Patents by Inventor Cevdet Ismail Noyan

Cevdet Ismail Noyan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Ultra thin, single phase, diffusion barrier for metal conductors
    Patent number: 7172968
    Abstract: The present invention is directed to an alpha-W layer which is employed in interconnect structures such as trench capacitors or damascene wiring levels as a diffusion barrier layer. The alpha-W layer is a single phased material that is formed by a low temperature/pressure chemical vapor deposition process using tungsten hexacarbonyl, W(CO)6, as the source material.
    Type: Grant
    Filed: July 3, 2002
    Date of Patent: February 6, 2007
    Assignee: International Business Machines Corporation
    Inventors: Stephan Alan Cohen, Fenton Read McFeely, Cevdet Ismail Noyan, Kenneth Parker Rodbell, Robert Rosenberg, John Jacob Yurkas
  • Ultra thin, single phase, diffusion barrier for metal conductors
    Publication number: 20020175418
    Abstract: The present invention is directed to an alpha-W layer which is employed in interconnect structures such as trench capacitors or damascene wiring levels as a diffusion barrier layer. The alpha-W layer is a single phased material that is formed by a low temperature/pressure chemical vapor deposition process using tungsten hexacarbonyl, W(CO)6, as the source material.
    Type: Application
    Filed: July 3, 2002
    Publication date: November 28, 2002
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Stephan Alan Cohen, Fenton Read McFeely, Cevdet Ismail Noyan, Kenneth Parker Rodbell, Robert Rosenberg, John Jacob Yurkas