Patents by Inventor Chan H. Kang

Chan H. Kang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for fabrication of lithography mask
    Patent number: 5455131
    Abstract: This invention relates to a method for fabrication of masks suitable for improving semiconductor wafers in resolution, which comprises processes for depositing a phases shifting layer and an opaque layer on a transparent substrate, defining an opaque area and a transparent area and removing the opaque layer from the transparent area selectively, forming side wall on the sides of the opaque layer, and removing the exposed phase shifting layer selectively using the side walls and the opaque layer as a mask.
    Type: Grant
    Filed: April 25, 1994
    Date of Patent: October 3, 1995
    Assignee: Goldstar Electron Co., Ltd.
    Inventors: Chan H. Kang, Jun S. Lee