Abstract: A method of determining an optimal statistical model that can best show the statistical characteristics of given data and an apparatus performing the method are provided. The method acquires target data to be analyzed, where the target data consists of a plurality of independent variables and a dependent variable. Then, the method determines one or more independent variables based on variances in the target data, establishes a first statistical model that shows the relationship between the m independent variables and the dependent variable, and calculates first error of the first statistical model. The method generates a plurality of first statistical models by repeatedly performing the steps of establishing the first statistical model and calculating the first error while changing the value of m, and selects a statistical model with minimum error as an optimal statistical model for the target data.

Abstract: In a laser reflective mask and a fabricating method thereof, reflective layers with different reflectances are sequentially and repeatedly laminated on top of a base substrate which has a reflective layer filling groove having a predetermined depth in a reflection region for a laser beam and then the remaining reflective layer laminated on the other region except for the portion filled in the reflective layer filling groove are removed through a chemical mechanical polishing (CMP) process, or a lift-off process using irradiation with the laser beam or an etchant, so that a reflective layer pattern configured to be filled in the reflective layer filling groove may be formed, thereby capable of not only facilitating a fabricating process of the laser reflective mask but also forming a more precise reflective layer pattern.

Abstract: In a laser reflective mask and a fabricating method thereof, reflective layers with different reflectances are sequentially and repeatedly laminated on top of a base substrate which has a reflective layer filling groove having a predetermined depth in a reflection region for a laser beam and then the remaining reflective layer laminated on the other region except for the portion filled in the reflective layer filling groove are removed through a chemical mechanical polishing (CMP) process, or a lift-off process using irradiation with the laser beam or an etchant, so that a reflective layer pattern configured to be filled in the reflective layer filling groove may be formed, thereby capable of not only facilitating a fabricating process of the laser reflective mask but also forming a more precise reflective layer pattern.

Abstract: A method of fabricating a laser reflective mask by forming a sacrificial layer on top of a base substrate; recessing the sacrificial layer and the base substrate through an etching process of a region prearranged as a reflection region for a laser beam in the base substrate to form a sacrificial layer pattern and a reflective layer filling groove having a predetermined depth; alternately and repeatedly laminating first and second reflective layers having different reflectances on top of the base substrate on which the sacrificial layer pattern and the reflective layer filling groove are formed until the reflective layer filling groove is completely filled; removing the sacrificial layer pattern and the first and second reflective layers laminated on top of the sacrificial layer pattern through a laser lift-off process of irradiating the base substrate with the laser beam from a bottom surface of the base substrate to form a reflective layer pattern configured to be filled in the reflective layer filling groov

Abstract: There are provided a laser reflective mask and a fabricating method thereof, in which reflective layers with different reflectances are sequentially and repeatedly laminated on top of a base substrate which has a reflective layer filling groove having a predetermined depth in a reflection region for a laser beam and then the remaining reflective layer laminated on the other region except for the portion filled in the reflective layer filling groove are removed through a chemical mechanical polishing (CMP) process, or a lift-off process using irradiation with the laser beam or an etchant, so that a reflective layer pattern configured to be filled in the reflective layer filling groove may be formed, thereby capable of not only facilitating a fabricating process of the laser reflective mask but also forming a more precise reflective layer pattern.

Abstract: A white balance correction circuit corrects the signal level of red and blue video signals. The circuit includes both active elements and passive elements which cooperate in generating different bias resistances according to a signal level of an input color signal component. The gain of the respective transistor which ultimately amplifies and outputs each of the color signals advantageously can be varied by varying the bias of the transistor according to the signal level of the input color signal. As a result, the circuit minimizes deviation between the gamma characteristics of the red, green and blue video signals. Accordingly, a constant white balance can be maintained irrespective of the signal level of input video signals. The circuitry thus permits excellent reproduction of the original colors on the screen or tube.