Patents by Inventor Chan Kyoo Ko

Chan Kyoo Ko has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240382895
    Abstract: A facility for treating gas includes a flow channel providing a passage through which a waste gas flows; a thermal decomposition unit for thermally decomposing the waste gas flowing through the flow channel; a quencher for cooling the waste gas passed through the thermal decomposition unit to a predetermined temperature; and a cooling chamber in communication with the flow channel such that the waste gas passed through the quencher is introduced into the cooling chamber, the cooling chamber accommodating a solid material for cooling therewithin.
    Type: Application
    Filed: August 23, 2022
    Publication date: November 21, 2024
    Inventors: Yun Soo Choi, Chan Kyoo Ko, Pil-Hyong Lee, Chun-Loon Cha, Jeong-Keun Lee, Ju Ha Kim, Hyun-A Shin
  • Patent number: 11985754
    Abstract: A gas treating apparatus may include a reaction chamber configured to process a gas supplied from an outside by a plasma, the processed gas containing a nitrogen oxide, and a nitrogen oxide reduction apparatus connected to the reaction chamber. The nitrogen oxide reduction apparatus includes a cooling unit configured to cool the processed gas to a temperature lower than a nitrogen oxide generation temperature.
    Type: Grant
    Filed: December 28, 2017
    Date of Patent: May 14, 2024
    Assignee: Edwards Korea Ltd.
    Inventors: Yun Soo Choi, Chan Kyoo Ko, Simone Magni
  • Patent number: 11430638
    Abstract: A plasma generating apparatus may include a cathode assembly including a cathode, an anode assembly including an anode having therein a plasma generation space, and one or more magnetic force generators configured to generate a magnetic force. The anode assembly has one end portion in which a gas supply path is provided and the other end portion having an opening, the gas supply path configured to supply a plasma generating gas to the plasma generation space. The gas supply path is configured to generate a vortex of the plasma generating gas in the plasma generation space and said one or more magnetic force generators are arranged such that the magnetic force is generated in a direction opposite to a rotational direction of the vortex of the plasma generating gas.
    Type: Grant
    Filed: December 28, 2017
    Date of Patent: August 30, 2022
    Assignee: Edwards Limited
    Inventors: Yun Soo Choi, Chan Kyoo Ko, Simone Magni
  • Publication number: 20210410264
    Abstract: A gas treating apparatus may include a reaction chamber configured to process a gas supplied from an outside by a plasma, the processed gas containing a nitrogen oxide, and a nitrogen oxide reduction apparatus connected to the reaction chamber. The nitrogen oxide reduction apparatus includes a cooling unit configured to cool the processed gas to a temperature lower than a nitrogen oxide generation temperature.
    Type: Application
    Filed: December 28, 2017
    Publication date: December 30, 2021
    Inventors: Yun Soo Choi, Chan Kyoo Ko, Simone Magni
  • Publication number: 20210327687
    Abstract: A plasma generating apparatus may include a cathode assembly including a cathode, an anode assembly including an anode having therein a plasma generation space, and one or more magnetic force generators configured to generate a magnetic force. The anode assembly has one end portion in which a gas supply path is provided and the other end portion having an opening, the gas supply path configured to supply a plasma generating gas to the plasma generation space. The gas supply path is configured to generate a vortex of the plasma generating gas in the plasma generation space and said one or more magnetic force generators are arranged such that the magnetic force is generated in a direction opposite to a rotational direction of the vortex of the plasma generating gas.
    Type: Application
    Filed: December 28, 2017
    Publication date: October 21, 2021
    Inventors: Yun Soo Choi, Chan Kyoo Ko, Simone Magni