Patents by Inventor Cha-won KO

Cha-won KO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of forming semiconductor device using metal-containing hardmask to pattern photoresist having protected polymer
    Patent number: 10319590
    Abstract: A method of forming a semiconductor device includes forming an etching layer on a substrate, forming a photoresist layer on the etching layer, forming an exposed area configured to define an unexposed area in the photoresist layer, forming a hardmask layer on the exposed area using a selective deposition process, partially removing the photoresist layer using the hardmask layer as an etch mask and forming a photoresist pattern, and etching the etching layer using the photoresist pattern as an etch mask and forming a fine pattern.
    Type: Grant
    Filed: October 17, 2016
    Date of Patent: June 11, 2019
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Cha-won Ko, Hyun-woo Kim, Youn-joung Cho, Jin-kyu Han
  • METHOD OF FORMING SEMICONDUCTOR DEVICE USING SELECTIVE DEPOSITION LAYER AND RELATED DEVICE
    Publication number: 20170186614
    Abstract: A method of forming a semiconductor device includes forming an etching layer on a substrate, forming a photoresist layer on the etching layer, forming an exposed area configured to define an unexposed area in the photoresist layer, forming a hardmask layer on the exposed area using a selective deposition process, partially removing the photoresist layer using the hardmask layer as an etch mask and forming a photoresist pattern, and etching the etching layer using the photoresist pattern as an etch mask and forming a fine pattern.
    Type: Application
    Filed: October 17, 2016
    Publication date: June 29, 2017
    Inventors: Cha-won KO, Hyun-woo KIM, Youn-joung CHO, Jin-kyu HAN