Abstract: A method for inspecting a photomask includes scanning the photomask with an interferometric fringe pattern generated by an interferometer, generating an interferogram associated with the photomask in response to scanning the photomask using the interferometer, and detecting one or more geometric parameters of the photomask using the generated interferogram.

Abstract: A 3D strobo-stereoscopic imaging system includes a rotary drive configured to couple to a sample to be imaged by the system, wherein the rotary drive is configured to rotate the sample about a rotational axis when coupled to the rotary drive, a stroboscopic illuminator, a stroboscopic control module coupled to the rotary drive and the stroboscopic illuminator, wherein the stroboscopic control module is configured to repeatedly activate the stroboscopic illuminator at a frequency that is based on a rotational speed of the sample about the rotational axis, a stereoscopic imaging unit including a pair of laterally spaced cameras orientable in the direction of the sample, and an image reconstruction module coupled to the stereoscopic imaging unit and configured to reconstruct a 3D image of the sample from images produced by the pair of cameras of the stereoscopic imaging unit.

Abstract: A nanoscale positioning system for positioning a positionable component includes a motion platform including a first end, a second end, a shuttle positioned between the first end and the second end and configured to support the positionable component, a flexure member, and a fluid passage extending through the flexure member from the first end to the second end of the motion platform, and a pressure controller coupled to the motion platform and fluidically connected to the fluid passage, wherein the pressure controller is configured to selectably provide a fluid pressure in the fluid passage to flex the flexure member whereby the shuttle is displaced along a motion axis of the motion platform.

Abstract: Methods are provided for determining the position of a substrate. The edge diffraction model suitable for the proposed measurement apparatus was mathematically derived, and the effect of the parameters associated with the edge diffraction was investigated. In addition, the fundamental limits are discussed about the linearity and resolution of the sensor by estimating the effects of edge roughness and sharpness of the knife edge on the knife edge diffraction of an incident wave based on Kirchhoff approximation.

Abstract: Methods are provided for determining the position of a substrate. The edge diffraction model suitable for the proposed measurement apparatus was mathematically derived, and the effect of the parameters associated with the edge diffraction was investigated. In addition, the fundamental limits are discussed about the linearity and resolution of the sensor by estimating the effects of edge roughness and sharpness of the knife edge on the knife edge diffraction of an incident wave based on Kirchhoff approximation.

Abstract: Methods for forming a piezoelectric device are provided. The method can comprise: electrically poling and printing the piezoelectric device from a polymeric filament simultaneously. The polymeric filament can comprise a polyvinylidene fluoride polymer (e.g., a ? phase polyvinylidene fluoride polymer, such as formed by simultaneously stretching and electric poling an electrically inactive ? phase polyvinylidene fluoride polymer).

Abstract: Measurement of motion errors of a linear stage is performed to enable accurate measurement of motion errors in linear directions and a rotational direction in the linear stage using a diffraction grating. A first beam splitter splits a laser beam emitted from a light emitting unit. A first measurement unit measures a unidirectional linear motion error of the linear stage using one laser beam component split by the first beam splitter and a second measurement unit measures an angular motion error and another unidirectional linear motion of the linear stage error using a diffracted beam component obtained by diffracting another laser beam component split by the first beam splitter through the diffraction grating. A third measurement unit circularly polarizes the beam component diffracted through the diffraction grating to measure a third unidirectional linear motion error of the linear stage.

Abstract: Measurement of motion errors of a linear stage is performed to enable accurate measurement of motion errors in linear directions and a rotational direction in the linear stage using a diffraction grating. A first beam splitter splits a laser beam emitted from a light emitting unit. A first measurement unit measures a unidirectional linear motion error of the linear stage using one laser beam component split by the first beam splitter and a second measurement unit measures an angular motion error and another unidirectional linear motion of the linear stage error using a diffracted beam component obtained by diffracting another laser beam component split by the first beam splitter through the diffraction grating. A third measurement unit circularly polarizes the beam component diffracted through the diffraction grating to measure a third unidirectional linear motion error of the linear stage.

Abstract: A light-condensing device and a method of fabricating the same are provided. The light-condensing device includes a central block, a pair of vertical diffraction grating blocks respectively located left and right of the central block, and a pair of horizontal diffraction grating blocks respectively located above and below the central block. The vertical diffraction grating blocks include parallel vertical diffraction gratings in the form of lines extending in the direction of a vertical axis, and the horizontal diffraction grating blocks include parallel horizontal diffraction gratings in the form of lines extending in the direction of a horizontal axis.

Abstract: A light-condensing device and a method of fabricating the same are provided. The light-condensing device includes a central block, a pair of vertical diffraction grating blocks respectively located left and right of the central block, and a pair of horizontal diffraction grating blocks respectively located above and below the central block. The vertical diffraction grating blocks include parallel vertical diffraction gratings in the form of lines extending in the direction of a vertical axis, and the horizontal diffraction grating blocks include parallel horizontal diffraction gratings in the form of lines extending in the direction of a horizontal axis.