Patents by Inventor Chan-Chan Tsai

Chan-Chan Tsai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Chemically-amplified resist compositions
    Patent number: 6878504
    Abstract: A chemically-amplified resist composition is disclosed, which comprises a polymer of formula (I) below: wherein R1 is H, C1-C4 alkyl, or CF3; Q is C4-C12 cycloalkyl; R2 is H, C1-C4 alkyl, or CF3; R3 is C4-C12 branched or cyclic alkyl; and x+y+z equals to 1. The chemically-amplified resist compositions of the present invention not only can be applied maturely to general lithographic processes, especially to 193 nm lithographic process, but also have excellent photo-sensitivity, and can form a well-resolved pattern and profile.
    Type: Grant
    Filed: May 28, 2003
    Date of Patent: April 12, 2005
    Assignee: Everlight USA, Inc.
    Inventors: Chi-Sheng Chen, Chan-Chan Tsai, Bin Jian, Hsin-Ming Liao
  • Chemically-amplified resist compositions
    Publication number: 20040241569
    Abstract: A chemically-amplified resist composition is disclosed, which comprises a polymer of formula (I) below: 1
    Type: Application
    Filed: May 28, 2003
    Publication date: December 2, 2004
    Applicant: Everlight USA, Inc.
    Inventors: Chi-Sheng Chen, Chan-Chan Tsai, Bin Jian, Hsin-Ming Liao