Abstract: A touch screen controller for cancelling an offset capacitance of a capacitive touch screen panel includes a code generator configured to generate a time-invariant digital code and a time-variant digital code during an offset cancellation time. A switched-capacitor array converts the time-invariant digital code and the time-variant digital code into an amount of electric charges corresponding to the offset capacitance.

Abstract: A touch screen controller controlling a capacitive touch screen includes a first comparator that compares a reference signal with a sensing signal, and generates a first output signal. The capacitive touch screen includes capacitive touch sensors connected to a sensing line and a drive line, and that sense a touch event. The sensing signal is output from the sensing line. The touch screen controller further includes a filter that generates a second output signal by integrating the first output signal in each sensing cycle of the filter, an analog-to-digital converter that converts the second output signal to a digital signal, and a controller that determines at least one of whether a noise is generated and whether the touch event is generated based on a reference digital signal and the digital signal, and that adjusts the number of the sensing cycles of the filter based on a result of the determination.

Abstract: A touch screen controller is provided. The touch screen controller includes: an offset cancellation circuit configured to cancel offset capacitance of a touch screen panel including a first channel and a second channel crossing the first channel, the offset cancellation circuit connected to the touch screen panel through a sensing node; a charge amplifier configured to generate a sensing voltage from a sensing signal output from the touch screen panel, the charge amplifier including an amplifier having a first input terminal connected to the sensing node and a second input terminal to which an input voltage is applied; and a channel driver configured to provide a driving voltage, which is equal to or greater than the input voltage, to the second channel in a self capacitance sensing mode for the first channel.

Abstract: A stage transferring device invention includes: a transferring stage upon which an object is mounted and which transfers the object in an x-y plane; and a stage position measuring device. The stage position measuring device includes a one-dimensional scale on the transferring stage; a one-dimensional scale reading head which is configured to overlap the one-dimensional scale, irradiate a measuring beam to the overlapped one-dimensional scale and measure a 1D y-axis coordinate of the transferring stage; a two-dimensional encoder on the transferring stage; and a two-dimensional encoder reading head which is configured to overlap the two-dimensional encoder, irradiate a measuring beam to the overlapped two-dimensional encoder and measure a 2D x-axis coordinate and a 2D y-axis coordinate of the transferring stage.

Abstract: Provided is a digital exposure device. The digital exposure device includes a stage mounted with a substrate on which a pattern is formed, a first light source, a first head, and a digital micro-mirror device control unit. The stage is configured to move in a scan direction. The first light source is configured to provide a first light. The first head is spaced apart from the stage in a first direction and is configured to receive the first light, to generate at least one spot beam by modulating the first light, and to project the at least one spot beam onto the substrate. The digital micro-mirror device control unit is configured to control an energy of the at least one spot beam generated from the first head to be inversely proportional to a size of the at least spot beam generated from the first head.

Abstract: A semiconductor device includes a touch screen panel including a plurality of hover sensors configured to perform self-capacitance sensing. The semiconductor memory device includes a driver configured to provide a plurality of driving signals to the touch screen panel. The semiconductor memory device includes an encoder configured to encode the plurality of driving signals from the driver and provide the encoded plurality of driving signals to the touch screen panel. The semiconductor memory device includes a sensor configured to sense a hover input from the touch screen panel based on the encoded plurality of driving signals.

Abstract: The present invention relates to a display device and a method of manufacturing the display device. The display device according to an exemplary embodiment of the present invention includes a substrate. A pixel electrode is formed on the substrate. A roof layer is formed on the pixel electrode. A first micro-cavity and a second micro-cavity are disposed between the pixel electrode and the roof layer. A liquid crystal fills the first and second micro-cavities. The first and second micro-cavities are connected to each other by a path. The path penetrates the roof layer.

Abstract: A light exposure device is provided. The light exposure device includes a light source, a light modulation part, and a projection optical part. The light modulation part modulates the light based on a predetermined exposure pattern. The projection optical part projects the light from the light modulation part onto a substrate. The projection optical part includes a first optical part, a hole arrangement part, and a second optical part. The first optical part receives the light from the light modulation part. The first optical part includes a plurality of first lenses. The hole arrangement part emits the light from the first optical part. The second optical part emits the light from the hole arrangement part onto the substrate. The second optical part includes a plurality of second lenses. At least one of the first lenses and the second lenses is a transreflective lens.

Abstract: The present invention relates to a method of fabricating a display device using a maskless exposure apparatus, and the display device, and more particularly, to a method of fabricating a display device by using a maskless exposure apparatus, which is capable of preventing a stain from being viewed, and the display device.

Abstract: A digital exposure apparatus includes a displaceable stage, a light source part, a digital micro mirror part and a micro lens part. A substrate is disposed on the stage. The light source part generates a first light. The digital micro mirror part is disposed over the stage. The digital micro mirror part includes a plurality of digital micro mirrors. The digital micro mirror converts the first light into one or more second light beams. The micro lens part is disposed between the stage and the digital micro mirror part and includes a plurality of micro lenses. The micro lenses convert the one or more second light beams into one or more third light beams which are irradiated upon the substrate. The third light has an oval cross sectional shape.

Abstract: A photoresist composition, a method of forming a pattern using the photoresist composition, and a method of manufacturing a display substrate are disclosed. A photoresist composition includes an alkali-soluble resin, a quinone diazide-based compound, a multivalent phenol-based compound, and a solvent. Therefore, photosensitivity for light having a wavelength in a range of about 392 nm to about 417 nm may be improved, and reliability of forming a photo pattern and a thin film pattern using the photoresist composition may be improved.

Abstract: An exposure apparatus includes a light source, an illuminating member, a projecting member, a stage, an inspecting member, and an information processing member. The light source is configured to provide a light in accordance with a pulse event generation (PEG) representing a period of light radiation. The illuminating member is configured to change the light into point lights. The projecting member is configured to project the point lights according to a photoresist shape extending in various directions. The point lights are projected on the stage. The inspecting member is configured to inspect a photoresist pattern formed by the projected point lights. The information processing member is configured to analyze different photoresist patterns corresponding to different PEGs to select one PEG from the different PEGs. The one PEG being associated with a minimum error in the various directions.

Abstract: A digital exposure device includes: a stage having a substrate seated thereon where a pattern is to be formed and moving in a scan direction; a data modification unit receiving design data and generating modified data by extending the design data; and a digital exposure unit receiving the design data and projecting a light controlled according to the design data on the substrate, wherein the modified data includes intermedial data corresponding to the size difference between an image of the design data and an image of the modified data and some of unit data forming the intermedial data are data obtained when unit data of the design data are shifted in any expansion direction.

Abstract: Provided is a digital exposure device. The digital exposure device includes a stage mounted with a substrate on which a pattern is formed, a first light source, a first head, and a digital micro-mirror device control unit. The stage is configured to move in a scan direction. The first light source is configured to provide a first light. The first head is spaced apart from the stage in a first direction and is configured to receive the first light, to generate at least one spot beam by modulating the first light, and to project the at least one spot beam onto the substrate. The digital micro-mirror device control unit is configured to control an energy of the at least one spot beam generated from the first head to be inversely proportional to a size of the at least spot beam generated from the first head.

Abstract: An exposure system includes an exposure apparatus, a mask, a test pattern portion and a uniformity measuring part. The exposure apparatus includes a first module and a second module. The first and second modules each emit light and are overlapped in an overlapping area. The mask includes a plurality of transmission portions which are spaced apart from each other. Each of the transmission portions has a width less than a width of the overlapping area. The test pattern portion includes a plurality of test patterns which are patterned by using the light transmitted through the transmission portions of the mask. The uniformity measuring part measures a uniformity of the test patterns.

Abstract: A method of forming a photosensitive pattern on a substrate with a photosensitive layer disposed thereon may include moving at least one of the substrate and a set of micro-mirrors in a first direction, the set of micro-mirrors being disposed above the substrate and being arranged as an array, the array having a first edge extending in a second direction, the second direction being at an acute angle with respect to the first direction. The method may also include selectively turning on one or more micro-mirrors of the set of micro-mirrors according to a position of the set of micro-mirrors relative to the photosensitive layer, thereby irradiating one or more spot beams on the photosensitive layer. The photosensitive layer exposed by the spot beams is developed to form a photosensitive pattern having an edge portion extending in a third direction crossing the first and second directions.

Abstract: A method for manufacturing a photosensitive film pattern includes: forming a thin film on a substrate; forming a photosensitive film on the thin film; arranging an exposure apparatus including a photo-modulation element on the photosensitive film; exposing the photosensitive film using the exposure apparatus according to an exposure pattern of the photo-modulation element; and developing the exposed photosensitive film to form a photosensitive film pattern. The exposure pattern includes a main pattern of a quadrangular shape and a at least one assistance pattern positioned at a corner of the main pattern. The photosensitive film pattern has a quadrangular shape with a long edge and a short edge, and a corner with a curved surface having a curvature radius of 20% to 40% of a length of the short edge.

Abstract: A thin film transistor substrate is provided. The thin film transistor substrate includes a display area including a plurality of pixels, wherein the pixels are connected to gate lines and data lines, a gate driver connected to the gate lines, a plurality of data pads connected to the data lines, a plurality of dummy pattern parts formed of a same layer as the gate lines, and a non-display area in which the gate driver, data pads, and dummy pattern parts are disposed, and the dummy pattern parts are disposed in an area within the non-display area where the gate driver is not disposed, and one of the dummy pattern parts is disposed overlapping with the data pads.

Abstract: A stage transferring device invention includes: a transferring stage upon which an object is mounted and which transfers the object in an x-y plane; and a stage position measuring device. The stage position measuring device includes a one-dimensional scale on the transferring stage; a one-dimensional scale reading head which is configured to overlap the one-dimensional scale, irradiate a measuring beam to the overlapped one-dimensional scale and measure a 1D y-axis coordinate of the transferring stage; a two-dimensional encoder on the transferring stage; and a two-dimensional encoder reading head which is configured to overlap the two-dimensional encoder, irradiate a measuring beam to the overlapped two-dimensional encoder and measure a 2D x-axis coordinate and a 2D y-axis coordinate of the transferring stage.

Abstract: The present invention relates to a display device and a method of manufacturing the display device. The display device according to an exemplary embodiment of the present invention includes a substrate. A pixel electrode is formed on the substrate. A roof layer is formed on the pixel electrode. A first micro-cavity and a second micro-cavity are disposed between the pixel electrode and the roof layer. A liquid crystal fills the first and second micro-cavities. The first and second micro-cavities are connected to each other by a path. The path penetrates the roof layer.