Abstract: Methods and systems for sharing information related to operational metrics of a plurality of equipment used in manufacturing of semiconductor wafer includes interfacing a server with the equipment to allow the server to receive a plurality of parameters including operational metrics associated with operation of each of the plurality of equipment. The plurality of parameters are processed to identify event-related data, message-related data and to generate human-readable interpretation for the identified event-related data and the message related data. Users are identified for receiving the operational metrics of each of the plurality of equipment. The event-related data, message-related data and the corresponding human-readable interpretation for the operational metrics associated with each of the equipment are forwarded to a social network service for performing a posting operation to social data streams associated with the identified users.

Abstract: Methods and systems for sharing information related to operational metrics of a plurality of equipment used in manufacturing of semiconductor wafer includes interfacing a server with the equipment to allow the server to receive a plurality of parameters including operational metrics associated with operation of each of the plurality of equipment. The plurality of parameters are processed to identify event-related data, message-related data and to generate human-readable interpretation for the identified event-related data and the message related data. Users are identified for receiving the operational metrics of each of the plurality of equipment. The event-related data, message-related data and the corresponding human-readable interpretation for the operational metrics associated with each of the equipment are forwarded to a social network service for performing a posting operation to social data streams associated with the identified users.

Abstract: An architecture for creating a plasma-processing-related application is provided. The architecture includes a foundation layer having a plurality of framework components, wherein the framework components including at least one of security component, data management component and user interface (UI) component. The architecture also includes an analysis view layer having a set of views, wherein the set of views are generated utilizing components from the foundation layer. The architecture further includes an analysis module layer having a plurality of analysis modules, wherein each analysis module of the plurality of analysis modules is assembled from one or more view of the set of views. The architecture moreover includes an application layer having a plurality of applications, wherein each application of the plurality of applications is assembled from one or more analysis module.

Abstract: An architecture for creating a plasma-processing-related application is provided. The architecture includes a foundation layer having a plurality of framework components, wherein the framework components including at least one of security component, data management component and user interface (UI) component. The architecture also includes an analysis view layer having a set of views, wherein the set of views are generated utilizing components from the foundation layer. The architecture further includes an analysis module layer having a plurality of analysis modules, wherein each analysis module of the plurality of analysis modules is assembled from one or more view of the set of views. The architecture moreover includes an application layer having a plurality of applications, wherein each application of the plurality of applications is assembled from one or more analysis module.

Abstract: A plasma-processing tool for processing a substrate using at least a first process recipe and a second process recipe is provided. The plasma-processing tool includes transducers configured to collect process data streams, each process data stream pertaining to a process parameter being monitored during recipe execution. The tool also includes a logic circuitry configured for receiving a set of meta-data wherein each meta-data includes identification data about the substrate and the process recipe being executed. The logic circuitry is also configured for receiving a set of process data streams, each of which being associated with a specific process recipe. The logic circuitry further includes storing the meta-data and the process data streams associated with the first process recipe as a first file and the meta-data and the process data streams associated with the second process recipe as a second file.

Abstract: An arrangement for performing at least one of collecting and analyzing data from a tool cluster configured to process a set of substrates is provided. The arrangement includes a plurality of tools from which at least one tool of the plurality of tools has a chamber for processing at least one of the set of substrates. The arrangement also includes a plurality of secondary servers configured to collect sensor data from the plurality of tools. The arrangement further includes a primary server communicably coupled with the plurality of secondary servers and configured to execute a database management system. The sensor data is indexed using a plurality of indexing applications on the plurality of secondary servers prior to being forwarded to the primary server for use by the database management system. Indexing includes associating a sensor data item with an identity of a server where the sensor data item is stored.

Abstract: A plasma-processing tool for processing a substrate using at least a first process recipe and a second process recipe is provided. The plasma-processing tool includes transducers configured to collect process data streams, each process data stream pertaining to a process parameter being monitored during recipe execution. The tool also includes a logic circuitry configured for receiving a set of meta-data wherein each meta-data includes identification data about the substrate and the process recipe being executed. The logic circuitry is also configured for receiving a set of process data streams, each of which being associated with a specific process recipe. The logic circuitry further includes storing the meta-data and the process data streams associated with the first process recipe as a first file and the meta-data and the process data streams associated with the second process recipe as a second file.

Abstract: A computer-implemented method for managing substrate processing data. Substrate process data is acquired while a substrate is processed in a plasma-processing chamber of a cluster tool. The method includes receiving meta-data that identifies at least one of an identification of the substrate and a process. The method further includes receiving from transducers process data streams, each of the process data streams pertaining to a process parameter being monitored. Individual data items in each of the process data streams are being collected in accordance to one of a first methodology and a second methodology. The first methodology represents data collection that is periodic in time. The second methodology represents data collection that happens when predefined events occur. The method also includes storing individual data items associated with process data streams in a single file. The single file stores only data pertaining to a single recipe used to process the substrate.

Abstract: An arrangement for performing at least one of collecting and analyzing data from a tool cluster configured to process a set of substrates is provided. The arrangement includes a plurality of tools from which at least one tool of the plurality of tools has a chamber for processing at least one of the set of substrates. The arrangement also includes a plurality of secondary servers configured to collect sensor data from the plurality of tools. The arrangement further includes a primary server communicably coupled with the plurality of secondary servers and configured to execute a database management system. The sensor data is indexed using a plurality of indexing applications on the plurality of secondary servers prior to being forwarded to the primary server for use by the database management system. Indexing includes associating a sensor data item with an identity of a server where the sensor data item is stored.