Patents by Inventor Celin M. Savariar-Hauck

Celin M. Savariar-Hauck has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6649323
    Abstract: A lithographic printing plate precursor comprises a substrate, a free radical polymerizable photosensitive layer comprising a light-sensitive composition on the substrate, and a water-soluble overcoat layer on the photosensitive layer, wherein the overcoat layer comprises polyvinyl alcohol, and a further component that is not amphoteric and is poly(1-vinylimidazole) or a copolymer of 1-vinylimidazole and at least one further monomer. The photosensitive layer comprises a free radical polymerizable component and a photoinitiator.
    Type: Grant
    Filed: January 21, 2000
    Date of Patent: November 18, 2003
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Socrates Peter Pappas, Harald Baumann, Udo Dwars, Celin M. Savariar-Hauck, Hans-Joachim Timpe
  • Publication number: 20020010264
    Abstract: The invention relates to water-soluble layers which in addition to polyvinyl alcohol comprise poly(1-vinylimidazole) or a copolymer of 1-vinylimidazole and at least one further monomer as a further component. These layers can be used as an overcoat on the light-sensitive layer of printing plates.
    Type: Application
    Filed: January 21, 2000
    Publication date: January 24, 2002
    Inventors: Socrates Peter Pappas, Harald Baumann, Udo Dwars, Celin M. Savariar-Hauck, Hans-Joachim Timpe
  • Patent number: 5695905
    Abstract: A photosensitive composition having a photoreactive component, selected from a diazonium polycondensation product or a free radical polymerizable system of photoinitiators and unsaturated compounds or a hybrid system and a binder formed by reacting a carboxyl group containing a polymer of formulaP--(--X--COOH).sub.n (I),wherein P is a polymer, n is an integer and X is a single bond or a spacer group, with a 2-oxazoline of the formula ##STR1## wherein R is an alkyl-, aryl-, aralkyl-, alkoxy-, aryloxy- or aralkyloxy group and R' and R" are independently a hydrogen, alkyl- or aryl groups.
    Type: Grant
    Filed: May 17, 1996
    Date of Patent: December 9, 1997
    Assignee: Sun Chemical Corporation
    Inventors: Celin M. Savariar-Hauck, Harald Baumann, Hans-Joachim Timpe, Udo Dwars