Abstract: The present disclosure provides to a semiconductor memory device. The semiconductor memory device includes a substrate having a cell area and a peripheral area; and a first bit line structure disposed on and protruding from a surface of the cell area. The first bit line structure is sandwiched by a pair of air gaps and a barrier layer is conformally overlaying the air gaps adjacent to the sidewalls of the first bit line structure and the cell area. The first bit line structure has a sidewall and an ascending top portion, and a landing pad is disposed over the ascending top portion and the sidewalls of the first bit line structure. The landing pad has an inclined surface corresponding to the ascending top portion of the first bit line structure.

Abstract: A method and a system of deep face recognition for a fisheye image are provided. The method includes determining a category corresponding to an input image, performing an image rectification according to the category corresponding to the input image to generate a restored image, and performing a face recognition on the restored image to determine an identity corresponding to the input image. The category correlates to a radial distance corresponding to the input image.

Abstract: The present disclosure provides to a method for manufacturing a semiconductor memory device. The method includes receiving a substrate including a cell area and a peripheral area; forming a first bit line structure on a surface of the cell area; depositing a landing pad above the barrier layer and on the top surface of the first bit line structure; removing a top corner of the landing pad to form an inclined surface connecting a top surface of the landing pad to a sidewall of the landing pad; etching the nitride layer of the first bit line structure and the spacer nitride layer from the top opening so as to form a concavity; etching the spacer oxide layer from the concavity to form an air gap; and depositing a silicon nitride layer to seal the air gap.

Abstract: The present disclosure provides to a semiconductor memory device. The semiconductor memory device includes a substrate having a cell area and a peripheral area; and a first bit line structure disposed on and protruding from a surface of the cell area. The first bit line structure is sandwiched by a pair of air gaps and a barrier layer is conformally overlaying the air gaps adjacent to the sidewalls of the first bit line structure and the cell area. The first bit line structure has a sidewall and an ascending top portion, and a landing pad is disposed over the ascending top portion and the sidewalls of the first bit line structure. The landing pad has an inclined surface corresponding to the ascending top portion of the first bit line structure.

Abstract: The present disclosure provides to a method for manufacturing a semiconductor memory device. The method includes receiving a substrate including a cell area and a peripheral area; forming a first bit line structure on a surface of the cell area; depositing a landing pad above the barrier layer and on the top surface of the first bit line structure; removing a top corner of the landing pad to form an inclined surface connecting a top surface of the landing pad to a sidewall of the landing pad; etching the nitride layer of the first bit line structure and the spacer nitride layer from the top opening so as to form a concavity; etching the spacer oxide layer from the concavity to form an air gap; and depositing a silicon nitride layer to seal the air gap.

Abstract: An electronic system for generating panoramic light fields is provided. The electronic system includes a camera, a depth estimation circuit, and a light field generation circuit. The camera is configured to capture a panoramic image of a scene. The depth estimation circuit is configured to estimate panoramic depth information of the scene based on the panoramic image captured by the camera. The light field generation circuit is configured to generate a panoramic light field based on the estimated panoramic depth information.

Abstract: A method and a system of deep face recognition for a fisheye image are provided. The method includes determining a category corresponding to an input image, performing an image rectification according to the category corresponding to the input image to generate a restored image, and performing a face recognition on the restored image to determine an identity corresponding to the input image. The category correlates to a radial distance corresponding to the input image.

Abstract: A thermal chemical vapor deposition (CVD) system includes a bottom chamber, an upper chamber, a workpiece support, a heater and at least one shielding plate. The upper chamber is present over the bottom chamber. The upper chamber and the bottom chamber define a chamber space therebetween. The workpiece support is configured to support a workpiece in the chamber space. The heater is configured to apply heat to the workpiece. The shielding plate is configured to at least partially shield the bottom chamber from the heat.

Abstract: A deposition device structure is provided. The deposition device structure includes a heater in a chamber. The deposition device structure also includes a shower head over the heater. The shower head includes holes extending from a top surface of the shower head to a bottom surface of the shower head. The bottom surface of the shower head faces the heater. The bottom surface of the shower head has a first section and a second section. The second section of the bottom surface is rougher than the first section of the bottom surface.

Abstract: Virtual cable modem termination system redundancy may be provided. First, a new virtual cable modem termination system (vCMTS) instance may be spawned. Then a backhaul connection between the new vCMTS instance and a data center network may be created. Next, a database connection between the new vCMTS instance and a database may be created. Upstream and downstream traffic of a node may then be switched from an active vCMTS instance to the new vCMTS instance.

Abstract: Virtual cable modem termination system redundancy may be provided. First, a new virtual cable modem termination system (vCMTS) instance may be spawned. Then a backhaul connection between the new vCMTS instance and a data center network may be created. Next, a database connection between the new vCMTS instance and a database may be created. Upstream and downstream traffic of a node may then be switched from an active vCMTS instance to the new vCMTS instance.

Abstract: A deposition device structure is provided. The deposition device structure includes a heater in a chamber. The deposition device structure also includes a shower head over the heater. The shower head includes holes extending from a top surface of the shower head to a bottom surface of the shower head. The bottom surface of the shower head faces the heater. The bottom surface of the shower head has a first section and a second section. The second section of the bottom surface is rougher than the first section of the bottom surface.

Abstract: A thermal chemical vapor deposition (CVD) system includes a bottom chamber, an upper chamber, a workpiece support, a heater and at least one shielding plate. The upper chamber is present over the bottom chamber. The upper chamber and the bottom chamber define a chamber space therebetween. The workpiece support is configured to support a workpiece in the chamber space. The heater is configured to apply heat to the workpiece. The shielding plate is configured to at least partially shield the bottom chamber from the heat.

Abstract: A thermal chemical vapor deposition (CVD) system includes a bottom chamber, an upper chamber, a workpiece support, a heater and at least one shielding plate. The upper chamber is present over the bottom chamber. The upper chamber and the bottom chamber define a chamber space therebetween. The workpiece support is configured to support a workpiece in the chamber space. The heater is configured to apply heat to the workpiece. The shielding plate is configured to at least partially shield the bottom chamber from the heat.

Abstract: A thermal chemical vapor deposition (CVD) system includes a bottom chamber, an upper chamber, a workpiece support, a heater and at least one shielding plate. The upper chamber is present over the bottom chamber. The upper chamber and the bottom chamber define a chamber space therebetween. The workpiece support is configured to support a workpiece in the chamber space. The heater is configured to apply heat to the workpiece. The shielding plate is configured to at least partially shield the bottom chamber from the heat.

Abstract: Amiodarone inhibits the invagination during zebrafish heart development and makes the defect on valves development. The present invention demonstrates that Amiodarone inhibits cancer metastasis and provides a method for inhibiting cancer metastasis in a subject in need thereof comprising administering to the subject a pharmaceutically effective amount of an Amiodarone or its salt.

Abstract: This invention relates to a method for molding a bicycle tube and the method comprises the following steps: first, providing a tube and then controlling thickness of the tube by a drawing and extruding process for forming a molding portion. Second, plasticize other portions of the tube into particular diameters and shapes by plasticizing processes. Third, hydroform the molding portion of the tube by a mold and a hydroforming device for forming particular three-dimensional shapes. By applying to the above-mentioned method, the tube could be molded into a three-dimensional, unique and delicate shape.