Patents by Inventor Cha Koh

Cha Koh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for forming a fine pattern using a top-coating composition for a photoresist and product formed by same
    Publication number: 20050069816
    Abstract: The present invention provides a process for using an amine contamination-protecting top-coating composition. Preferably, the amine contamination-protecting top-coating composition of the present invention comprises an amine contamination-protecting compound. Useful amine contamination-protecting compounds include amine derivatives; amino acid derivatives; amide derivatives; urethane derivatives; urea derivatives; salts thereof; and mixtures thereof. The amine contamination-protecting top-coating composition of the present invention reduces or eliminates problems such as T-topping due to a post exposure delay effect and/or difficulties in forming a fine pattern below 100 nm due to acid diffusion associated with conventional lithography processes involving a photoresist polymer containing an alicyclic main chain using a light source, such as KrF (248 nm), ArF (193 nm), F2 (157 nm), E-beam, ion beam and extremely ultraviolet (EUV).
    Type: Application
    Filed: November 19, 2004
    Publication date: March 31, 2005
    Applicant: Hynix Semiconductor Inc.
    Inventors: Jae Chang Jung, Keun Kong, Hyeong Kim, Jin Kim, Cha Koh, Sung Hong, Geun Lee, Min Jung, Ki Baik