Patents by Inventor Chaitanya A. PRASAD
Chaitanya A. PRASAD has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12165907Abstract: Embodiments of the present disclosure generally relate to apparatus for substrate processing, and more specifically to apparatus for rotating substrates and to uses thereof. In an embodiment, an apparatus for rotating a substrate is provided. The apparatus includes a levitatable rotor comprising a plurality of magnets embedded therein, a plurality of gas bearings positioned to levitate the levitatable rotor, and a stator magnetically coupled to the levitatable rotor, the stator for producing a rotating magnetic field. Apparatus for processing a substrate with the apparatus for rotating substrates as well as methods of use are also described.Type: GrantFiled: November 19, 2020Date of Patent: December 10, 2024Assignee: Applied Materials, Inc.Inventors: Giridhar Kamesh, Vinodh Ramachandran, Chaitanya A. Prasad, Mohammad Aamir, Daniel C. Glover
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Publication number: 20240282556Abstract: Implementations of the present disclosure generally relate to an improved substrate support pedestal assembly. In one implementation, the substrate support pedestal assembly includes a shaft. The substrate support pedestal assembly further includes a substrate support pedestal, mechanically coupled to the shaft. The substrate support pedestal comprises substrate support plate coated on a top surface with a ceramic material.Type: ApplicationFiled: May 2, 2024Publication date: August 22, 2024Inventors: Lara HAWRYLCHAK, Chaitanya A. PRASAD
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Patent number: 11990321Abstract: Implementations of the present disclosure generally relate to an improved substrate support pedestal assembly. In one implementation, the substrate support pedestal assembly includes a shaft. The substrate support pedestal assembly further includes a substrate support pedestal, mechanically coupled to the shaft. The substrate support pedestal comprises substrate support plate coated on a top surface with a ceramic material.Type: GrantFiled: November 23, 2022Date of Patent: May 21, 2024Assignee: Applied Materials, Inc.Inventors: Lara Hawrylchak, Chaitanya A. Prasad
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Patent number: 11615944Abstract: Embodiments of the present disclosure generally relate to a process chamber for conformal oxidation of high aspect ratio structures. The process chamber includes a liner assembly located in a first side of a chamber body and two pumping ports located in a substrate support portion adjacent a second side of the chamber body opposite the first side. The liner assembly includes a flow divider to direct fluid flow away from a center of a substrate disposed in a processing region of the process chamber. The liner assembly may be fabricated from quartz minimize interaction with process gases, such as radicals. The liner assembly is designed to reduce flow constriction of the radicals, leading to increased radical concentration and flux. The two pumping ports can be individually controlled to tune the flow of the radicals through the processing region of the process chamber.Type: GrantFiled: March 27, 2018Date of Patent: March 28, 2023Assignee: Applied Materials, Inc.Inventors: Christopher S. Olsen, Eric Kihara Shono, Lara Hawrylchak, Agus Sofian Tjandra, Chaitanya A. Prasad, Sairaju Tallavarjula
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Publication number: 20230086640Abstract: Implementations of the present disclosure generally relate to an improved substrate support pedestal assembly. In one implementation, the substrate support pedestal assembly includes a shaft. The substrate support pedestal assembly further includes a substrate support pedestal, mechanically coupled to the shaft. The substrate support pedestal comprises substrate support plate coated on a top surface with a ceramic material.Type: ApplicationFiled: November 23, 2022Publication date: March 23, 2023Inventors: Lara HAWRYLCHAK, Chaitanya A. PRASAD
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Patent number: 11515130Abstract: Implementations of the present disclosure generally relate to an improved substrate support pedestal assembly. In one implementation, the substrate support pedestal assembly includes a shaft. The substrate support pedestal assembly further includes a substrate support pedestal, mechanically coupled to the shaft. The substrate support pedestal comprises substrate support plate coated on a top surface with a ceramic material.Type: GrantFiled: March 23, 2018Date of Patent: November 29, 2022Assignee: Applied Materials, Inc.Inventors: Lara Hawrylchak, Chaitanya A. Prasad
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Publication number: 20220157643Abstract: Embodiments of the present disclosure generally relate to apparatus for substrate processing, and more specifically to apparatus for rotating substrates and to uses thereof. In an embodiment, an apparatus for rotating a substrate is provided. The apparatus includes a levitatable rotor comprising a plurality of magnets embedded therein, a plurality of gas bearings positioned to levitate the levitatable rotor, and a stator magnetically coupled to the levitatable rotor, the stator for producing a rotating magnetic field. Apparatus for processing a substrate with the apparatus for rotating substrates as well as methods of use are also described.Type: ApplicationFiled: November 19, 2020Publication date: May 19, 2022Inventors: Giridhar KAMESH, Vinodh RAMACHANDRAN, Chaitanya A. PRASAD, Mohammad AAMIR, Daniel C. GLOVER
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Publication number: 20210249284Abstract: A substrate support pedestal connectable to a shaft includes a thermally conductive body, a first fluid channel disposed within an outer zone of the thermally conductive body, and a second fluid channel disposed within an inner zone of the thermally conductive body. The first fluid channel and the second fluid channel are not in fluid communication with each other and are thermally isolated from each other by a thermal barrier within the substrate support channel.Type: ApplicationFiled: February 12, 2020Publication date: August 12, 2021Inventors: Chaitanya A. PRASAD, Daniel C. GLOVER, Naman APURVA
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Patent number: 11004704Abstract: Embodiments described herein generally relate to a processing apparatus having a cover piece that participates in preheating a process gas. In one implementation, the cover piece includes an annulus. The annulus has an inner wall with a first height, an outer wall with a second height, and a top surface. The second height is greater than the first height. The cover piece also includes an inner lip disposed adjacent the inner wall, and a plurality of fins disposed on the top surface of the annulus. The cover piece and the plurality of fins are an opaque quartz material. The cover piece provides for more efficient heating of process gases, is composed of a material capable of withstanding process conditions while providing for more efficient and uniform processing, and has a low CTE reducing particle contamination due to excessive expansion during processing.Type: GrantFiled: March 15, 2018Date of Patent: May 11, 2021Assignee: Applied Materials, Inc.Inventors: Lara Hawrylchak, Chaitanya A. Prasad, Emre Cuvalci
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Patent number: 10626500Abstract: Embodiments described herein relate to a showerhead having a reflector plate with a gas injection insert for radially distributing gas. In one embodiment, a showerhead assembly includes a reflector plate and a gas injection insert. The reflector plate includes at least one gas injection port. The gas injection insert is disposed in the reflector plate, and includes a plurality of apertures. The gas injection insert also includes a baffle plate disposed in the gas injection insert, wherein the baffle plate also includes a plurality of apertures. A first plenum is formed between a first portion of the baffle plate and the reflector plate, and a second plenum is formed between a second portion of the baffle plate and the reflector plate. The plurality of apertures of the gas injection insert and the plurality of apertures of the baffle plate are not axially aligned.Type: GrantFiled: March 4, 2019Date of Patent: April 21, 2020Assignee: APPLIED MATERIALS, INC.Inventors: Kartik Shah, Chaitanya A. Prasad, Kevin Joseph Bautista, Jeffrey Tobin, Umesh M. Kelkar, Lara Hawrylchak
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Publication number: 20190272982Abstract: Implementations of the present disclosure generally relate to an improved substrate support pedestal assembly. In one implementation, the substrate support pedestal assembly includes a shaft. The substrate support pedestal assembly further includes a substrate support pedestal, mechanically coupled to the shaft. The substrate support pedestal comprises substrate support plate coated on a top surface with a ceramic material.Type: ApplicationFiled: March 23, 2018Publication date: September 5, 2019Inventors: Lara HAWRYLCHAK, Chaitanya A. PRASAD
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Publication number: 20190194810Abstract: Embodiments described herein relate to a showerhead having a reflector plate with a gas injection insert for radially distributing gas. In one embodiment, a showerhead assembly includes a reflector plate and a gas injection insert. The reflector plate includes at least one gas injection port. The gas injection insert is disposed in the reflector plate, and includes a plurality of apertures. The gas injection insert also includes a baffle plate disposed in the gas injection insert, wherein the baffle plate also includes a plurality of apertures. A first plenum is formed between a first portion of the baffle plate and the reflector plate, and a second plenum is formed between a second portion of the baffle plate and the reflector plate. The plurality of apertures of the gas injection insert and the plurality of apertures of the baffle plate are not axially aligned.Type: ApplicationFiled: March 4, 2019Publication date: June 27, 2019Inventors: Kartik SHAH, Chaitanya A. PRASAD, Kevin Joseph BAUTISTA, Jeffrey TOBIN, Umesh M. KELKAR, Lara HAWRYLCHAK
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Patent number: 10221483Abstract: Embodiments described herein relate to a showerhead having a reflector plate with a gas injection insert for radially distributing gas. In one embodiment, a showerhead assembly includes a reflector plate and a gas injection insert. The reflector plate includes at least one gas injection port. The gas injection insert is disposed in the reflector plate, and includes a plurality of apertures. The gas injection insert also includes a baffle plate disposed in the gas injection insert, wherein the baffle plate also includes a plurality of apertures. A first plenum is formed between a first portion of the baffle plate and the reflector plate, and a second plenum is formed between a second portion of the baffle plate and the reflector plate. The plurality of apertures of the gas injection insert and the plurality of apertures of the baffle plate are not axially aligned.Type: GrantFiled: April 20, 2015Date of Patent: March 5, 2019Assignee: APPLIED MATERIALS, INC.Inventors: Kartik Shah, Chaitanya A. Prasad, Kevin Joseph Bautista, Jeffrey Tobin, Umesh M. Kelkar, Lara Hawrylchak
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Publication number: 20180347045Abstract: Embodiments of the present disclosure generally relate to a process chamber for conformal oxidation of high aspect ratio structures. The process chamber includes a liner assembly located in a first side of a chamber body and two pumping ports located in a substrate support portion adjacent a second side of the chamber body opposite the first side. The liner assembly includes a flow divider to direct fluid flow away from a center of a substrate disposed in a processing region of the process chamber. The liner assembly may be fabricated from quartz minimize interaction with process gases, such as radicals. The liner assembly is designed to reduce flow constriction of the radicals, leading to increased radical concentration and flux. The two pumping ports can be individually controlled to tune the flow of the radicals through the processing region of the process chamber.Type: ApplicationFiled: March 27, 2018Publication date: December 6, 2018Inventors: Christopher S. OLSEN, Eric Kihara SHONO, Lara HAWRYLCHAK, Agus Sofian TJANDRA, Chaitanya A. PRASAD
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Publication number: 20180269083Abstract: Embodiments described herein generally relate to a processing apparatus having a cover piece that participates in preheating a process gas. In one implementation, the cover piece includes an annulus. The annulus has an inner wall with a first height, an outer wall with a second height, and a top surface. The second height is greater than the first height. The cover piece also includes an inner lip disposed adjacent the inner wall, and a plurality of fins disposed on the top surface of the annulus. The cover piece and the plurality of fins are an opaque quartz material. The cover piece provides for more efficient heating of process gases, is composed of a material capable of withstanding process conditions while providing for more efficient and uniform processing, and has a low CTE reducing particle contamination due to excessive expansion during processing.Type: ApplicationFiled: March 15, 2018Publication date: September 20, 2018Inventors: Lara HAWRYLCHAK, Chaitanya A. PRASAD, Emre CUVALCI
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Publication number: 20180254206Abstract: Implementations described herein generally relate to a processing apparatus having a rotor cover for preheating the process gas. The apparatus includes a chamber body having a side wall and a bottom wall defining an interior processing region. The chamber also includes a substrate support disposed in the interior processing region of the chamber body, a ring support, and a rotor cover. The rotor cover is disposed on a ring support. The rotor cover is an opaque quartz material. The rotor cover advantageously provides for more efficient heating of process gases, is composed of a material capable of withstanding process conditions while providing for more efficient and uniform processing, and has a low CTE reducing particle contamination due to excessive expansion during processing.Type: ApplicationFiled: March 6, 2018Publication date: September 6, 2018Inventors: Lara Hawrylchak, Chaitanya A. Prasad, Emre Cuvalci
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Publication number: 20150329966Abstract: Embodiments described herein relate to a showerhead having a reflector plate with a gas injection insert for radially distributing gas. In one embodiment, a showerhead assembly includes a reflector plate and a gas injection insert. The reflector plate includes at least one gas injection port. The gas injection insert is disposed in the reflector plate, and includes a plurality of apertures. The gas injection insert also includes a baffle plate disposed in the gas injection insert, wherein the baffle plate also includes a plurality of apertures. A first plenum is formed between a first portion of the baffle plate and the reflector plate, and a second plenum is formed between a second portion of the baffle plate and the reflector plate. The plurality of apertures of the gas injection insert and the plurality of apertures of the baffle plate are not axially aligned.Type: ApplicationFiled: April 20, 2015Publication date: November 19, 2015Inventors: Kartik SHAH, Chaitanya A. PRASAD, Kevin Joseph BAUTISTA, Jeffrey TOBIN, Umesh M. KELKAR, Lara HAWRYLCHAK