Patents by Inventor Chaitanya A. PRASAD

Chaitanya A. PRASAD has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12165907
    Abstract: Embodiments of the present disclosure generally relate to apparatus for substrate processing, and more specifically to apparatus for rotating substrates and to uses thereof. In an embodiment, an apparatus for rotating a substrate is provided. The apparatus includes a levitatable rotor comprising a plurality of magnets embedded therein, a plurality of gas bearings positioned to levitate the levitatable rotor, and a stator magnetically coupled to the levitatable rotor, the stator for producing a rotating magnetic field. Apparatus for processing a substrate with the apparatus for rotating substrates as well as methods of use are also described.
    Type: Grant
    Filed: November 19, 2020
    Date of Patent: December 10, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Giridhar Kamesh, Vinodh Ramachandran, Chaitanya A. Prasad, Mohammad Aamir, Daniel C. Glover
  • Publication number: 20240282556
    Abstract: Implementations of the present disclosure generally relate to an improved substrate support pedestal assembly. In one implementation, the substrate support pedestal assembly includes a shaft. The substrate support pedestal assembly further includes a substrate support pedestal, mechanically coupled to the shaft. The substrate support pedestal comprises substrate support plate coated on a top surface with a ceramic material.
    Type: Application
    Filed: May 2, 2024
    Publication date: August 22, 2024
    Inventors: Lara HAWRYLCHAK, Chaitanya A. PRASAD
  • Patent number: 11990321
    Abstract: Implementations of the present disclosure generally relate to an improved substrate support pedestal assembly. In one implementation, the substrate support pedestal assembly includes a shaft. The substrate support pedestal assembly further includes a substrate support pedestal, mechanically coupled to the shaft. The substrate support pedestal comprises substrate support plate coated on a top surface with a ceramic material.
    Type: Grant
    Filed: November 23, 2022
    Date of Patent: May 21, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Lara Hawrylchak, Chaitanya A. Prasad
  • Patent number: 11615944
    Abstract: Embodiments of the present disclosure generally relate to a process chamber for conformal oxidation of high aspect ratio structures. The process chamber includes a liner assembly located in a first side of a chamber body and two pumping ports located in a substrate support portion adjacent a second side of the chamber body opposite the first side. The liner assembly includes a flow divider to direct fluid flow away from a center of a substrate disposed in a processing region of the process chamber. The liner assembly may be fabricated from quartz minimize interaction with process gases, such as radicals. The liner assembly is designed to reduce flow constriction of the radicals, leading to increased radical concentration and flux. The two pumping ports can be individually controlled to tune the flow of the radicals through the processing region of the process chamber.
    Type: Grant
    Filed: March 27, 2018
    Date of Patent: March 28, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Christopher S. Olsen, Eric Kihara Shono, Lara Hawrylchak, Agus Sofian Tjandra, Chaitanya A. Prasad, Sairaju Tallavarjula
  • Publication number: 20230086640
    Abstract: Implementations of the present disclosure generally relate to an improved substrate support pedestal assembly. In one implementation, the substrate support pedestal assembly includes a shaft. The substrate support pedestal assembly further includes a substrate support pedestal, mechanically coupled to the shaft. The substrate support pedestal comprises substrate support plate coated on a top surface with a ceramic material.
    Type: Application
    Filed: November 23, 2022
    Publication date: March 23, 2023
    Inventors: Lara HAWRYLCHAK, Chaitanya A. PRASAD
  • Patent number: 11515130
    Abstract: Implementations of the present disclosure generally relate to an improved substrate support pedestal assembly. In one implementation, the substrate support pedestal assembly includes a shaft. The substrate support pedestal assembly further includes a substrate support pedestal, mechanically coupled to the shaft. The substrate support pedestal comprises substrate support plate coated on a top surface with a ceramic material.
    Type: Grant
    Filed: March 23, 2018
    Date of Patent: November 29, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Lara Hawrylchak, Chaitanya A. Prasad
  • Publication number: 20220157643
    Abstract: Embodiments of the present disclosure generally relate to apparatus for substrate processing, and more specifically to apparatus for rotating substrates and to uses thereof. In an embodiment, an apparatus for rotating a substrate is provided. The apparatus includes a levitatable rotor comprising a plurality of magnets embedded therein, a plurality of gas bearings positioned to levitate the levitatable rotor, and a stator magnetically coupled to the levitatable rotor, the stator for producing a rotating magnetic field. Apparatus for processing a substrate with the apparatus for rotating substrates as well as methods of use are also described.
    Type: Application
    Filed: November 19, 2020
    Publication date: May 19, 2022
    Inventors: Giridhar KAMESH, Vinodh RAMACHANDRAN, Chaitanya A. PRASAD, Mohammad AAMIR, Daniel C. GLOVER
  • Publication number: 20210249284
    Abstract: A substrate support pedestal connectable to a shaft includes a thermally conductive body, a first fluid channel disposed within an outer zone of the thermally conductive body, and a second fluid channel disposed within an inner zone of the thermally conductive body. The first fluid channel and the second fluid channel are not in fluid communication with each other and are thermally isolated from each other by a thermal barrier within the substrate support channel.
    Type: Application
    Filed: February 12, 2020
    Publication date: August 12, 2021
    Inventors: Chaitanya A. PRASAD, Daniel C. GLOVER, Naman APURVA
  • Patent number: 11004704
    Abstract: Embodiments described herein generally relate to a processing apparatus having a cover piece that participates in preheating a process gas. In one implementation, the cover piece includes an annulus. The annulus has an inner wall with a first height, an outer wall with a second height, and a top surface. The second height is greater than the first height. The cover piece also includes an inner lip disposed adjacent the inner wall, and a plurality of fins disposed on the top surface of the annulus. The cover piece and the plurality of fins are an opaque quartz material. The cover piece provides for more efficient heating of process gases, is composed of a material capable of withstanding process conditions while providing for more efficient and uniform processing, and has a low CTE reducing particle contamination due to excessive expansion during processing.
    Type: Grant
    Filed: March 15, 2018
    Date of Patent: May 11, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Lara Hawrylchak, Chaitanya A. Prasad, Emre Cuvalci
  • Patent number: 10626500
    Abstract: Embodiments described herein relate to a showerhead having a reflector plate with a gas injection insert for radially distributing gas. In one embodiment, a showerhead assembly includes a reflector plate and a gas injection insert. The reflector plate includes at least one gas injection port. The gas injection insert is disposed in the reflector plate, and includes a plurality of apertures. The gas injection insert also includes a baffle plate disposed in the gas injection insert, wherein the baffle plate also includes a plurality of apertures. A first plenum is formed between a first portion of the baffle plate and the reflector plate, and a second plenum is formed between a second portion of the baffle plate and the reflector plate. The plurality of apertures of the gas injection insert and the plurality of apertures of the baffle plate are not axially aligned.
    Type: Grant
    Filed: March 4, 2019
    Date of Patent: April 21, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Kartik Shah, Chaitanya A. Prasad, Kevin Joseph Bautista, Jeffrey Tobin, Umesh M. Kelkar, Lara Hawrylchak
  • Publication number: 20190272982
    Abstract: Implementations of the present disclosure generally relate to an improved substrate support pedestal assembly. In one implementation, the substrate support pedestal assembly includes a shaft. The substrate support pedestal assembly further includes a substrate support pedestal, mechanically coupled to the shaft. The substrate support pedestal comprises substrate support plate coated on a top surface with a ceramic material.
    Type: Application
    Filed: March 23, 2018
    Publication date: September 5, 2019
    Inventors: Lara HAWRYLCHAK, Chaitanya A. PRASAD
  • Publication number: 20190194810
    Abstract: Embodiments described herein relate to a showerhead having a reflector plate with a gas injection insert for radially distributing gas. In one embodiment, a showerhead assembly includes a reflector plate and a gas injection insert. The reflector plate includes at least one gas injection port. The gas injection insert is disposed in the reflector plate, and includes a plurality of apertures. The gas injection insert also includes a baffle plate disposed in the gas injection insert, wherein the baffle plate also includes a plurality of apertures. A first plenum is formed between a first portion of the baffle plate and the reflector plate, and a second plenum is formed between a second portion of the baffle plate and the reflector plate. The plurality of apertures of the gas injection insert and the plurality of apertures of the baffle plate are not axially aligned.
    Type: Application
    Filed: March 4, 2019
    Publication date: June 27, 2019
    Inventors: Kartik SHAH, Chaitanya A. PRASAD, Kevin Joseph BAUTISTA, Jeffrey TOBIN, Umesh M. KELKAR, Lara HAWRYLCHAK
  • Patent number: 10221483
    Abstract: Embodiments described herein relate to a showerhead having a reflector plate with a gas injection insert for radially distributing gas. In one embodiment, a showerhead assembly includes a reflector plate and a gas injection insert. The reflector plate includes at least one gas injection port. The gas injection insert is disposed in the reflector plate, and includes a plurality of apertures. The gas injection insert also includes a baffle plate disposed in the gas injection insert, wherein the baffle plate also includes a plurality of apertures. A first plenum is formed between a first portion of the baffle plate and the reflector plate, and a second plenum is formed between a second portion of the baffle plate and the reflector plate. The plurality of apertures of the gas injection insert and the plurality of apertures of the baffle plate are not axially aligned.
    Type: Grant
    Filed: April 20, 2015
    Date of Patent: March 5, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Kartik Shah, Chaitanya A. Prasad, Kevin Joseph Bautista, Jeffrey Tobin, Umesh M. Kelkar, Lara Hawrylchak
  • Publication number: 20180347045
    Abstract: Embodiments of the present disclosure generally relate to a process chamber for conformal oxidation of high aspect ratio structures. The process chamber includes a liner assembly located in a first side of a chamber body and two pumping ports located in a substrate support portion adjacent a second side of the chamber body opposite the first side. The liner assembly includes a flow divider to direct fluid flow away from a center of a substrate disposed in a processing region of the process chamber. The liner assembly may be fabricated from quartz minimize interaction with process gases, such as radicals. The liner assembly is designed to reduce flow constriction of the radicals, leading to increased radical concentration and flux. The two pumping ports can be individually controlled to tune the flow of the radicals through the processing region of the process chamber.
    Type: Application
    Filed: March 27, 2018
    Publication date: December 6, 2018
    Inventors: Christopher S. OLSEN, Eric Kihara SHONO, Lara HAWRYLCHAK, Agus Sofian TJANDRA, Chaitanya A. PRASAD
  • Publication number: 20180269083
    Abstract: Embodiments described herein generally relate to a processing apparatus having a cover piece that participates in preheating a process gas. In one implementation, the cover piece includes an annulus. The annulus has an inner wall with a first height, an outer wall with a second height, and a top surface. The second height is greater than the first height. The cover piece also includes an inner lip disposed adjacent the inner wall, and a plurality of fins disposed on the top surface of the annulus. The cover piece and the plurality of fins are an opaque quartz material. The cover piece provides for more efficient heating of process gases, is composed of a material capable of withstanding process conditions while providing for more efficient and uniform processing, and has a low CTE reducing particle contamination due to excessive expansion during processing.
    Type: Application
    Filed: March 15, 2018
    Publication date: September 20, 2018
    Inventors: Lara HAWRYLCHAK, Chaitanya A. PRASAD, Emre CUVALCI
  • Publication number: 20180254206
    Abstract: Implementations described herein generally relate to a processing apparatus having a rotor cover for preheating the process gas. The apparatus includes a chamber body having a side wall and a bottom wall defining an interior processing region. The chamber also includes a substrate support disposed in the interior processing region of the chamber body, a ring support, and a rotor cover. The rotor cover is disposed on a ring support. The rotor cover is an opaque quartz material. The rotor cover advantageously provides for more efficient heating of process gases, is composed of a material capable of withstanding process conditions while providing for more efficient and uniform processing, and has a low CTE reducing particle contamination due to excessive expansion during processing.
    Type: Application
    Filed: March 6, 2018
    Publication date: September 6, 2018
    Inventors: Lara Hawrylchak, Chaitanya A. Prasad, Emre Cuvalci
  • Publication number: 20150329966
    Abstract: Embodiments described herein relate to a showerhead having a reflector plate with a gas injection insert for radially distributing gas. In one embodiment, a showerhead assembly includes a reflector plate and a gas injection insert. The reflector plate includes at least one gas injection port. The gas injection insert is disposed in the reflector plate, and includes a plurality of apertures. The gas injection insert also includes a baffle plate disposed in the gas injection insert, wherein the baffle plate also includes a plurality of apertures. A first plenum is formed between a first portion of the baffle plate and the reflector plate, and a second plenum is formed between a second portion of the baffle plate and the reflector plate. The plurality of apertures of the gas injection insert and the plurality of apertures of the baffle plate are not axially aligned.
    Type: Application
    Filed: April 20, 2015
    Publication date: November 19, 2015
    Inventors: Kartik SHAH, Chaitanya A. PRASAD, Kevin Joseph BAUTISTA, Jeffrey TOBIN, Umesh M. KELKAR, Lara HAWRYLCHAK