Patents by Inventor Chan Lo

Chan Lo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11984195
    Abstract: The contributions of different tissues to a DNA mixture are determined using methylation levels at particular genomic sites. Tissue-specific methylation levels of M tissue types can be used to deconvolve mixture methylation levels measured in the DNA mixture, to determine fraction contributions of each of the M tissue types. Various types of genomic sites can be chosen to have particular properties across tissue types and across individuals, so as to provide increased accuracy in determining contributions of the various tissue types. The fractional contributions can be used to detect abnormal contributions of a particular tissue, indicating a disease state for the tissue. A differential in fractional contributions for different sizes of DNA fragments can also be used to identify a diseased state of a particular tissue. A sequence imbalance for a particular chromosomal region can be detected in a particular tissue, e.g., identifying a location of a tumor.
    Type: Grant
    Filed: October 15, 2018
    Date of Patent: May 14, 2024
    Assignee: The Chinese University of Hong Kong
    Inventors: Rossa Wai Kwun Chiu, Kwan Chee Chan, Yuk-Ming Dennis Lo, Peiyong Jiang, Kun Sun
  • Publication number: 20240141333
    Abstract: Particular forward and reverse primers may be used to link distant regions of the same large DNA molecule into a smaller DNA molecule. A reverse primer R1 can have a first portion complementary to an ending sequence of region A and can have a second portion having an overlapping sequence. A forward primer F2 can have a first portion complementary to a starting sequence of region B, where the forward primer includes a complementary overlapping sequence (e.g., the same first portion or a second portion) that is complementary to the overlapping sequence. The first portion of F2 may be the entire primer. The smaller DNA molecules can be used to determine haplotypes of regions. Kits including the particular forward and reverse primers are also described.
    Type: Application
    Filed: June 22, 2023
    Publication date: May 2, 2024
    Inventors: Kwan Chee Chan, Wanxia Gai, Yuk-Ming Dennis Lo
  • Patent number: 11970742
    Abstract: Methods are provided for diagnosing pregnancy-associated disorders, determining allelic ratios, determining maternal or fetal contributions to circulating transcripts, and/or identifying maternal or fetal markers using a sample from a pregnant female subject. Also provided is use of a gene for diagnosing a pregnancy-associated disorder in a pregnant female subject.
    Type: Grant
    Filed: January 23, 2019
    Date of Patent: April 30, 2024
    Assignee: The Chinese University of Hong Kong
    Inventors: Yuk-Ming Dennis Lo, Rossa Wai Kwun Chiu, Kwan Chee Chan, Peiyong Jiang, Bo Yin Tsui
  • Patent number: 11923046
    Abstract: Disclosed herein are methods, systems, and apparatus for detecting microamplifications or microdeletions in the genome of a fetus. In some embodiments, the method comprises receiving sequence tags for each of a plurality of DNA fragments in a biological sample; determining genomic positions for the sequence tags; determining whether the density of DNA in each of a plurality of genomic regions is aberrantly high or low; identifying as a microamplification a set of consecutive genomic regions having aberrantly high density; and identifying as a microdeletion a set of consecutive genomic regions having aberrantly low density. The biological sample may be a blood sample obtained noninvasively from a female subject pregnant with the fetus.
    Type: Grant
    Filed: February 7, 2020
    Date of Patent: March 5, 2024
    Assignee: The Chinese University of Hong Kong
    Inventors: Yuk Ming Dennis Lo, Kwan Chee Chan, Peiyong Jiang, Cheuk Yin Jandy Yu, Rossa Wai Kwun Chiu
  • Patent number: 11832437
    Abstract: The present disclosure provides to a semiconductor memory device. The semiconductor memory device includes a substrate having a cell area and a peripheral area; and a first bit line structure disposed on and protruding from a surface of the cell area. The first bit line structure is sandwiched by a pair of air gaps and a barrier layer is conformally overlaying the air gaps adjacent to the sidewalls of the first bit line structure and the cell area. The first bit line structure has a sidewall and an ascending top portion, and a landing pad is disposed over the ascending top portion and the sidewalls of the first bit line structure. The landing pad has an inclined surface corresponding to the ascending top portion of the first bit line structure.
    Type: Grant
    Filed: December 9, 2021
    Date of Patent: November 28, 2023
    Assignee: NANYA TECHNOLOGY CORPORATION
    Inventors: Hao-Chan Lo, Hsing-Han Wu, Jr-Chiuan Wang, Jen-I Lai, Chun-Heng Wu
  • Patent number: 11749022
    Abstract: A method and a system of deep face recognition for a fisheye image are provided. The method includes determining a category corresponding to an input image, performing an image rectification according to the category corresponding to the input image to generate a restored image, and performing a face recognition on the restored image to determine an identity corresponding to the input image. The category correlates to a radial distance corresponding to the input image.
    Type: Grant
    Filed: April 27, 2021
    Date of Patent: September 5, 2023
    Assignee: NATIONAL TAIWAN UNIVERSITY
    Inventors: Yi-Hsin Li, I-Chan Lo, Hong-Ming Chen
  • Patent number: 11706913
    Abstract: The present disclosure provides to a method for manufacturing a semiconductor memory device. The method includes receiving a substrate including a cell area and a peripheral area; forming a first bit line structure on a surface of the cell area; depositing a landing pad above the barrier layer and on the top surface of the first bit line structure; removing a top corner of the landing pad to form an inclined surface connecting a top surface of the landing pad to a sidewall of the landing pad; etching the nitride layer of the first bit line structure and the spacer nitride layer from the top opening so as to form a concavity; etching the spacer oxide layer from the concavity to form an air gap; and depositing a silicon nitride layer to seal the air gap.
    Type: Grant
    Filed: December 9, 2021
    Date of Patent: July 18, 2023
    Assignee: NANYA TECHNOLOGY CORPORATION
    Inventors: Hao-Chan Lo, Hsing-Han Wu, Jr-Chiuan Wang, Jen-I Lai, Chun-Heng Wu
  • Publication number: 20230189500
    Abstract: The present disclosure provides to a semiconductor memory device. The semiconductor memory device includes a substrate having a cell area and a peripheral area; and a first bit line structure disposed on and protruding from a surface of the cell area. The first bit line structure is sandwiched by a pair of air gaps and a barrier layer is conformally overlaying the air gaps adjacent to the sidewalls of the first bit line structure and the cell area. The first bit line structure has a sidewall and an ascending top portion, and a landing pad is disposed over the ascending top portion and the sidewalls of the first bit line structure. The landing pad has an inclined surface corresponding to the ascending top portion of the first bit line structure.
    Type: Application
    Filed: December 9, 2021
    Publication date: June 15, 2023
    Inventors: HAO-CHAN LO, HSING-HAN WU, JR-CHIUAN WANG, JEN-I LAI, CHUN-HENG WU
  • Publication number: 20230189507
    Abstract: The present disclosure provides to a method for manufacturing a semiconductor memory device. The method includes receiving a substrate including a cell area and a peripheral area; forming a first bit line structure on a surface of the cell area; depositing a landing pad above the barrier layer and on the top surface of the first bit line structure; removing a top corner of the landing pad to form an inclined surface connecting a top surface of the landing pad to a sidewall of the landing pad; etching the nitride layer of the first bit line structure and the spacer nitride layer from the top opening so as to form a concavity; etching the spacer oxide layer from the concavity to form an air gap; and depositing a silicon nitride layer to seal the air gap.
    Type: Application
    Filed: December 9, 2021
    Publication date: June 15, 2023
    Inventors: HAO-CHAN LO, HSING-HAN WU, JR-CHIUAN WANG, JEN-I LAI, CHUN-HENG WU
  • Publication number: 20230177710
    Abstract: An electronic system for generating panoramic light fields is provided. The electronic system includes a camera, a depth estimation circuit, and a light field generation circuit. The camera is configured to capture a panoramic image of a scene. The depth estimation circuit is configured to estimate panoramic depth information of the scene based on the panoramic image captured by the camera. The light field generation circuit is configured to generate a panoramic light field based on the estimated panoramic depth information.
    Type: Application
    Filed: November 9, 2022
    Publication date: June 8, 2023
    Inventors: I-Chan LO, Homer CHEN
  • Publication number: 20220292279
    Abstract: A method and a system of deep face recognition for a fisheye image are provided. The method includes determining a category corresponding to an input image, performing an image rectification according to the category corresponding to the input image to generate a restored image, and performing a face recognition on the restored image to determine an identity corresponding to the input image. The category correlates to a radial distance corresponding to the input image.
    Type: Application
    Filed: April 27, 2021
    Publication date: September 15, 2022
    Inventors: YI-HSIN LI, I-CHAN LO, HONG-MING CHEN
  • Patent number: 10724140
    Abstract: A thermal chemical vapor deposition (CVD) system includes a bottom chamber, an upper chamber, a workpiece support, a heater and at least one shielding plate. The upper chamber is present over the bottom chamber. The upper chamber and the bottom chamber define a chamber space therebetween. The workpiece support is configured to support a workpiece in the chamber space. The heater is configured to apply heat to the workpiece. The shielding plate is configured to at least partially shield the bottom chamber from the heat.
    Type: Grant
    Filed: July 31, 2018
    Date of Patent: July 28, 2020
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yen-Chan Lo, Yi-Fang Lai, Po-Hsiung Leu, Ding-I Liu, Si-Wen Liao, Kai-Shiung Hsu, Jheng-Uei Hsieh, Shian-Huei Lin, Jui-Fu Hsu, Cheng-Tsung Wu
  • Patent number: 10626499
    Abstract: A deposition device structure is provided. The deposition device structure includes a heater in a chamber. The deposition device structure also includes a shower head over the heater. The shower head includes holes extending from a top surface of the shower head to a bottom surface of the shower head. The bottom surface of the shower head faces the heater. The bottom surface of the shower head has a first section and a second section. The second section of the bottom surface is rougher than the first section of the bottom surface.
    Type: Grant
    Filed: October 5, 2017
    Date of Patent: April 21, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Yen-Chan Lo, Huan-Chieh Chen, Yi-Fang Lai, Keith Kuang-Kuo Koai, Chin-Feng Sun, Po-Hsiung Leu, Ding-I Liu, Kai-Shiung Hsu
  • Patent number: 10623822
    Abstract: Virtual cable modem termination system redundancy may be provided. First, a new virtual cable modem termination system (vCMTS) instance may be spawned. Then a backhaul connection between the new vCMTS instance and a data center network may be created. Next, a database connection between the new vCMTS instance and a database may be created. Upstream and downstream traffic of a node may then be switched from an active vCMTS instance to the new vCMTS instance.
    Type: Grant
    Filed: October 20, 2017
    Date of Patent: April 14, 2020
    Assignee: Cisco Technology, Inc.
    Inventors: Xiaowei Shen, Yuliang Chen, Jian Chen, Yu-Chan Lo
  • Publication number: 20190124407
    Abstract: Virtual cable modem termination system redundancy may be provided. First, a new virtual cable modem termination system (vCMTS) instance may be spawned. Then a backhaul connection between the new vCMTS instance and a data center network may be created. Next, a database connection between the new vCMTS instance and a database may be created. Upstream and downstream traffic of a node may then be switched from an active vCMTS instance to the new vCMTS instance.
    Type: Application
    Filed: October 20, 2017
    Publication date: April 25, 2019
    Applicant: Cisco Technology, Inc.
    Inventors: Xiaowei Shen, Yuliang Chen, Jian Chen, Yu-Chan Lo
  • Publication number: 20190032215
    Abstract: A deposition device structure is provided. The deposition device structure includes a heater in a chamber. The deposition device structure also includes a shower head over the heater. The shower head includes holes extending from a top surface of the shower head to a bottom surface of the shower head. The bottom surface of the shower head faces the heater. The bottom surface of the shower head has a first section and a second section. The second section of the bottom surface is rougher than the first section of the bottom surface.
    Type: Application
    Filed: October 5, 2017
    Publication date: January 31, 2019
    Inventors: Yen-Chan LO, Huan-Chieh CHEN, Yi-Fang LAI, Keith Kuang-Kuo KOAI, Chin-Feng SUN, Po-Hsiung LEU, Ding-I LIU, Kai-Shiung HSU
  • Patent number: 10161041
    Abstract: A thermal chemical vapor deposition (CVD) system includes a bottom chamber, an upper chamber, a workpiece support, a heater and at least one shielding plate. The upper chamber is present over the bottom chamber. The upper chamber and the bottom chamber define a chamber space therebetween. The workpiece support is configured to support a workpiece in the chamber space. The heater is configured to apply heat to the workpiece. The shielding plate is configured to at least partially shield the bottom chamber from the heat.
    Type: Grant
    Filed: July 27, 2016
    Date of Patent: December 25, 2018
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yen-Chan Lo, Yi-Fang Lai, Po-Hsiung Leu, Ding-I Liu, Si-Wen Liao, Kai-Shiung Hsu, Jheng-Uei Hsieh, Shian-Huei Lin, Jui-Fu Hsu, Cheng-Tsung Wu
  • Publication number: 20180334747
    Abstract: A thermal chemical vapor deposition (CVD) system includes a bottom chamber, an upper chamber, a workpiece support, a heater and at least one shielding plate. The upper chamber is present over the bottom chamber. The upper chamber and the bottom chamber define a chamber space therebetween. The workpiece support is configured to support a workpiece in the chamber space. The heater is configured to apply heat to the workpiece. The shielding plate is configured to at least partially shield the bottom chamber from the heat.
    Type: Application
    Filed: July 31, 2018
    Publication date: November 22, 2018
    Inventors: Yen-Chan Lo, Yi-Fang Lai, Po-Hsiung Leu, Ding-I Liu, Si-Wen Liao, Kai-Shiung Hsu, Jheng-Uei Hsieh, Shian-Huei Lin, Jui-Fu Hsu, Cheng-Tsung Wu
  • Publication number: 20170107619
    Abstract: A thermal chemical vapor deposition (CVD) system includes a bottom chamber, an upper chamber, a workpiece support, a heater and at least one shielding plate. The upper chamber is present over the bottom chamber. The upper chamber and the bottom chamber define a chamber space therebetween. The workpiece support is configured to support a workpiece in the chamber space. The heater is configured to apply heat to the workpiece. The shielding plate is configured to at least partially shield the bottom chamber from the heat.
    Type: Application
    Filed: July 27, 2016
    Publication date: April 20, 2017
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Yen-Chan LO, Yi-Fang LAI, Po-Hsiung LEU, Ding-I LIU, Si-Wen LIAO, Kai-Shiung HSU, Jheng-Uei HSIEH, Shian-Huei LIN, Jui-Fu HSU, Cheng-Tsung WU
  • Publication number: 20140005260
    Abstract: Amiodarone inhibits the invagination during zebrafish heart development and makes the defect on valves development. The present invention demonstrates that Amiodarone inhibits cancer metastasis and provides a method for inhibiting cancer metastasis in a subject in need thereof comprising administering to the subject a pharmaceutically effective amount of an Amiodarone or its salt.
    Type: Application
    Filed: December 28, 2012
    Publication date: January 2, 2014
    Applicants: TRI-SERVICE GENERAL HOSPITAL, NATIONAL TAIWAN UNIVERSITY
    Inventors: Huai-Jen Tsai, Ming-Shen Dai, Ying-Shin Chen, Hung-Chieh Lee, Hao-Chan Lo, Mei-Yan Su