Abstract: A chemical vapor deposition reactor that increases the yield of polysilicon in a polysilicon manufacturing process is presented in this disclosure. A chemical vapor deposition reactor may include a heat transfer jacket that protrudes at an upper end as much as or more than the top end of a filament to reflect radiant heat back to a filament or polysilicon rod. The heat transfer jacket may be used to control the temperature difference on the filament or polysilicon to prevent cracks in the polysilicon to increase the yield of the polysilicon in the polysilicon manufacturing process.

Abstract: A method is provided for stabilizing filaments in a chemical vapor deposition (CVD) reactor. The method includes providing the pair of filaments, and connecting the pair of filaments with at least one stabilizer. The stabilizer may include an electronically insulating material.

Abstract: In various embodiments, systems, methods, and apparatus are provided for stabilizing filaments in a chemical vapor deposition (CVD) reactor system. A system includes a base plate having a plurality of electrical connections, a pair of filaments extending from the base plate, and a stabilizer connecting the pair of filaments. Each filament is in electrical contact with, and defines a conductive path between, the two electrical connections. A method of stabilizing the filaments includes providing the pair of filaments, and connecting the pair of filaments with at least one stabilizer. The stabilizer may include an electrically insulating material.

Abstract: In various embodiments, systems, methods, and apparatus are provided for stabilizing filaments in a chemical vapor deposition (CVD) reactor system. A system includes a base plate having a plurality of electrical connections, a pair of filaments extending from the base plate, and a stabilizer connecting the pair of filaments. Each filament is in electrical contact with, and defines a conductive path between, the two electrical connections. A method of stabilizing the filaments includes providing the pair of filaments, and connecting the pair of filaments with at least one stabilizer. The stabilizer may include an electrically insulating material.

Abstract: In various embodiments, systems, methods, and apparatus are provided for stabilizing filaments in a chemical vapor deposition (CVD) reactor system. A system includes a base plate having a plurality of electrical connections, a pair of filaments extending from the base plate, and a stabilizer connecting the pair of filaments. Each filament is in electrical contact with, and defines a conductive path between, the two electrical connections. A method of stabilizing the filaments includes providing the pair of filaments, and connecting the pair of filaments with at least one stabilizer. The stabilizer may include an electrically insulating material.

Abstract: The invention can provide or facilitate energy recovery operations during semiconductor processing operations by utilizing a bell jar having a radiation shield thereon that is comprised of a mediating layer comprising nickel disposed on an interior surface of the bell jar, and a reflective layer which can comprise a gold layer that is disposed on the mediating layer. The reflective layer has an emissivity of less than 5% and, more preferably, the reflective layer has an emissivity of less than about 1%. Heat from the reaction chamber can be used to reduce the heating load of one or more other unit operations.

Abstract: A reaction chamber system, and related devices and methods for use in the system, are provided in which reduced power consumption can be achieved by providing a thin layer of gold on one or more components inside a reaction chamber. The reaction chamber system can be used for chemical vapor deposition. The gold coating should be maintained to a thickness of at least about 0.1 microns, and more preferably about 0.5 to 3.0 microns, to provide a suitable emissivity inside the reaction chamber, and thus reduce heat losses.