Patents by Inventor Chan Jin Jeong

Chan Jin Jeong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190315367
    Abstract: An apparatus for providing a traveling in a vehicle is provided. The apparatus includes a plurality of sensors configured to obtain information about the vehicle and information about an external object, a steering device, an input device configured to receive a lane change command from a driver of the vehicle, and a control circuit configured to be electrically connected with the one or more sensors, the steering device, and the input device. The control circuit is configured to control the vehicle to travel along a deviated path in a driving path of the vehicle based on at least one of the information obtained by the plurality of sensors or an operation of the steering device, to complete a lane change, and to control the vehicle to travel along a deviated path in a target lane of the changed lane in response to the received lane change command.
    Type: Application
    Filed: April 8, 2019
    Publication date: October 17, 2019
    Applicants: HYUNDAI MOTOR COMPANY, KIA MOTORS CORPORATION
    Inventors: Doo Jin UM, Hoi Won KIM, Beom Jun KIM, Dae Young KIM, Chan II PARK, Jin Su JEONG, Dong Eon OH
  • Publication number: 20190315358
    Abstract: An apparatus for controlling drive of a vehicle includes an input device, and a control circuit. The control circuit performs a lane keeping control on a driving lane of the vehicle for a first time duration, when receiving a first input for changing a lane from the driver through the input device, performs a line access control such that the vehicle moves toward a line positioned in a direction of a target lane for the changing of the lane, after completing the lane keeping control for the first time duration, when receiving a second input for changing the lane from the driver through the input device after receiving the first input, and performs a lane entrance control toward the target lane when the line access control is completed within a second time duration.
    Type: Application
    Filed: November 29, 2018
    Publication date: October 17, 2019
    Applicants: HYUNDAI MOTOR COMPANY, KIA MOTORS CORPORATION
    Inventors: Beom Jun KIM, Hoi Won KIM, Doo Jin UM, Dae Young KIM, Chan Il PARK, Jin Su JEONG, Dong Eon OH
  • Publication number: 20190315362
    Abstract: An apparatus for controlling a lane change of a vehicle may include: a processor determining whether a condition of interrupting a lane change procedure occurs, during controlling the lane change. In particular, when the condition of interrupting the lane change procedure is satisfied, the processor determines whether to interrupt the lane change procedure or whether to return the vehicle to an original lane to control the vehicle depending on a result of the determinations. The apparatus further includes a storage to store the result determined by the processor.
    Type: Application
    Filed: November 30, 2018
    Publication date: October 17, 2019
    Applicants: HYUNDAI MOTOR COMPANY, KIA MOTORS CORPORATION
    Inventors: Doo Jin UM, Hoi Won KIM, Beom Jun KIM, Dae Young KIM, Chan Il PARK, Jin Su JEONG, Dong Eon OH
  • Patent number: 10347917
    Abstract: A method for manufacturing a positive active material for an all-solid Lithium-Sulfur battery includes preparing a lithium sulfide solution by dissolving lithium sulfide in anhydrous ethanol. A mixture is prepared by mixing a carbon fiber to the lithium sulfide solution. A lithium sulfide-carbon fiber composite is prepared by drying the mixture of the carbon fiber and the lithium sulfide solution to deposit the lithium sulfide on a surface of the carbon fiber. The lithium sulfide-carbon fiber composite is heated at 400 to 600° C.
    Type: Grant
    Filed: December 11, 2015
    Date of Patent: July 9, 2019
    Assignees: Hyundai Motor Company, Industry-University Cooperation Foundation Hanyang University
    Inventors: Kyoung Jin Jeong, Min Yong Eom, Chan Hwi Park, Dong Wook Shin
  • Patent number: 7951765
    Abstract: The present invention relates to a photoresist stripper composition for removing the photoresist in the manufacturing process of the semiconductor device. More particularly, the photoresist stripper composition comprises 3-20 wt % of hydrazine hydrate or amine compound; 20˜40 wt % of polar solvent; 0.01-3 wt % of corrosion inhibitor selected from the group consisting of imidazoline derivative, sulfide derivative, sulfoxide derivative, aromatic compound or aromatic compound with hydroxyl group; 0.01-5 wt % of monoalcohol compound of C2-C10; and 40-70 wt % of deionized water. The photoresist stripper composition for manufacturing the semiconductor can remove the photoresist film thermoset by hard bake, dry etching, ashing or ion implantation and denatured by the metallic by-product etched from the bottom metallic film in said process at low temperature easily and quickly, and minimize the corrosion of the bottom metallic wiring in the removing process of the photoresist.
    Type: Grant
    Filed: August 5, 2006
    Date of Patent: May 31, 2011
    Assignee: Techno Semichem Co., Ltd.
    Inventors: Hyun Tak Kim, Seong Hwan Park, Jung Hun Lim, Sung Bae Kim, Chan Jin Jeong, Kui Jong Baek
  • Publication number: 20090312216
    Abstract: The present invention relates to a photoresist stripper composition for removing the photoresist in the manufacturing process of the semiconductor device. More particularly, the photoresist stripper composition comprises 3-20 wt % of hydrazine hydrate or amine compound; 20˜40 wt % of polar solvent; 0.01-3 wt % of corrosion inhibitor selected from the group consisting of imidazoline derivative, sulfide derivative, sulfoxide derivative, aromatic compound or aromatic compound with hydroxyl group; 0.01-5 wt % of monoalcohol compound of C2-C10; and 40-70 wt % of deionized water. The photoresist stripper composition for manufacturing the semiconductor can remove the photoresist film thermoset by hard bake, dry etching, ashing or ion implantation and denatured by the metallic by-product etched from the bottom metallic film in said process at low temperature easily and quickly, and minimize the corrosion of the bottom metallic wiring in the removing process of the photoresist.
    Type: Application
    Filed: August 5, 2006
    Publication date: December 17, 2009
    Applicant: TECHNO SEMICHEM CO., LTD.
    Inventors: Hyun Tak Kim, Seong Hwan Park, Jung Hun Lim, Sung Bae Kim, Chan Jin Jeong, Kui Jong Baek, Woong Hahn, Sang Won Lee, Gun-Woong Lee