Patents by Inventor Chae Min LEE

Chae Min LEE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11953366
    Abstract: A fluid level measurement system using a buoyant body includes a guide part installed in a direction perpendicular to the bottom surface of a fluid storage tank, and provided with a space in which a fluid can move therein; a buoyant body inserted into the guide part, and configured to float along the surface of the fluid inside the guide part; and a measurement part coupled to the top end of the guide part, and configured to measure the level of the surface of the fluid inside the fluid storage tank by transmitting a signal toward the buoyant body in the inner space of the guide part and then receiving a signal reflected from the buoyant body.
    Type: Grant
    Filed: July 7, 2022
    Date of Patent: April 9, 2024
    Assignee: HANRA IMS CO., LTD
    Inventors: Suk Joon Ji, Young Gu Kim, Jong Min Chung, Chae Ho Lee, I-Hwan Cheon, Kwang Ik Chun, Dong Sik Jang
  • Publication number: 20240067686
    Abstract: The present invention relates to a novel peptide capable of inhibiting TGF-? signaling and the use thereof. The peptide of the present invention is capable of inhibiting the TGF-?-induced signaling pathway or the expression of TGF-?, and thus can treat or prevent various diseases caused by TGF-? signaling, and furthermore, can effectively inhibit tumorigenesis processes such as TGF-?-signaling induced tumor growth and metastasis.
    Type: Application
    Filed: December 22, 2021
    Publication date: February 29, 2024
    Applicant: Korea Institute of Science and Technology
    Inventors: Mi-Hue JANG, Chae-Min YUK, Ga-Yeon GO, Young-Eun LEE, Sang-Chul SHIN
  • Patent number: 9371430
    Abstract: The present invention relates to a plasma polymerized thin film having high hardness and a low dielectric constant and a manufacturing method thereof, and in particular, relates to a plasma polymerized thin film having high hardness and a low dielectric constant for use in semiconductor devices, which has improved mechanical strength properties such as hardness and elastic modulus while having a low dielectric constant, and a manufacturing method thereof.
    Type: Grant
    Filed: August 13, 2015
    Date of Patent: June 21, 2016
    Assignee: Research & Business Foundation Sungkyunkwan University
    Inventors: Dong Geun Jung, Hoon Bae Kim, Hyo Jin Oh, Chae Min Lee
  • Publication number: 20160024267
    Abstract: The present invention relates to a plasma polymerized thin film having high hardness and a low dielectric constant and a manufacturing method thereof, and in particular, relates to a plasma polymerized thin film having high hardness and a low dielectric constant for use in semiconductor devices, which has improved mechanical strength properties such as hardness and elastic modulus while having a low dielectric constant, and a manufacturing method thereof.
    Type: Application
    Filed: August 13, 2015
    Publication date: January 28, 2016
    Applicant: Research & Business Foundation Sungkyunkwan University
    Inventors: Dong Geun JUNG, Hoon Bae KIM, Hyo Jin OH, Chae Min LEE
  • Patent number: 9196849
    Abstract: This invention relates to a polymer/inorganic multi-layer encapsulation film, and more particularly, to a multi-layer encapsulation film, which includes a plasma polymer thin film layer formed using a cross-shaped precursor having Si—O bonding and an inorganic thin film layer, and ensures flexibility and has improved encapsulation.
    Type: Grant
    Filed: January 8, 2014
    Date of Patent: November 24, 2015
    Assignee: Research & Business Foundation Sungkyunkwan University
    Inventors: Dong Geun Jung, Heeyeop Chae, Min Woo Park, Hoon Bae Kim, Chae Min Lee
  • Publication number: 20150048487
    Abstract: The present invention relates to a plasma polymerized thin film having high hardness and a low dielectric constant and a manufacturing method thereof, and in particular, relates to a plasma polymerized thin film having high hardness and a low dielectric constant for use in semiconductor devices, which has improved mechanical strength properties such as hardness and elastic modulus while having a low dielectric constant, and a manufacturing method thereof.
    Type: Application
    Filed: February 11, 2014
    Publication date: February 19, 2015
    Applicant: RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY
    Inventors: Dong Geun JUNG, Hoon Bae KIM, Hyo Jin OH, Chae Min LEE
  • Publication number: 20140190565
    Abstract: This invention relates to a polymer/inorganic multi-layer encapsulation film, and more particularly, to a multi-layer encapsulation film, which includes a plasma polymer thin film layer formed using a cross-shaped precursor having Si—O bonding and an inorganic thin film layer, and ensures flexibility and has improved encapsulation.
    Type: Application
    Filed: January 8, 2014
    Publication date: July 10, 2014
    Inventors: Dong Geun JUNG, Heeyeop CHAE, Min Woo PARK, Hoon Bae KIM, Chae Min LEE