Patents by Inventor Chad CHANG

Chad CHANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11401441
    Abstract: Provided are Chemical Mechanical Planarization (CMP) formulations that offer high and tunable Cu removal rates and low copper dishing for the broad or advanced node copper or Through Silica Via (TSV). The CMP compositions provide high selectivity of Cu film vs. other barrier layers, such as Ta, TaN, Ti, and TiN, and dielectric films, such as TEOS, low-k, and ultra low-k films. The CMP polishing formulations comprise solvent, abrasive, at least three chelators selected from the group consisting of amino acids, amino acid derivatives, organic amine, and combinations therefor; wherein at least one chelator is an amino acid or an amino acid derivative. Additionally, organic quaternary ammonium salt, corrosion inhibitor, oxidizer, pH adjustor and biocide are used in the formulations.
    Type: Grant
    Filed: August 13, 2018
    Date of Patent: August 2, 2022
    Assignee: VERSUM MATERIALS US, LLC
    Inventors: Xiaobo Shi, Laura M. Matz, Chris Keh-Yeuan Li, Ming-Shih Tsai, Pao-Chia Pan, Chad Chang-Tse Hsieh, Rung-Je Yang, Blake J. Lew, Mark Leonard O'Neill, Agnes Derecskei
  • Publication number: 20190055430
    Abstract: Provided are Chemical Mechanical Planarization (CMP) formulations that offer high and tunable Cu removal rates and low copper dishing for the broad or advanced node copper or Through Silica Via (TSV). The CMP compositions provide high selectivity of Cu film vs. other barrier layers, such as Ta, TaN, Ti, and TiN, and dielectric films, such as TEOS, low-k, and ultra low-k films. The CMP polishing formulations comprise solvent, abrasive, at least three chelators selected from the group consisting of amino acids, amino acid derivatives, organic amine, and combinations therefor; wherein at least one chelator is an amino acid or an amino acid derivative. Additionally, organic quaternary ammonium salt, corrosion inhibitor, oxidizer, pH adjustor and biocide are used in the formulations.
    Type: Application
    Filed: August 13, 2018
    Publication date: February 21, 2019
    Applicant: Versum Materials US, LLC
    Inventors: Xiaobo Shi, Laura M. Matz, Chris Keh-Yeuan Li, Ming-Shih Tsai, Pao-Chia Pan, Chad Chang-Tse Hsieh, Rung-Je Yang, Blake J. Lew, Mark Leonard O'Neill, Agnes Derecskei
  • Publication number: 20180235722
    Abstract: A cordless wireless and mobile display system having an integrated system for delivering uninterrupted power to a display is described. The cordless wireless and mobile display includes wireless capabilities that allows it to receive and transmit information from associated medical devices and to send data to other designated devices. A battery assembly includes a primary and secondary battery that supplies uninterrupted power to a display. Sensors periodically sample the power output from the battery in current use to ensure that enough power is available to the display. When sensors detect power output levels have fallen below a preset value, indicators alert users that the system is switching to a backup power supply and that the primary battery supply needs recharging.
    Type: Application
    Filed: March 8, 2016
    Publication date: August 23, 2018
    Inventors: Amir BAGHDADI, Chad CHANG, Lam HUYNH, Daniel ORNELAS, Jonah POST, Rainer SCHOLL, Darko SPOLJARIC