Abstract: The present disclosure provides methods and apparatuses for supplying a process gas in a semiconductor manufacturing process. In some embodiments, the method includes heating, using one or more heating devices of the semiconductor manufacturing apparatus, a gas tank and a gas line of the semiconductor manufacturing apparatus. The method further includes filling, through the gas line, the gas tank with a reaction gas. The method further includes changing, using the one or more heating devices, a temperature of the reaction gas in the gas tank. The method further includes supplying the reaction gas from the gas tank to a process chamber of the semiconductor manufacturing apparatus. The changing of the temperature of the reaction gas includes decomposing a portion of the reaction gas into one or more materials different from the reaction gas.

Abstract: An airbag system of an automotive vehicle, wherein an airbag expanded and deployed to position in front of the vehicle occupant in the event of eccentric, left/right collision is added by a control member for being rotated on an inflator by inertia and for restraining flow direction of gas infused into the airbag, thereby cushioning and protecting the occupant effectively against injury-causing impact from eccentric collision, and the inflator is disposed thereon with a hitching bracket so provided to avoid an interference from the control member and having a hitching unit rotatively supporting a central part of an integral tether, both tip ends of which are separably fixed to an inner surface of the airbag.