Patents by Inventor Chaeyeong Lee

Chaeyeong Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240088150
    Abstract: An integrated circuit device includes a pair of fin-type active regions, which extend in a first horizontal direction on a substrate, and a fin isolation insulator between ones of the pair of fin-type active regions to extend in a second horizontal direction that intersects with the first horizontal direction. The fin isolation insulator includes a first nitrogen-rich barrier film having at least one protrusion at a position that is higher than respective top surfaces of each of the pair of fin-type active regions with respect to the substrate, and a second nitrogen-rich barrier film, which is spaced apart from the first nitrogen-rich barrier film and is in a space defined by the first nitrogen-rich barrier film.
    Type: Application
    Filed: April 14, 2023
    Publication date: March 14, 2024
    Inventors: Yeondo Jung, Chul Kim, Kichul Kim, Gwirim Park, Haejun Yu, Chaeyeong Lee, Kyungin Choi
  • Patent number: 11540785
    Abstract: An X-ray image processing method, including obtaining a first X-ray image of an object including a plurality of materials including a first material and a second material; obtaining a first partial image generated by imaging the first material and a second partial image generated by imaging the first material overlapping the second material from the first X-ray image; obtaining first information related to a stereoscopic structure of the first material, based on the first partial image included in the first X-ray image; and obtaining second information about the second material based on the first information and the second partial image.
    Type: Grant
    Filed: January 24, 2020
    Date of Patent: January 3, 2023
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jaemock Yl, Chaeyeong Lee
  • Publication number: 20200237319
    Abstract: An X-ray image processing method, including obtaining a first X-ray image of an object including a plurality of materials including a first material and a second material; obtaining a first partial image generated by imaging the first material and a second partial image generated by imaging the first material overlapping the second material from the first X-ray image; obtaining first information related to a stereoscopic structure of the first material, based on the first partial image included in the first X-ray image; and obtaining second information about the second material based on the first information and the second partial image.
    Type: Application
    Filed: January 24, 2020
    Publication date: July 30, 2020
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jaemock YI, Chaeyeong Lee