Inventors: Wenyu Gao, Cedric Lee
  • Patent number: 7482646
    Abstract: An image sensor including a substrate having a plurality of semiconductor devices formed thereon, an interconnection layer disposed on the substrate, and a plurality of isolated photo-diodes embedded in the interconnection layer is provided. The isolated photo-diodes are located above the semiconductor devices and electrically connected to the semiconductor devices through the interconnection layer. In the above-mentioned image sensor, thickness of the interconnection layer is not limited so as to facilitate fabrication of the SOC CMOS image sensor. In addition, the image sensor is advantageous in relatively high fill-factor, layout area saving and easy being implanted. Furthermore, a method for fabricating the image mentioned above is also provided.
    Type: Grant
    Filed: October 18, 2006
    Date of Patent: January 27, 2009
    Assignee: Hejian Technology (Suzhou) Co., Ltd.
    Inventors: Wenyu Gao, Cedric Lee
  • Publication number: 20080093695
    Abstract: An image sensor including a substrate having a plurality of semiconductor devices formed thereon, an interconnection layer disposed on the substrate, and a plurality of isolated photo-diodes embedded in the interconnection layer is provided. The isolated photo-diodes are located above the semiconductor devices and electrically connected to the semiconductor devices through the interconnection layer. In the above-mentioned image sensor, thickness of the interconnection layer is not limited so as to facilitate fabrication of the SOC CMOS image sensor. In addition, the image sensor is advantageous in relatively high fill-factor, layout area saving and easy being implanted. Furthermore, a method for fabricating the image mentioned above is also provided.
    Type: Application
    Filed: October 18, 2006
    Publication date: April 24, 2008
    Applicant: HEJIAN TECHNOLOGY (SUZHOU) CO., LTD.
    Inventors: Wenyu Gao, Cedric Lee
  • Patent number: 6833318
    Abstract: A gap-filling process is provided. A substrate having a dielectric layer thereon is provided. The dielectric layer has an opening therein. A gap-filling material layer is formed over the dielectric layer and inside the opening. A portion of the gap-filling material is removed from the gap-filling material layer to expose the dielectric layer. A gap-filling material treatment of the surface of the gap-filling material layer and the dielectric layer is carried out to planarize the gap-filling material layer so that a subsequently formed bottom anti-reflection coating or material layer over the gap-filling material layer can have a high degree of planarity.
    Type: Grant
    Filed: November 20, 2002
    Date of Patent: December 21, 2004
    Assignee: United Microelectronics Corp.
    Inventors: Chun-Jen Weng, Juan-Yi Chen, Hong-Tsz Pan, Cedric Lee, Der-Yuan Wu, Jackson Lin, Yeong-Song Yen, Lawrence Lin, Ying-Chung Tseng
  • Publication number: 20040097069
    Abstract: A gap-filling process is provided. A substrate having a dielectric layer thereon is provided. The dielectric layer has an opening therein. A gap-filling material layer is formed over the dielectric layer and inside the opening. A portion of the gap-filling material is removed from the gap-filling material layer to expose the dielectric layer. A gap-filling material treatment of the surface of the gap-filling material layer and the dielectric layer is carried out to planarize the gap-filling material layer so that a subsequently formed bottom anti-reflection coating or material layer over the gap-filling material layer can have a high degree of planarity.
    Type: Application
    Filed: November 20, 2002
    Publication date: May 20, 2004
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Chun-Jen Weng, Juan-Yi Chen, Hong-Tsz Pan, Cedric Lee, Der-Yuan Wu, Jackson Lin, Yeong-Song Yen, Lawrence Lin, Ying-Chung Tseng
  • Patent number: 4202746
    Abstract: An aqueous water-dilutable composition for use as a cathodic coating material is prepared by partially epoxidizing a liquid polydiene, all or a major proportion of which is derived from a 1,4-conjugated diene, such as butediene, aminating the epoxidized polydiene at a temperature of at least 120.degree. C. and, optionally in the presence of an organic hydroxy-group-containing catalyst, with at least polyamine reactant which contains not more than one primary amino group and/or at least one secondary amine group with the or any remaining amine group(s) being selected from secondary and tertiary amine groups and thereafter partially neutralizing the aminated polymeric material with acid to yield a water-dilutable material containing residual unsaturation.
    Type: Grant
    Filed: June 26, 1978
    Date of Patent: May 13, 1980
    Assignee: Polymer Investments N.V.
    Inventors: Cedric Lee, Martin E. Burrage
  • Patent number: 4145321
    Abstract: A pressure-sensitive adhesive composition with a low content of volatile liquids, such as organic solvents or water, comprises a maleinized liquid polybutadiene blended with one or more tackifying resins and one or more curing agents, suchas a blocked polyamine, the composition containing less than 20% by weight of volatile liquids. The liquid polybutadiene, which can be made by any conventional polymerization mechanism, is maleinized by reaction with meleic anhydride, and it is convenient to add the tackifying resin and any other ingredients of the composition to the maleinized liquid polybutadiene just after the maleinization reaction.
    Type: Grant
    Filed: November 14, 1977
    Date of Patent: March 20, 1979
    Assignee: Revertex Limited
    Inventor: Cedric Lee